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    PRECISION ALIGNMENT AND ASSEMBLY OF MICROLENSES AND MICROCOLUMNS
    2.
    发明专利
    PRECISION ALIGNMENT AND ASSEMBLY OF MICROLENSES AND MICROCOLUMNS 未知

    公开(公告)号：CA2324243A1

    公开(公告)日：2000-08-10

    申请号：CA2324243

    申请日：2000-02-07

    Applicant: ETEC SYSTEMS INC

    Inventor： CHANG TAI-HON PHILIP ,  KIM HO-SEOB ,  RISHTON STEPHEN A ,  LEE KIM Y

    IPC: H01J9/14 ,  H01J9/18 ,  H01J37/04 ,  H01J37/12

    Abstract: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

    DETECTOR CONFIGURATION FOR EFFICIENT SECONDARY ELECTRON COLLECTION IN MICROCOLUMNS
    3.
    发明申请
    DETECTOR CONFIGURATION FOR EFFICIENT SECONDARY ELECTRON COLLECTION IN MICROCOLUMNS 审中-公开
    用于MICROCOLUMNS中有效的二次电子收集的检测器配置

    公开(公告)号：WO0031769A9

    公开(公告)日：2001-05-17

    申请号：PCT/US9927689

    申请日：1999-11-22

    Applicant: ETEC SYSTEMS INC

    Inventor： MANKOS MARIAN ,  CHANG T H P ,  MURAY LAWRENCE ,  KIM HO-SEOB ,  LEE KIM Y

    IPC: G01N23/203 ,  G01N23/225 ,  G21K1/087 ,  G21K5/04 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J37/30

    CPC classification number: H01J37/244 ,  H01J2237/1205

    Abstract: A structure and associated method for detecting secondary and backscatter electrons in a microcolumn. A secondary electron detector and a backscatter electron detector, both located upstream of the Einzel (objective) lens in the microcolumn, provide a highly efficient axially symmetric electron detector, short column length, and short working distance. The secondary electron detector is located between the deflection system and the Einzel lens, between the suppressor plate and the Einzel lens, or between the deflection system and the beam-limiting aperture. The backscatter electron detector is located between a beam-limiting aperture and the deflection system and can be incorporated into the aperture. A secondary electron extractor placed between the sample and the Einzel lens further improves the spatial resolution caused by surface imperfection or local surface potential on the sample surface.

    Abstract translation: 用于在微柱中检测次级和反向散射电子的结构和相关方法。 位于微柱中的Einzel（物镜）镜头上游的二次电子检测器和反向散射电子检测器提供了高效的轴对称电子检测器，柱长短，工作距离短。 二次电子检测器位于偏转系统和Einzel透镜之间，位于抑制板和Einzel透镜之间，或位于偏转系统和光束限制孔之间。 反向散射电子检测器位于光束限制孔和偏转系统之间，并且可以结合到孔中。 放置在样品和Einzel透镜之间的二次电子提取器进一步改善了由表面缺陷或样品表面上的局部表面电位引起的空间分辨率。

    MICROFABRICATED TEMPLATE FOR MULTIPLE CHARGED PARTICLE BEAM CALIBRATIONS AND SHIELDED CHARGED PARTICLE BEAM LITHOGRAPHY
    4.
    发明申请
    MICROFABRICATED TEMPLATE FOR MULTIPLE CHARGED PARTICLE BEAM CALIBRATIONS AND SHIELDED CHARGED PARTICLE BEAM LITHOGRAPHY 审中-公开
    用于多个充电颗粒光束校准和屏蔽充电颗粒光束光刻的微晶模板

    公开(公告)号：WO0067291A3

    公开(公告)日：2001-07-05

    申请号：PCT/US0040082

    申请日：2000-05-03

    Applicant: ETEC SYSTEMS INC

    Inventor： LEE KIM Y ,  KIM HO-SEOB ,  MANKOS MARIAN ,  MURAY LAWRENCE ,  CHANG T H P

    IPC: G03F1/16 ,  G03F7/20 ,  G03F9/00 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/1205

    Abstract: A method, an associated structure, and an apparatus for multiple charged particle beam calibration and shielded charged particle lithography. A template defining an array of membranes is positioned above a target (e.g., a semiconductor wafer of the electron beams). Each membrane defines a through slot (opening) and a set of registration marks which are located with respect to registration marks of the other membranes. Patterns are written onto the target by scanning each electron beam through its associated through slot. Intra- and inter-charged particle beam calibrations for each charged particle beam are carried out using its associated set of registration marks. The template also suppresses undesirable electrical charging of any resist present on the target during the exposure process.

