公开(公告)号：EP2414896A4

公开(公告)日：2012-08-08

申请号：EP10758878

申请日：2010-03-26

Applicant: FUJIFILM CORP

Inventor： TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO ,  YAMAGUCHI SHUHEI ,  SHUBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C07C381/12 ,  C07D217/08 ,  C07D285/00 ,  C07D333/16 ,  C08F20/10 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C08F220/18 ,  C08F220/28 ,  C08F220/42 ,  G03F7/0397 ,  G03F7/2041 ,  C08F220/22

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.

公开(公告)号：EP2580624A4

公开(公告)日：2014-07-30

申请号：EP11849906

申请日：2011-12-22

Applicant: FUJIFILM CORP

Inventor： MATSUDA TOMOKI ,  SHIBUYA AKINORU ,  TOKUGAWA YOKO ,  YAMAGUCHI SHUHEI ,  FUJITA MITSUHIRO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

公开(公告)号：JP2009270060A

公开(公告)日：2009-11-19

申请号：JP2008123687

申请日：2008-05-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI ,  FUJITA MITSUHIRO

IPC: C08F4/02 ,  C08F292/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a material for fixing a polymerization initiator on a surface, which can easily produce a domain structure of a nanosize order by a self assembled monolayer of the polymerization initiator without using means such as lithography; and to provide a method for producing a grafted polymer pattern which can easily produce a grafted polymer pattern having a domain structure of a nanosize order.
SOLUTION: The method for producing a material for fixing a polymerization initiator on a surface comprises: contacting the polymerization initiator, having a site which can be bonded to a support, with the surface of the support, using a dipping or evaporation method; and then forming the nanodomain structure by the self assembled monolayer of the polymerization initiator bonded to the support on the support by self-assembly of the polymerization initiator bonded to the support. The method for producing the grafted polymer pattern comprises a step of producing the grafted polymer on the nanodomain structure of the material for fixing the polymerization initiator on the surface provided by the method for producing the material for fixing the polymerization initiator on the surface.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在表面上固定聚合引发剂的材料的方法，其可以通过聚合引发剂的自组装单层容易地产生纳米级的畴结构，而不使用诸如 平版印刷 并提供一种接枝聚合物图案的制造方法，其可以容易地制备具有纳米级序列结构的接枝聚合物图案。 解决方案：用于在表面上固定聚合引发剂的材料的制备方法包括：使用浸渍或蒸发法将具有可与载体结合的位点的聚合引发剂与载体的表面接触 ; 然后通过聚合引发剂的自组装单层通过结合到载体上的聚合引发剂的自组装，将与结合到载体上的载体的自组装单层形成纳米结构域结构。 接枝聚合物图案的制造方法包括在将聚合引发剂固定在表面上的材料的制造方法所提供的表面上，在聚合引发剂固定用材料的纳米域结构上制造接枝聚合物的工序。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2014149409A

公开(公告)日：2014-08-21

申请号：JP2013017949

申请日：2013-01-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAGUCHI SHUHEI ,  TOMIGA TAKAMITSU ,  YOSHINO FUMIHIRO ,  FURUYA SO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method by which excellent roughness performance, local pattern dimension uniformity and exposure latitude are achieved and film reduction in a pattern part can be suppressed, and to provide a compound, an actinic ray-sensitive or radiation-sensitive resin composition and a resist film used for the method, and a method for manufacturing an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a group that is decomposed under the action of an acid, and generating a polar group, (C1) a compound having a group generating a first acidic functional group by the application of an active ray or a radiation ray, and a group generating a second acidic functional group different from the first acidic functional group by the application of an active ray or a radiation ray, and (C2) a compound having two or more groups selected from groups generating a structure represented by general formulae (a), (b), (c), and (d) by the application of an active ray or a radiation ray.

Abstract translation: 要解决的问题：提供一种图案形成方法，通过该图案形成方法能够实现优异的粗糙度性能，局部图案尺寸均匀性和曝光宽容度，并且可以抑制图案部分中的膜还原，并提供化合物，光化射线敏感或辐射 敏感性树脂组合物和用于该方法的抗蚀剂膜以及电子器件的制造方法。解决方案：光化射线敏感或辐射敏感性树脂组合物含有（A）具有在动作下分解的基团的树脂 的酸，并且产生极性基团，（C1）具有通过施加活性射线或辐射线产生第一酸性官能团的基团的化合物，以及产生与第一酸性官能团不同的第二酸性官能团的基团 通过施加活性射线或放射线的官能团，和（C2）具有两个或更多个选自产生由基因表示的结构的基团的基团的化合物 （a），（b），（c）和（d）通过施加活性射线或放射线。

