公开(公告)号：WO2009018217A3

公开(公告)日：2009-03-26

申请号：PCT/US2008071357

申请日：2008-07-28

Applicant: BREWER SCIENCE INC ,  SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

Inventor： SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

IPC: G03F7/11 ,  C08F212/04 ,  C08F220/10 ,  C08F236/06 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/34 ,  C08F220/56 ,  C08F226/06 ,  G03F7/11 ,  Y10T428/31678 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalcntly crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

Abstract translation: 本发明描述了用于平版印刷应用的非共价交联树脂涂料的组合物和方法。 这些材料被设计成在涂覆之后经历改变，从而提供耐溶剂性，并且在某些材料的情况下同时具有水基溶解性。 与共价交联材料相比，非共价相互作用可以更容易地去除这些涂层。 这些类型的材料非常适合沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩膜。

公开(公告)号：EP2174189A4

公开(公告)日：2011-01-19

申请号：EP08796726

申请日：2008-07-28

Applicant: BREWER SCIENCE INC

Inventor： SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

IPC: G03F7/11 ,  C08F212/04 ,  C08F220/10 ,  C08F236/06 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/34 ,  C08F220/56 ,  C08F226/06 ,  G03F7/11 ,  Y10T428/31678 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.