    Abstract translation: 一种用于多次带电粒子束校准和屏蔽带电粒子光刻的方法，相关结构和装置。 限定膜阵列的模板位于靶（例如，电子束的半导体晶片）上方。 每个隔膜限定通孔（开口）和一组相对于其他隔膜的配准标记定位的配准标记。 通过扫描每个电子束通过相关联的通孔将图案写入目标。 使用其相关联的一组注册标记来执行每个带电粒子束的内部和带电粒子束校准。 该模板还抑制曝光过程中目标物上存在的任何抗蚀剂的不期望的电荷。

    Microcolumn assembly using laser spot welding
    5.
    发明专利
    Microcolumn assembly using laser spot welding 未知

    公开(公告)号：AU2805601A

    公开(公告)日：2001-02-19

    申请号：AU2805601

    申请日：2000-07-28

    Applicant: ETEC SYSTEMS INC

    Inventor： MURAY LAWRENCE PETER ,  LEE KIM Y ,  RISHTON STEPHEN A ,  KIM HO-SEOB ,  CHANG TAI-HON PHILIP

    IPC: H01J9/14 ,  G01Q70/00 ,  H01J9/18 ,  H01J37/12

    Abstract: A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.

    SILICON MICROLENS CLEANING SYSTEM
    6.
    发明专利
    SILICON MICROLENS CLEANING SYSTEM 未知

    公开(公告)号：CA2318787A1

    公开(公告)日：2000-06-02

    申请号：CA2318787

    申请日：1999-10-29

    Applicant: ETEC SYSTEMS INC

    Inventor： KIM HO-SEOB ,  CHANG T H PHILLIP

    IPC: G01N20060101 ,  G01N13/12 ,  G01N30/00 ,  G12B21/00 ,  H01J37/12 ,  H01J37/26

    Abstract: A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.

    ELECTRON-BEAM MICROCOLUMN AS A GENERAL PURPOSE SCANNING ELECTRON MICROSCOPE
    8.
    发明专利
    ELECTRON-BEAM MICROCOLUMN AS A GENERAL PURPOSE SCANNING ELECTRON MICROSCOPE 未知

    公开(公告)号：CA2286804A1

    公开(公告)日：1999-09-10

    申请号：CA2286804

    申请日：1999-03-02

    Applicant: ETEC SYSTEMS INC

    Inventor： CHANG TAI-HON P ,  KIM HO-SEOB

    IPC: H01J37/26 ,  G01Q30/02 ,  G01Q30/20 ,  G01Q70/08 ,  G01S19/04 ,  G01S19/13 ,  H01J37/16 ,  H01J37/28

    Abstract: A charged particle-beam microcolumn, which for example may be used for charged particle microscopy, with a T-shape configuration has a relatively narrow base structure supporting the beam forming charged particle optical column. The narrow base structure permits the T-shaped microcolumn and sample to be positioned at an angle other than normal with respect to each other, which allows generation of three-dimensional-like images of the sample surface. Thus, the incidence angle of the charged particle beam generated by the Tshaped microcolumn may be varied while a short working distance is maintained. A conventional secondary/backscattered charged particle detector may be used because the reflected angle of the charged particles allows a charged particle detector separated from the T-shaped microcolumn. Further, the small size of the T-shaped microcolumn permits observation of different parts of a large stationary sample by moving the T-shaped microcolumn with respect to the sample. Moreover, multiple T-shaped microcolumns may be arrayed to improve throughput.

    PRECISION ALIGNMENT AND ASSEMBLY OF MICROLENSES AND MICROCOLUMNS
    9.
    发明申请
    PRECISION ALIGNMENT AND ASSEMBLY OF MICROLENSES AND MICROCOLUMNS 审中-公开
    精密对准和组装微孔和微孔

    公开(公告)号：WO0046831A9

    公开(公告)日：2001-09-07

    申请号：PCT/US0003174

    申请日：2000-02-07

    Applicant: ETEC SYSTEMS INC

    Inventor： LEE KIM Y ,  KIM HO-SEOB ,  RISHTON STEPHEN A ,  CHANG TAI-HON PHILIP

    IPC: H01J9/14 ,  H01J9/18 ,  H01J37/04 ,  H01J37/12

    CPC classification number: B82Y15/00 ,  H01J9/18 ,  H01J37/12 ,  H01J2237/1205

    Abstract: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

    Abstract translation: 用于对准和组装微透镜和微柱的方法和相关联的装置，其中使用诸如刚性纤维的对准结构来精确地对准多个微透镜组件。 在微透镜部件中形成对准开口，并且标准光纤在堆叠时穿过每个微透镜部件中的开口。 纤维为结构提供足够的刚度和稳定性，以精确地对准微透镜部件的孔，从而相对于传统的微透镜和微柱接合技术允许提高组装效率。

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