公开(公告)号：JP2011076057A

公开(公告)日：2011-04-14

申请号：JP2010087299

申请日：2010-04-05

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAGUCHI SHUHEI ,  TOMEBA TSUNEMITSU ,  FUJITA MITSUHIRO

IPC: G03F7/004 ,  C08F220/28 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C309/00 ,  C07C309/10 ,  C07C309/14 ,  C07C309/17 ,  C07C309/42 ,  C07C311/09 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/18 ,  C07C2603/68 ,  C07C2603/74 ,  C07C2603/86 ,  C07C2603/90 ,  C07D333/46 ,  C07D333/76 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition having high developability, exposure latitude and line edge roughness performance to solve a problem of an essential performance improvement technology of microphotofabrication using far-ultraviolet light, EUV, an electron beam, or the like, especially ArF excimer laser light. SOLUTION: This actinic ray- or radiation-sensitive resin composition includes a basic compound having (C)n basic groups and m groups that generate an acid by emission of actinic rays or radiation. Here, n and m satisfy the relationships n≥1, m≥2 and n COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高显影性，曝光宽容度和线边缘粗糙度性能的光化射线或辐射敏感性树脂组合物，以解决使用远紫外光的微波加工的基本性能改进技术的问题，EUV ，电子束等，特别是ArF准分子激光。 该光化射线或辐射敏感性树脂组合物包括具有（C）n个碱性基团的碱性化合物和通过发射光化射线或辐射产生酸的m个基团。 这里，n和m满足n≥1，m≥2和n

公开(公告)号：JP2011034810A

公开(公告)日：2011-02-17

申请号：JP2009180124

申请日：2009-07-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SATO YU ,  KAMINAGA KUNIYUKI ,  HAYASHI MASAYUKI ,  TSUTSUMI KIYOHIKO ,  FUJITA MITSUHIRO

IPC: H05B33/26 ,  H01L51/50 ,  H05B33/10

CPC classification number: H01L51/5016 ,  H01L51/0072 ,  H01L51/0087 ,  H01L51/5048

Abstract: PROBLEM TO BE SOLVED: To provide an organic electroluminescent element with high interlayer adhesiveness and excellent durability, and to provide a method of manufacturing the same.
SOLUTION: The organic electroluminescent element includes one electrode, at least one organic deposition layer, and another electrode formed in this order. Surface roughness Ra on the another electrode side of the organic deposition layer and a thickness t of the organic deposition layer satisfy a relation of 0.093

Abstract translation: 要解决的问题：提供具有高层间粘合性和优异耐久性的有机电致发光元件，并提供其制造方法。 解决方案：有机电致发光元件包括一个电极，至少一个有机沉积层和依次形成的另一个电极。 有机沉积层的另一个电极侧的表面粗糙度Ra和有机沉积层的厚度t满足0.093

公开(公告)号：JP2013178542A

公开(公告)日：2013-09-09

申请号：JP2013084293

申请日：2013-04-12

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO ,  YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an effect of improving a trailing shape of a resist pattern and enabling formation of a pattern with excellent LER performance, and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin showing increase in the solubility with an alkali developing solution by an action of an acid, and (B) a compound that generates an acid by irradiation with actinic rays or radiation; and the actinic ray-sensitive or radiation-sensitive resin composition includes the (B) compound that generates an acid by irradiation with actinic rays or radiation by 10 to 30 mass% on a basis of the whole solid content of the resin composition. A pattern forming method is carried out by using the above composition.

Abstract translation: 要解决的问题：提供具有改善抗蚀剂图案的拖尾形状并且能够形成具有优异的LER性能的图案的效果的光化射线敏感或辐射敏感性树脂组合物，以及使用该组合物的图案形成方法。 解决方案：光化射线敏感或辐射敏感性树脂组合物包含（A）通过酸作用显示与碱性显影液的溶解度增加的树脂，（B）通过光化反应产生酸的化合物 射线或辐射; 并且光化射线敏感性或辐射敏感性树脂组合物包含基于树脂组合物的全部固体成分，通过用光化射线或辐射照射10〜30质量％而产生酸的（B）化合物。 通过使用上述组成进行图案形成方法。

公开(公告)号：JP2012159690A

公开(公告)日：2012-08-23

申请号：JP2011019329

申请日：2011-01-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HIRANO DAISUKE ,  FUJITA MITSUHIRO ,  MATSUDA TOMOKI ,  TOKUGAWA YOKO

IPC: G03F7/039 ,  C08F20/10 ,  G03F7/004 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in line width roughness (LWR) performance and corner proximity performance, and to provide a resist film and a pattern forming method using the composition.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that has a group represented by general formula (A1) and exhibits increase in solubility with an alkali developing solution by an action of an acid; (B) an onium salt compound that has a nitrogen atom in a cationic moiety and is decomposed by irradiation with actinic rays or radiation to generate an acid; and (D) a solvent. A resist film and a pattern forming method using the above composition are also provided. In general formula (A1), Rrepresents an oxygen atom or a sulfur atom; Rrepresents a hydrogen atom or a group represented by -COR; Rrepresents a monovalent hydrocarbon group which may have a hetero atom; and Rrepresents a hydrogen atom, methyl group, trifluoromethyl group or cyano group.

