公开(公告)号：DE3752388T2

公开(公告)日：2006-10-19

申请号：DE3752388

申请日：1987-07-08

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKAO

IPC: G03F7/20 ,  G02B17/06

Abstract: An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

公开(公告)号：DE3752314T2

公开(公告)日：2000-09-14

申请号：DE3752314

申请日：1987-07-08

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKAO

IPC: G02B17/06 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06

Abstract: An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

公开(公告)号：DE69030348T2

公开(公告)日：1997-09-04

申请号：DE69030348

申请日：1990-10-03

Applicant: CANON KK

Inventor： WATANABE YUTAKA ,  EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  UZAWA SHUNICHI ,  KARIYA TAKAO

IPC: G03F7/20

公开(公告)号：DE68927146T2

公开(公告)日：1997-02-06

申请号：DE68927146

申请日：1989-09-29

Applicant: CANON KK

Inventor： MATSUI SHIN ,  KARIYA TAKAO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/677 ,  H01L21/68

公开(公告)号：DE69123279D1

公开(公告)日：1997-01-09

申请号：DE69123279

申请日：1991-04-04

Applicant: CANON KK

Inventor： KUNO MITSUTOSHI ,  FUJIOKA HIDEHIKO ,  MIZUSAWA NOBUTOSHI ,  CHIBA YUJI ,  KARIYA TAKAO ,  UDA KOJI ,  UZAWA SHUNICHI ,  KAWAKAMI EIGO

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/00

Abstract: A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined. limit.

公开(公告)号：DE68922798T2

公开(公告)日：1995-11-16

申请号：DE68922798

申请日：1989-07-31

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI ,  CHIBA HIROSHI ,  OHKAWA SHINKICHI

IPC: G03F7/20 ,  G12B5/00

Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

公开(公告)号：GB2167262B

公开(公告)日：1988-11-02

申请号：GB8526374

申请日：1985-10-25

Applicant: CANON KK

Inventor： NISHIMOTO YOSHIFUMI ,  OKUNUKU MASAHIKO ,  KARIYA TAKAO ,  KAWAI YASUO ,  ATSUTA AKIO

IPC: G01C3/32 ,  G01S17/08 ,  G02B7/32 ,  G03F9/00 ,  G02B7/11

Abstract: A position detecting device for detecting the position of an object includes an illumination optical system for producing a light beam and for irradiating the object with the light beam, an optical system for focusing the light beam, a focus position controlling system operative to change the position at which the light beam is focused by the focusing optical system, a first detecting device for receiving the light beam reflected from the object to detect the state of incidence of the light beam on the object, and a second detecting device for detecting the position of the object on the basis of the detection of the state of incidence of the light beam on the object by the first detecting means.

公开(公告)号：GB2155201B

公开(公告)日：1988-07-13

申请号：GB8418145

申请日：1984-07-17

Applicant: CANON KK

Inventor： KARIYA TAKAO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOH SUSUMU

IPC: G03F7/20 ,  G03B42/02

Abstract: An X-ray exposure apparatus wherein a member sensitive to X-ray is exposed to a pattern formed on a mask with the X-rays, includes an X-ray source for emitting X-rays, an irradiation chamber for accommodating the mask and the sensitive member and exposing them to the X-rays emitted by the X-ray source within the chamber and a vacuum pump for evacuating the chamber to effect the exposure operation in a vacuum.

公开(公告)号：DE3620970A1

公开(公告)日：1987-01-08

申请号：DE3620970

申请日：1986-06-23

Applicant: CANON KK

Inventor： KARIYA TAKAO

IPC: G03F1/22 ,  G03F7/20 ,  G03F1/00 ,  G03F9/00 ,  H01F7/06 ,  H01F13/00

Abstract: A device for detachably holding a mask, at least one part of which is made of a magnetic material, has a holding part to which the mask is to be fixed and which has a part made of a magnetic material, a first system for generating magnetic holding force lines so that a magnetic force is produced between the magnetic part of the holding part and the magnetic part of the mask in order to secure the mask to the holding part, and a second system for generating magnetic release force lines which counteract the magnetic force lines generated by the first system so that the latter are sufficiently weakened to detach the mask from the holding part.

公开(公告)号：FR2572515A1

公开(公告)日：1986-05-02

申请号：FR8515821

申请日：1985-10-24

Applicant: CANON KK

Inventor： NISHIMOTO YOSHIFUMI ,  OKUNUKI MASAHIKO ,  KARIYA TAKAO ,  KAWAY YASUO ,  ATSUTA AKIO

IPC: G01C3/32 ,  G01S17/08 ,  G02B7/32 ,  G03F9/00 ,  G01B11/14 ,  G01D5/26 ,  H01L21/68

Abstract: A position detecting device for detecting the position of an object includes an illumination optical system for producing a light beam and for irradiating the object with the light beam, an optical system for focusing the light beam, a focus position controlling system operative to change the position at which the light beam is focused by the focusing optical system, a first detecting device for receiving the light beam reflected from the object to detect the state of incidence of the light beam on the object, and a second detecting device for detecting the position of the object on the basis of the detection of the state of incidence of the light beam on the object by the first detecting means.