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1.发明公开Lamella creation method and device using fixed-angle beam and rotating sample stage 审中-公开板条利用角度稳定的支撑成形方法和装置以及旋转样品台
公开(公告)号：EP2674742A2
公开(公告)日：2013-12-18
申请号：EP13171169.9
申请日：2013-06-10
Applicant: FEI COMPANY
Inventor： Wells, Andrew , Parker, N. William , Chandler, Clive , Utlaut, Mark
IPC: G01N1/32
CPC classification number: G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/31745
Abstract: A method and system for creating a substantially planar face in a substrate, the method including directing one or more beams at a first surface of a substrate to remove material from a first location in the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the first nonzero curtaining angle; and scanning the one or more beams in a pattern across the second surface to mill one or more finishing cuts in the substrate.
Abstract translation: 一种用于在基片创建基本上平坦的面，所述方法包括在一衬底以从衬底的第一位置移除材料的第一表面引导一个或多个波束的方法和系统中，光束被从正常偏移到所述第一 表面由一个非零垂落角; 在一个平面席卷一个或多个波束并垂直于所述第一表面到磨机中的一个或更多衬底初始切口，初始切口暴露的第二表面所做的是基本上垂直于所述第一表面上; 通过围绕轴线上以外于轴线即垂直于第一光束或平行于所述第一光束非零旋转角度旋转所述基片; 在第二表面引导所述第一光束，以除去从基板附加材料，而不改变第一个非零垂落角; 并扫描一个或多个光束在穿过所述第二表面的图案，以磨中的一个或更多衬底精加工切削。
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公开(公告)号：EP2096663A3
公开(公告)日：2009-10-14
申请号：EP09153259.8
申请日：2009-02-20
Applicant: FEI COMPANY
Inventor： Wells, Andrew
IPC: H01J37/28 , H01J37/304
CPC classification number: H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/3056
Abstract: An improved method and apparatus of beam processing corrects for beam drift while a beam is processing a sample. The beam position is aligned using a fiducial that is sufficiently near the working area so that the fiducial can be imaged and the sample processed without a stage moving. During processing, the beam positioning is corrected for drift using a model that predicts the drift.
Abstract translation: 光束处理的改进方法和装置在光束正在处理样品时校正光束漂移。 使用足够靠近工作区域的基准对准光束位置，使得可以对基准进行成像并且在没有台移动的情况下处理样品。 在处理过程中，使用预测漂移的模型对波束定位进行漂移校正。
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3.发明授权System for attachment of an electrode into an inductively coupled plasma source 有权系统的电极固定到一个感应耦合等离子体源
公开(公告)号：EP2600381B1
公开(公告)日：2016-03-23
申请号：EP12194645.3
申请日：2012-11-28
Applicant: FEI COMPANY
Inventor： Kellogg, Sean , Graupera, Anthony , Parker, N. William , Wells, Andrew , Utlaut, Mark , Skoczylas, Walter , Schwind, Gregory , Zhang, Shouyin , Smith, Noel
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
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Patent Agency Ranking4.发明公开Improved beam positioning for beam processing 有权Verbesserte Strahlpositionierung zur Strahlverarbeitung
公开(公告)号：EP2096663A2
公开(公告)日：2009-09-02
申请号：EP09153259.8
申请日：2009-02-20
Applicant: FEI COMPANY
Inventor： Wells, Andrew
IPC: H01J37/28 , H01J37/304
CPC classification number: H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/3056
Abstract: An improved method and apparatus of beam processing corrects for beam drift while a beam is processing a sample. The beam position is aligned using a fiducial that is sufficiently near the working area so that the fiducial can be imaged and the sample processed without a stage moving. During processing, the beam positioning is corrected for drift using a model that predicts the drift.
Abstract translation: 一种改进的光束处理方法和装置在光束处理样品时校正光束漂移。 使用足够靠近工作区域的基准来对准光束位置，使得可以对基准进行成像，并且样品在没有阶段移动的情况下进行处理。 在处理期间，使用预测漂移的模型来校正波束定位以进行漂移。
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公开(公告)号：EP2096663B1
公开(公告)日：2014-12-17
申请号：EP09153259.8
申请日：2009-02-20
Applicant: FEI COMPANY
Inventor： Wells, Andrew
IPC: H01J37/28 , H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/305
CPC classification number: H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/3056
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6.发明公开System for attachment of an electrode into an inductively coupled plasma source 有权系统的电极固定到一个感应耦合等离子体源
公开(公告)号：EP2600381A2
公开(公告)日：2013-06-05
申请号：EP12194645.3
申请日：2012-11-28
Applicant: FEI COMPANY
Inventor： Kellogg, Sean , Graupera, Anthony , Parker, N. William , Wells, Andrew , Utlaut, Mark , Skoczylas, Walter , Schwind, Gregory , Zhang, Shouyin , Smith, Noel
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source (100, 200, 300, 400, 500, 600) for focused ion beam systems includes a plasma reaction chamber (102, 202, 302, 402, 502, 602) with a removably attached source electrode (106, 206, 306, 406, 506, 606). A fastening mechanism (104, 204, 304, 404, 504) connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
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7.发明公开System for attachment of an electrode into an inductively coupled plasma source 有权系统zur Befestigung einer Elektrode einer induktiv gekoppelten Plasmaquelle
公开(公告)号：EP2600381A3
公开(公告)日：2015-01-07
申请号：EP12194645.3
申请日：2012-11-28
Applicant: FEI COMPANY
Inventor： Kellogg, Sean , Graupera, Anthony , Parker, N. William , Wells, Andrew , Utlaut, Mark , Skoczylas, Walter , Schwind, Gregory , Zhang, Shouyin , Smith, Noel
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source (100, 200, 300, 400, 500, 600) for focused ion beam systems includes a plasma reaction chamber (102, 202, 302, 402, 502, 602) with a removably attached source electrode (106, 206, 306, 406, 506, 606). A fastening mechanism (104, 204, 304, 404, 504) connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源（100,200,300,400,500,600）包括具有可移除地附接的源电极（102,202,302,402,502,602）的等离子体反应室 106,206,306,406,506,606）。 紧固机构（104,204,304,404,504）将源电极与等离子体反应室连接，并且允许形成导热的真空密封。 使用可移除的源电极，现在可以提高等离子体源管的可维护性和再利用性。
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8.发明公开Lamella creation method and device using fixed-angle beam and rotating sample stage 审中-公开板条利用角度稳定的支撑成形方法和装置以及旋转样品台
公开(公告)号：EP2674742A3
公开(公告)日：2014-02-12
申请号：EP13171169.9
申请日：2013-06-10
Applicant: FEI COMPANY
Inventor： Wells, Andrew , Parker, N. William , Chandler, Clive , Utlaut, Mark
IPC: G01N1/32
CPC classification number: G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/31745
Abstract: A method and system for creating a substantially planar face in a substrate, the method including directing one or more beams at a first surface of a substrate to remove material from a first location in the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the first nonzero curtaining angle; and scanning the one or more beams in a pattern across the second surface to mill one or more finishing cuts in the substrate.
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