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    3.
    发明专利
    未知

    公开(公告)号：DE69027142T2

    公开(公告)日：1996-10-24

    申请号：DE69027142

    申请日：1990-03-21

    Applicant: CANON KK

    Inventor： SUZUKI MASAYUKI ,  UNO SHINICHIRO

    IPC: G21K1/06 ,  G03F1/76 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L21/30

    Abstract: An X-ray exposure apparatus includes an X-ray source; and a directing optical system for directing an X-ray beam from the X-ray source to a surface to be exposed, the directing optical system including a mirror having a reflection surface of a curvature radius R with respect to a predetermined sectional plane, for reflecting the X-ray beam and for expanding the diameter thereof with respect to the sectional plane; wherein the mirror satisfies the following conditions: R = (2d1d2 sigma min )/{[ DELTA -(d1+d2) sigma min ]. alpha } where d1: the distance from the emission point of the X-ray source to the center of effective X-ray beam diameter on the reflection surface; d2: the distance from the center of effective X-ray beam diameter on the reflection surface to the center of effective X-ray beam diameter on the surface to be exposed; alpha : the angle defined at the center of effective X-ray beam diameter on the reflection surface, between the X-ray beam and the reflection surface; sigma min : a standard deviation of a distribution of intensities of the rays having different emission angles at the sectional plane, at the gravity center wavelength of the X-ray beam from the X-ray source; DELTA : 0.43a

    4.
    发明专利
    未知

    公开(公告)号：DE69027142D1

    公开(公告)日：1996-07-04

    申请号：DE69027142

    申请日：1990-03-21

    Applicant: CANON KK

    Inventor： SUZUKI MASAYUKI ,  UNO SHINICHIRO

    IPC: G21K1/06 ,  G03F1/76 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L21/30

    Abstract: An X-ray exposure apparatus includes an X-ray source; and a directing optical system for directing an X-ray beam from the X-ray source to a surface to be exposed, the directing optical system including a mirror having a reflection surface of a curvature radius R with respect to a predetermined sectional plane, for reflecting the X-ray beam and for expanding the diameter thereof with respect to the sectional plane; wherein the mirror satisfies the following conditions: R = (2d1d2 sigma min )/{[ DELTA -(d1+d2) sigma min ]. alpha } where d1: the distance from the emission point of the X-ray source to the center of effective X-ray beam diameter on the reflection surface; d2: the distance from the center of effective X-ray beam diameter on the reflection surface to the center of effective X-ray beam diameter on the surface to be exposed; alpha : the angle defined at the center of effective X-ray beam diameter on the reflection surface, between the X-ray beam and the reflection surface; sigma min : a standard deviation of a distribution of intensities of the rays having different emission angles at the sectional plane, at the gravity center wavelength of the X-ray beam from the X-ray source; DELTA : 0.43a

    5.
    发明专利
    未知

    公开(公告)号：DE69031897T2

    公开(公告)日：1998-05-07

    申请号：DE69031897

    申请日：1990-10-18

    Applicant: CANON KK

    Inventor： UNO SHINICHIRO ,  WATANABE YUTAKA ,  MOCHIZUKI NORITAKA ,  EBINUMA RYUICHI ,  FUKUDA YASUAKI

    IPC: G03F7/20 ,  G21K1/06

    Abstract: An X-ray exposure apparatus for exposing a resist on a substrate (4) to a pattern of an original (3) includes a radiation source (1) for providing X-rays (6); and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror (2) having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborhood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral portion the reflection surface has a curvature of radius larger than that at the top of the reflection surface.

    6.
    发明专利
    未知

    公开(公告)号：DE69031897D1

    公开(公告)日：1998-02-12

    申请号：DE69031897

    申请日：1990-10-18

    Applicant: CANON KK

    Inventor： UNO SHINICHIRO ,  WATANABE YUTAKA ,  MOCHIZUKI NORITAKA ,  EBINUMA RYUICHI ,  FUKUDA YASUAKI

    IPC: G03F7/20 ,  G21K1/06

    Abstract: An X-ray exposure apparatus for exposing a resist on a substrate (4) to a pattern of an original (3) includes a radiation source (1) for providing X-rays (6); and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror (2) having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborhood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral portion the reflection surface has a curvature of radius larger than that at the top of the reflection surface.

    7.
    发明专利
    未知

    公开(公告)号：DE69029300D1

    公开(公告)日：1997-01-16

    申请号：DE69029300

    申请日：1990-08-30

    Applicant: CANON KK

    Inventor： WATANABE YUTAKA ,  UNO SHINICHIRO ,  EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  UZAWA SHUNICHI

    IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An exposure apparatus for exposing a substrate with X-rays, is disclosed. The apparatus includes a radiation source (1) for providing X-rays; and a convex mirror (2) for reflecting the X-rays from the radiation source toward the substrate to expose a zone (3) of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone is deviated from the center of the zone.

    9.
    发明专利
    未知

    公开(公告)号：DE69029300T2

    公开(公告)日：1997-04-10

    申请号：DE69029300

    申请日：1990-08-30

    Applicant: CANON KK

    Inventor： WATANABE YUTAKA ,  UNO SHINICHIRO ,  EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  UZAWA SHUNICHI

    IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An exposure apparatus for exposing a substrate with X-rays, is disclosed. The apparatus includes a radiation source (1) for providing X-rays; and a convex mirror (2) for reflecting the X-rays from the radiation source toward the substrate to expose a zone (3) of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone is deviated from the center of the zone.

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