公开(公告)号：KR20180071425A

公开(公告)日：2018-06-27

申请号：KR20187017514

申请日：2015-03-13

Applicant: FUJIFILM CORP

Inventor： FUJIMORI TORU ,  MORI HIROKI

IPC: G03F7/039 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/16 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: 본발명의과제는, 감활성광선성또는감방사선성수지조성물의제조방법, 및이 제조방법에의하여제조된감활성광선성또는감방사선성수지조성물을제공하는것에있다. 본발명의감활성광선성또는감방사선성수지조성물의제조방법은, 감활성광선성또는감방사선성수지조성물을필터에통과시켜여과하는여과공정을포함하고, 당해여과공정은, 감활성광선성또는감방사선성수지조성물을구멍직경 10nm 이하의제1 필터에 5회이상통과시켜행해진다.

公开(公告)号：DE602004028982D1

公开(公告)日：2010-10-21

申请号：DE602004028982

申请日：2004-03-30

Applicant: FUJIFILM CORP

Inventor： SHIRAKAWA KOJI ,  FUJIMORI TORU ,  YASUNAMI SHOICHIRO

IPC: G03F7/039 ,  H01L21/027

公开(公告)号：AT520744T

公开(公告)日：2011-09-15

申请号：AT08016150

申请日：2008-09-12

Applicant: FUJIFILM CORP

Inventor： MIZUKAWA YUKI ,  TAKAKUWA HIDEKI ,  FUJIMORI TORU

IPC: C09B43/40 ,  C07D417/14 ,  C07D487/04 ,  C09B29/036 ,  G02B5/20 ,  G02B5/22 ,  G03F7/00 ,  G03F7/004

Abstract: This invention privides an azo compound represented by Formula (I), Formula (II), or Formula (III): wherein R 1 and R 2 each independently represent a hydrogen atom or a substituent; D 1 and D 2 each independently represent a coupler residue; Z 1 and Z 2 each independently represent -C(R 3 )= or -N=; and R 3 represents a hydrogen atom or a substituent.

公开(公告)号：AT480799T

公开(公告)日：2010-09-15

申请号：AT04007652

申请日：2004-03-30

Applicant: FUJIFILM CORP

Inventor： SHIRAKAWA KOJI ,  FUJIMORI TORU ,  YASUNAMI SHOICHIRO

IPC: G03F7/039 ,  H01L21/027

Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

公开(公告)号：DE602004016938D1

公开(公告)日：2008-11-20

申请号：DE602004016938

申请日：2004-12-01

Applicant: FUJIFILM CORP

Inventor： MIZUKAWA YUKI ,  FUJIMORI TORU ,  SUZUKI NOBUO

IPC: C09B55/00 ,  G03F7/004 ,  C07D487/04 ,  C09B29/036 ,  G02B5/20 ,  G02B5/22

Abstract: The present invention provides a colored curable composition including a dye represented by the following formula (I), a color filter prepared by using the colored curable composition, and a method for manufacturing the color filter.

公开(公告)号：AT555500T

公开(公告)日：2012-05-15

申请号：AT09003743

申请日：2009-03-16

Applicant: FUJIFILM CORP

Inventor： MARUYAMA YOICHI ,  EINAGA HIROYUKI ,  FUJIMORI TORU ,  SHIMADA KAZUTO ,  TSUCHIMURA TOMOTAKA ,  KANEKO YUSHI

IPC: H01L27/146 ,  G02B5/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  G03F7/105

Abstract: Provided is a photosensitive resin composition comprising titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 to 250 mgKOH/g, a resin B having an acid value of from 26 to 65 mgKOH/g, a photopolymerization initiator and a solvent, the photopolymerization initiator comprising an oxime photopolymerization initiator, and the ratio by mass of resin A to resin B being 0.5-10.5:1. A light-shielding color filter may be formed from the above photosensitive resin composition. Such a filter can be used as a component of a solid-state image sensor.

公开(公告)号：DE60236243D1

公开(公告)日：2010-06-17

申请号：DE60236243

申请日：2002-09-18

Applicant: FUJIFILM CORP

Inventor： FUJIMORI TORU ,  KAWABE YASUMASA

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  C08F232/00 ,  G03F7/004 ,  H01L21/027

公开(公告)号：AT410485T

公开(公告)日：2008-10-15

申请号：AT04028465

申请日：2004-12-01

Applicant: FUJIFILM CORP

Inventor： MIZUKAWA YUKI ,  FUJIMORI TORU ,  SUZUKI NOBUO

IPC: C09B55/00 ,  G03F7/004 ,  C07D487/04 ,  C09B29/036 ,  G02B5/20 ,  G02B5/22

Abstract: The present invention provides a colored curable composition including a dye represented by the following formula (I), a color filter prepared by using the colored curable composition, and a method for manufacturing the color filter.

公开(公告)号：EP1780598A4

公开(公告)日：2012-11-28

申请号：EP05758193

申请日：2005-07-06

Applicant: FUJIFILM CORP

Inventor： SETO NOBUO ,  MIZUKAWA YUKI ,  FUJIMORI TORU

IPC: G03F7/00 ,  C09B47/04 ,  G02B5/20 ,  G03F7/004

CPC classification number: G03F7/0007 ,  C09B47/063 ,  C09B47/065 ,  C09B47/0675 ,  C09B47/0678

公开(公告)号：EP2260352A4

公开(公告)日：2011-11-23

申请号：EP09727087

申请日：2009-03-31

Applicant: FUJIFILM CORP

Inventor： FUJII KANA ,  TOMIGA TAKAMITSU ,  TSUCHIHASHI TORU ,  MIZUTANI KAZUYOSHI ,  YOKOYAMA JIRO ,  SUGIYAMA SHINICHI ,  HIRANO SHUJI ,  FUJIMORI TORU

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

Abstract: According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.