公开(公告)号：DK0834218T3

公开(公告)日：2009-04-20

申请号：DK96923321

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  MACDONALD NOEL C ,  BERTSCH FRED M ,  SHAW KEVIN A

IPC: H03H9/125 ,  H03H9/205 ,  H02N1/00 ,  H03H9/02 ,  H03H9/24 ,  H03H9/46

Abstract: A tunable electromicromechanical resonator structure incorporates an electrostatic actuator which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers. One set is mounted on a movable portion of the resonator structure and one set is mounted on an adjacent fixed base on substrate, with the fingers in opposed relationship and their adjacent ends spaced apart by a gap. An adjustable bias voltage across the sets of electrodes adjusts the resonant frequency of the movable structure.

公开(公告)号：CA2224402C

公开(公告)日：2008-06-17

申请号：CA2224402

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  MACDONALD NOEL C ,  SHAW KEVIN A ,  BERTSCH FRED M

IPC: H03H9/125 ,  H03H9/24 ,  H02N1/00 ,  H03H9/02 ,  H03H9/205 ,  H03H9/46

Abstract: A tunable electromechanical resonator structure incorporates an electrostatic actuator (66, 68) which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers (70, 72, 84, 90). One set (70, 72) is mounted on a movable portion (54) of the resonator structure and one set (84, 90) is mounted on an adjacent fixed base (132, 134) on the substrate, adjacent ends spaced apart by a gap (86, 92). An adjustable bias voltage (130) across the sets of electrodes adjusts the resonant frequency of the movable structure.

公开(公告)号：DE69637863D1

公开(公告)日：2009-04-23

申请号：DE69637863

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  BERTSCH FRED M ,  SHAW KEVIN A ,  MACDONALD NOEL C

IPC: H03H9/125 ,  H03H9/205 ,  H02N1/00 ,  H03H9/02 ,  H03H9/24 ,  H03H9/46

Abstract: A tunable electromicromechanical resonator structure incorporates an electrostatic actuator which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers. One set is mounted on a movable portion of the resonator structure and one set is mounted on an adjacent fixed base on substrate, with the fingers in opposed relationship and their adjacent ends spaced apart by a gap. An adjustable bias voltage across the sets of electrodes adjusts the resonant frequency of the movable structure.

公开(公告)号：DE69942486D1

公开(公告)日：2010-07-22

申请号：DE69942486

申请日：1999-01-14

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  SHAW KEVIN A ,  WEBB RUSSELL Y ,  REED BRYAN W ,  MACDONALD NOEL C ,  DAVIS TIMOTHY J

IPC: B81C1/00 ,  H01L21/00 ,  B81B3/00 ,  H01L21/76 ,  H01L21/762 ,  H01L29/84

公开(公告)号：ES2321889T3

公开(公告)日：2009-06-12

申请号：ES96923321

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  BERTSCH FRED M ,  SHAW KEVIN A ,  MACDONALD NOEL C

IPC: H03H9/125 ,  H03H9/205 ,  H02N1/00 ,  H03H9/02 ,  H03H9/24 ,  H03H9/46

Abstract: SE TRATA DE UNA ESTRUCTURA DE RESONADOR ELECTROMECANICO QUE SE PUEDE AFINAR Y QUE INCORPORA UN IMPULSOR ELECTROSTATICO (66, 68) QUE PERMITE LA ATENUACION O LA ELEVACION DE LA FRECUENCIA DE RESONANCIA DE LA ESTRUCTURA. EL IMPULSOR CONSISTE EN DOS CONJUNTOS DE ELECTRODOS OPUESTOS, EN FORMA DE DEDOS, CADA UNO DE CUYOS CONJUNTOS TIENE VARIOS DEDOS SEPARADOS Y PARALELOS ENTRE SI (70, 72, 84, 90). UN CONJUNTO (70, 72) ESTA MONTADO SOBRE UNA PARTE MOVIL (54) DE LA ESTRUCTURA DEL RESONADOR Y EL OTRO CONJUNTO (84, 90) ESTA MONTADO SOBRE UNA BASE FIJA ADYACENTE (132, 134) SITUADA SOBRE EL SUSTRATO; LOS EXTREMOS ADYACENTES ESTAN SEPARADOS POR UN ESPACIO VACIO (86, 92). UNA TENSION DE POLARIZACION GRADUABLE (130) PASANDO POR LOS DOS CONJUNTOS DE ELECTRODOS AFINA LA FRECUENCIA DE RESONANCIA DE LA ESTRUCTURA MOVIL.

公开(公告)号：PT834218E

公开(公告)日：2009-05-06

申请号：PT96923321

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  BERTSCH FRED M ,  SHAW KEVIN A ,  MACDONALD NOEL C

IPC: H03H9/125 ,  H03H9/205 ,  H02N1/00 ,  H03H9/02 ,  H03H9/24 ,  H03H9/46

公开(公告)号：CA2224402A1

公开(公告)日：1997-01-09

申请号：CA2224402

申请日：1996-06-20

Applicant: CORNELL RES FOUNDATION INC

Inventor： MACDONALD NOEL C ,  SHAW KEVIN A ,  BERTSCH FRED M ,  ADAMS SCOTT G

IPC: H03H9/125 ,  H02N1/00 ,  H03H9/02 ,  H03H9/205 ,  H03H9/24 ,  H03H9/46

Abstract: A tunable electromechanical resonator structure incorporates an electrostatic actuator (66, 68) which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers (70, 72, 84, 90). One set (70, 72) is mounted on a movable portion (54) of the resonator structure and one set (84, 90) is mounted on an adjacent fixed base (132, 134) on the substrate, adjacent ends spaced apart by a gap (86, 92). An adjustable bias voltage (130) across the sets of electrodes adjusts the resonant frequency of the movable structure.

