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公开(公告)号：DE68922798T2
公开(公告)日：1995-11-16
申请号：DE68922798
申请日：1989-07-31
Applicant: CANON KK
Inventor： IWAMOTO KAZUNORI , UZAWA SHUNICHI , KARIYA TAKAO , EBINUMA RYUICHI , CHIBA HIROSHI , OHKAWA SHINKICHI
Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.
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公开(公告)号：DE3740561A1
公开(公告)日：1988-07-21
申请号：DE3740561
申请日：1987-11-30
Applicant: CANON KK
Inventor： FURUKAWA MOTOMU , HIGOMURA MAKOTO , OHTSUKA MASARU , YAMAMOTO HIRONORI , OHKAWA SHINKICHI , MATSUSHITA KOICHI , KAWAI YASUO , KARIYA TAKAO , KUSUNOKI HARUYUKI , YAMAURA TOSHIHIKO
Abstract: A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.
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公开(公告)号：DE68922798D1
公开(公告)日：1995-06-29
申请号：DE68922798
申请日：1989-07-31
Applicant: CANON KK
Inventor： IWAMOTO KAZUNORI , UZAWA SHUNICHI , KARIYA TAKAO , EBINUMA RYUICHI , CHIBA HIROSHI , OHKAWA SHINKICHI
Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.
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公开(公告)号：DE3740561C2
公开(公告)日：1997-07-10
申请号：DE3740561
申请日：1987-11-30
Applicant: CANON KK
Inventor： FURUKAWA MOTOMU , HIGOMURA MAKOTO , OHTSUKA MASARU , YAMAMOTO HIRONORI , OHKAWA SHINKICHI , MATSUSHITA KOICHI , KAWAI YASUO , KARIYA TAKAO , KUSUNOKI HARUYUKI , YAMAURA TOSHIHIKO
Abstract: A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.
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