Abstract translation: 要解决的问题：提供能够形成线宽粗糙度（LWR）性能和角接近性能优异的图案的光化射线敏感或辐射敏感性树脂组合物，并提供抗蚀剂膜和图案形成 方法使用该组合物。 提供了一种光化射线敏感或辐射敏感性树脂组合物，其包括：（A）具有由通式（A1）表示的基团并通过作用显示出与碱性显影液的溶解度增加的树脂 的酸 （B）在阳离子部分具有氮原子并通过用光化射线或辐射照射而分解产生酸的鎓盐化合物; 和（D）溶剂。 还提供了使用上述组合物的抗蚀剂膜和图案形成方法。 在通式（A1）中，R 3 表示氧原子或硫原子; R 4 表示氢原子或由-CO 2表示的基团。 SB>; R 5 表示可以具有杂原子的一价烃基; R 6表示氢原子，甲基，三氟甲基或氰基。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010058403A

公开(公告)日：2010-03-18

申请号：JP2008227380

申请日：2008-09-04

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI ,  FUJITA MITSUHIRO ,  YOKOI KAZUKIMI

IPC: B32B27/06 ,  B32B27/00 ,  C08F2/00 ,  C08F8/00 ,  C08F299/00

CPC classification number: B32B27/06 ,  B32B27/283 ,  B32B27/304 ,  B32B27/322 ,  B32B2270/00 ,  B32B2307/73 ,  B32B2551/00

Abstract: PROBLEM TO BE SOLVED: To provide a polymer film showing excellent production suitability, durability and adhesiveness to the substrate and having a fine structural pattern, a laminate having the polymer film and methods of manufacturing the polymer film and the laminate. SOLUTION: The method of manufacturing the polymer film includes: a film formation process of forming a polymer film by bringing two or more polymers including one or moer polymer having radical-polymerizable groups into contact with the surface of a substrate capable of generating a radical on exposure to light to form a polymer film having a phase-separated structure on the surface of the substrate; a fixing process of exposing the polymer film formed by the film forming process to light so as to fix the polymer film to the substrate; and a cleaning process of cleaning the polymer film obtained by the fixing process with a solvent. The polymer film obtained by the manufacturing method, and bound directly to the surface of the substrate is also provided. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供对基材具有优异的生产适应性，耐久性和粘附性并且具有精细结构图案的聚合物膜，具有聚合物膜的层压体以及制造聚合物膜和层压体的方法。 解决方案：制造聚合物膜的方法包括：通过使两种或更多种聚合物形成聚合物膜的成膜方法，所述两种或更多种聚合物包括具有自由基聚合性基团的一种或更多种类的聚合物与能够产生的基材的表面接触 曝光于光的基团，形成在基板的表面上具有相分离结构的聚合物膜; 将通过成膜工艺形成的聚合物膜曝光以将聚合物膜固定到基底的定影方法; 以及用溶剂清洗通过定影处理获得的聚合物膜的清洁方法。 还提供了通过制造方法获得并直接结合到基底表面的聚合物膜。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2013080240A

公开(公告)日：2013-05-02

申请号：JP2012262853

申请日：2012-11-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO ,  YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C08F220/28 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having effect in improvement of tapered profile of a resist pattern and capable of forming a pattern with good LER performance, and to provide a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition comprise: (A) resin in which solubility in an alkali developer by action of acid increases; and (B) a compound generating the acid by irradiation with an actinic ray or radiation. The actinic ray-sensitive or radiation-sensitive resin composition contains 10 to 30 mass% of (B) the compound generating the acid by the irradiation with the actinic ray or radiation on the basis of entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 要解决的问题：提供具有改善抗蚀剂图案的锥形轮廓并且能够形成具有良好的LER性能的图案的效果的光化射线敏感或辐射敏感性树脂组合物，并且提供图案形成方法 使用组合。 解决方案：使用该组合物的光化射线敏感性或辐射敏感性树脂组合物和图案形成方法包括：（A）通过酸作用增加对碱性显影剂的溶解度的树脂; 和（B）通过用光化射线或辐射照射产生酸的化合物。 光化射线敏感性或辐射敏感性树脂组合物含有10〜30质量％的（B）通过用光化射线照射而产生酸的化合物或辐射，其基于光化射线敏感或辐射的全部固体含量 敏感树脂组合物。 版权所有（C）2013，JPO＆INPIT