公开(公告)号：WO9936941A3

公开(公告)日：2000-02-10

申请号：PCT/US9900784

申请日：1999-01-14

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  SHAW KEVIN A ,  WEBB RUSSELL Y ,  REED BRYAN W ,  MACDONALD NOEL C ,  DAVIS TIMOTHY J

IPC: B81C1/00 ,  B81B3/00 ,  H01L21/76 ,  H01L21/762 ,  H01L29/84 ,  H01L21/00

CPC classification number: H01L21/76224 ,  B81B2203/0118 ,  B81B2203/033 ,  B81C1/00142 ,  B81C1/00698

Abstract: An isolation process which enhances the performance of silicon micromechanical devices incorporates dielectric isolation segments (254, 256) within the silicon microstructure, which is otherwise composed of an interconnected grid of cantilevered beams. A metal layer on top of the beams (276, 278) provides interconnects (244, 246) and also allows contact to the silicon beams. Multiple conduction paths are incorporated through a metal patterning step prior to structure definition. The invention improves manufacturability of previous processes by performing all lithographic patterning steps on flat topographies, and removing complicated metal sputtering steps required of most high aspect ratio processes. With little modification, the invention can be implemented with integrated circuit fabrication sequences for fully integrated devices.

Abstract translation: 提高硅微机械器件性能的隔离工艺在硅微结构内部包含介质隔离段（254,256），否则由互连的悬臂梁组成。 梁（276,278）的顶部上的金属层提供互连（244,246），并且还允许与硅光束的接触。 在结构定义之前，通过金属图案化步骤并入多个导电路径。 本发明通过在平面形貌上进行所有平版印刷图案化步骤，以及去除大多数高纵横比工艺所需的复杂金属溅射步骤，从而提高先前工艺的可制造性。 通过很少的修改，本发明可以用于完全集成的器件的集成电路制造序列。

公开(公告)号：EP0702796A4

公开(公告)日：1997-01-22

申请号：EP94919153

申请日：1994-05-23

Applicant: CORNELL RES FOUNDATION INC

Inventor： SHAW KEVIN A ,  ADAMS SCOTT G ,  MACDONALD NOEL C

IPC: B60G23/00 ,  B81B3/00 ,  B81C1/00 ,  G01P1/00 ,  G01P15/08 ,  G01P15/125 ,  G01P15/13 ,  H01L29/84

CPC classification number: G01P15/131 ,  B81B3/0051 ,  B81B2201/0235 ,  B81B2203/0109 ,  B81B2203/0136 ,  G01P1/006 ,  G01P15/0802 ,  G01P15/125 ,  G01P2015/0814 ,  G01P2015/0831 ,  G01R33/0286

Abstract: A microelectromechanical accelerometer (60) having submicron features is fabricated from a single crystal silicon substrate (10). The accelerometer includes a movable portion incorporating an axial beam (102) carrying laterally-extending high aspect ratio released fingers (110-117, 120-127) cantilevered above the floor of a cavity formed in the substrate during the fabrication process. The movable portion is supported by restoring springs (132, 142) having controllable flexibility to vary the resonant frequency of the structure. A multiple-beam structure provides stiffness in the movable portion for accuracy.

Abstract translation: 具有亚微米特征的微机电加速度计（60）由单晶硅衬底（10）制造。 加速度计包括结合轴向梁（102）的可移动部分，所述轴向梁承载在制造过程期间在形成于衬底中的空腔的底板上方悬伸的横向延伸高纵横比释放指状物（110-117,120-127）。 可移动部分由具有可控柔性的复位弹簧（132,142）支撑，以改变结构的谐振频率。 为了精度，多梁结构在可移动部分中提供刚度。

公开(公告)号：EP1062684A4

公开(公告)日：2006-07-26

申请号：EP99903085

申请日：1999-01-14

Applicant: CORNELL RES FOUNDATION INC

Inventor： ADAMS SCOTT G ,  SHAW KEVIN A ,  WEBB RUSSELL Y ,  REED BRYAN W ,  MACDONALD NOEL C ,  DAVIS TIMOTHY J

IPC: B81C1/00 ,  B81B3/00 ,  H01L21/76 ,  H01L21/762 ,  H01L29/84 ,  H01L21/00

CPC classification number: H01L21/76224 ,  B81B2203/0118 ,  B81B2203/033 ,  B81C1/00142 ,  B81C1/00698

Abstract: An isolation process which enhances the performance of silicon micromechanical devices incorporates dielectric isolation segments (254, 256) within the silicon microstructure, which is otherwise composed of an interconnected grid of cantilevered beams. A metal layer on top of the beams (276, 278) provides interconnects (244, 246) and also allows contact to the silicon beams. Multiple conduction paths are incorporated through a metal patterning step prior to structure definition. The invention improves manufacturability of previous processes by performing all lithographic patterning steps on flat topographies, and removing complicated metal sputtering steps required of most high aspect ratio processes. With little modification, the invention can be implemented with integrated circuit fabrication sequences for fully integrated devices.