公开(公告)号：SG186712A1

公开(公告)日：2013-02-28

申请号：SG2012091492

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：SG184290A1

公开(公告)日：2012-11-29

申请号：SG2012071619

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  KAMIMURA SOU ,  TSUCHIHASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  MIZUTANI KAZUYOSHI ,  TARUTANI SHINJI ,  KATO KEITA

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.

公开(公告)号：SG190734A1

公开(公告)日：2013-07-31

申请号：SG2013041884

申请日：2011-11-29

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  FUJII KANA ,  KAMIMURA SOU ,  IWATO KAORU

Abstract: A negative pattern forming method, includes: (i) forming a film having a film thickness of 200 nm or more from a chemical amplification resist composition containing (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to decrease a solubility of the resin (A) for a developer containing one or more organic solvents, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film with a developer containing one or more organic solvents.

公开(公告)号：SG183808A1

公开(公告)日：2012-10-30

申请号：SG2012061438

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  TARUTANI SHINJI ,  TSUCHIHASHI TORU ,  KAMIMURA SOU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI

Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and &Dgr;SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. &Dgr;SP=SPF-SPI •••(1)

公开(公告)号：EP2545412A4

公开(公告)日：2013-11-13

申请号：EP11753463

申请日：2011-03-04

Applicant: FUJIFILM CORP

Inventor： FUJII KANA ,  TOMIGA TAKAMITSU ,  FUJIMORI TORU

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/2041

公开(公告)号：EP2260352A4

公开(公告)日：2011-11-23

申请号：EP09727087

申请日：2009-03-31

Applicant: FUJIFILM CORP

Inventor： FUJII KANA ,  TOMIGA TAKAMITSU ,  TSUCHIHASHI TORU ,  MIZUTANI KAZUYOSHI ,  YOKOYAMA JIRO ,  SUGIYAMA SHINICHI ,  HIRANO SHUJI ,  FUJIMORI TORU

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

Abstract: According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

公开(公告)号：EP2539769A4

公开(公告)日：2013-11-20

申请号：EP11747578

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

IPC: G03F7/038 ,  C08F220/28 ,  C08F232/00 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24479

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

Abstract translation: 提供一种形成图案的方法，其确保极好的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），曝光后烘焙（PEB）温度和焦点宽容度（焦深DOF）的依赖性，以及抗蚀剂组合物 用于该方法中。 该方法包括：（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物包含含有重复单元的树脂，所述重复单元含有在被酸作用时分解从而产生醇羟基的基团，因此该树脂因此当被酸作用时降低 其在含有有机溶剂的显影液中的溶解性，（B）将该膜曝光，以及（C）使用含有有机溶剂的显影液使曝光的显影液显影。

公开(公告)号：EP2609468A4

公开(公告)日：2014-04-30

申请号：EP11820079

申请日：2011-08-26

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  FUJII KANA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  H01L29/02

公开(公告)号：EP2449429A4

公开(公告)日：2012-12-26

申请号：EP10794269

申请日：2010-06-30

Applicant: FUJIFILM CORP

Inventor： FUJII KANA

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0048 ,  C08F8/02 ,  C08F12/22 ,  C08F12/24 ,  C08F12/32 ,  C08F212/14 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0397 ,  C08F220/10 ,  C08F2220/1841

公开(公告)号：EP2507669A4

公开(公告)日：2014-03-05

申请号：EP10833435

申请日：2010-11-30

Applicant: FUJIFILM CORP

Inventor： TSUCHIMURA TOMOTAKA ,  ITO TAKAYUKI ,  FUJIMORI TORU ,  FUJII KANA

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/09 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C09B69/101 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/091