Abstract:
PROBLEM TO BE SOLVED: To provide an extreme ultraviolet ray optical element made of a titania-containing silica glass having a low level striation, a method and an apparatus for producing the extreme ultraviolet ray optical element, and a method and an apparatus for measuring the striation in a glass element or an extreme ultraviolet ray optical element. SOLUTION: The silica glass contains 5-10 wt.%, preferably 6-8 wt.% of a titania, and it has a thermal expansion coefficient at 20-35°C in a range of +30 to -30 ppb/°C, preferably +20 to -20 ppb/°C. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide ultra-low expansion coefficient silica/titania glass having reduced striae. SOLUTION: In this method, glass is heat-treated at a temperature over 1,600°C for 72-288 hours. In an example of this method, glass is heat-treated without flowing nor moving. By this method, the size of the striae in the ultra-low expansion coefficient glass is reduced by 500%, especially the striae at a high frequency can be reduced for the most part. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
Abstract:
Fused silica articles containing at least 50 ppb aluminum are disclosed. The fused silica articles containing these levels of aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum.
Abstract:
Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.
Abstract:
Verfahren zum Vermindern von Schlieren in einem Siliciumoxid-Titanoxid-Glas, wobei das Verfahren umfasst: Herstellen eines Siliciumoxid-Titanoxid-Glases mit einer Form; Wärmebehandeln des Glases in einem Ofen bei einer Temperatur von oberhalb 1600°C über einen Zeitraum im Bereich von 72–288 Stunden; und Abkühlen des Glases auf Umgebungstemperatur, um ein Siliciumoxid-Titanoxid-Glas mit verminderten Schlieren zu ergeben.
Abstract:
Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
Abstract:
The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.