Low expansion coefficient glass with reduced striae and element, and their manufacturing method
    2.
    发明专利
    Low expansion coefficient glass with reduced striae and element, and their manufacturing method 有权
    具有减少结构和元素的低膨胀系数玻璃及其制造方法

    公开(公告)号:JP2007186412A

    公开(公告)日:2007-07-26

    申请号:JP2006344018

    申请日:2006-12-21

    CPC classification number: C03B19/1453 C03B2201/42 C03C3/06

    Abstract: PROBLEM TO BE SOLVED: To provide ultra-low expansion coefficient silica/titania glass having reduced striae. SOLUTION: In this method, glass is heat-treated at a temperature over 1,600°C for 72-288 hours. In an example of this method, glass is heat-treated without flowing nor moving. By this method, the size of the striae in the ultra-low expansion coefficient glass is reduced by 500%, especially the striae at a high frequency can be reduced for the most part. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题:提供具有减少条纹的超低膨胀系数二氧化硅/二氧化钛玻璃。

    解决方案:在该方法中,将玻璃在1600℃以上的温度下热处理72-288小时。 在该方法的实例中,玻璃被热处理而不流动或移动。 通过这种方法,超低膨胀系数玻璃中的条纹的尺寸减少了500%,特别是大部分可以降低高频条纹。 版权所有(C)2007,JPO&INPIT

    4.
    发明专利
    未知

    公开(公告)号:DE60234124D1

    公开(公告)日:2009-12-03

    申请号:DE60234124

    申请日:2002-12-19

    Applicant: CORNING INC

    Abstract: Fused silica articles containing at least 50 ppb aluminum are disclosed. The fused silica articles containing these levels of aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum.

    REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME
    10.
    发明申请
    REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME 审中-公开
    减少的低膨胀玻璃和元素,以及制造它们的方法

    公开(公告)号:WO2007143069A2

    公开(公告)日:2007-12-13

    申请号:PCT/US2007012899

    申请日:2007-05-31

    Abstract: The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.

    Abstract translation: 本发明涉及一种具有减少条纹的低膨胀玻璃,通过其厚度,玻璃具有0.1重量%以下的二氧化钛含量的点对点变化,并且在整个温度范围内的CTE为0±3ppb /℃, 35°C。 本发明还涉及一种通过使用在该方法中使用的振荡图案的重复时间为10分钟以下的方法制造低膨胀玻璃的方法。 此外,本发明的低膨胀玻璃可以通过在高于1600℃的温度下热处理玻璃在48 160小时的时间内进一步降低条纹。 本发明还涉及适用于极紫外光刻的光学元件,该元件由二氧化钛含量在5-10重量%范围内的含二氧化钛的二氧化硅玻璃制成,抛光和成形的表面具有峰谷 粗糙度小于10nm,二氧化钛含量的平均变化小于±0.1wt。 通过玻璃的垂直厚度测量,并且在整个温度范围5 35°C时,热膨胀系数为0±3ppb /°C。

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