公开(公告)号：EP2776889A4

公开(公告)日：2015-06-17

申请号：EP12847779

申请日：2012-11-02

Applicant: FUJIFILM CORP

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI ,  ITO JUNICHI ,  KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHIDOME MASAHIRO ,  SUGIYAMA SHINICHI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

公开(公告)号：EP2580624A4

公开(公告)日：2014-07-30

申请号：EP11849906

申请日：2011-12-22

Applicant: FUJIFILM CORP

Inventor： MATSUDA TOMOKI ,  SHIBUYA AKINORU ,  TOKUGAWA YOKO ,  YAMAGUCHI SHUHEI ,  FUJITA MITSUHIRO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

公开(公告)号：JP2013044810A

公开(公告)日：2013-03-04

申请号：JP2011180895

申请日：2011-08-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUDA TOMOKI ,  TOKUGAWA YOKO ,  SHIBUYA AKINORI

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/10 ,  C07C309/17 ,  C07C311/48 ,  C07D333/46 ,  C07D333/76 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition having all of high sensitivity, excellent exposure latitude, and excellent line edge roughness performance at a high level; an actinic ray-sensitive or radiation-sensitive film using the composition; and a pattern formation method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by the following general formula (1-1). In the formula, Rrepresents an alkyl group, an alkenyl group, an alkoxy group, an aliphatic cyclic group, an aromatic hydrocarbon group or a heterocyclic group; Rrepresents a hydrogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aliphatic cyclic group, an aromatic hydrocarbon group, a heterocyclic group, a cyano group or an alkoxycarbonyl group; and Rrepresents an alkylene group where one or more -CH- groups may be substituted by an ether group, a carbonyl group, an ester group, an amide group, an urethane group or an urea group.

Abstract translation: 要解决的问题：提供：具有高灵敏度，优异的曝光宽容度以及优异的线边缘粗糙度性能的光化射线敏感或辐射敏感性树脂组合物; 使用该组合物的光化射线敏感或辐射敏感膜; 和图案形成方法。 光解射线敏感性或辐射敏感性树脂组合物含有（A）由以下通式（1-1）表示的化合物。 式中，R“表示烷基，烯基，烷氧基，脂肪族环，芳香族烃基，杂环基等。 R 2 表示氢原子，烷基，烷氧基，烯基，脂族环状基团，芳香族烃基，杂环基，氰基或 烷氧基羰基 R 3表示亚烷基，其中一个或多个-CH- SB POS =“2” - >可以被醚基取代，羰基 基团，酯基，酰胺基，氨基甲酸酯基或脲基。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013130654A

公开(公告)日：2013-07-04

申请号：JP2011278800

申请日：2011-12-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YOSHITOME MASAHIRO ,  KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  IWATO KAORU ,  SUGIYAMA SHINICHI ,  TANGO NAOHIRO ,  FUKUHARA TOSHIAKI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  TOKUGAWA YOKO

IPC: G03F7/039 ,  C08F8/12 ,  C08F20/28 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive resin composition which is excellent in exposure latitude and generates little scum, a resist film formed using the composition, and a pattern forming method using the composition, and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: An actinic ray sensitive resin composition contains (A) a resin having a repeating unit represented by the following general formula (1) and a repeating unit which is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound, represented by the following general formula (Z-1), which generates an acid by irradiation with an actinic ray. K represents a cyclic acid anhydride group, and A represents a cyclic organic group.

Abstract translation: 要解决的问题：为了提供曝光宽容性优异并且几乎没有浮渣的光化射线敏感性树脂组合物，使用该组合物形成的抗蚀剂膜以及使用该组合物的图案形成方法，并提供一种电子制造方法 装置和电子装置。光解射线敏感性树脂组合物含有（A）具有下述通式（1）表示的重复单元的树脂和通过酸作用而分解产生碱的重复单元 - （B）由以下通式（Z-1）表示的化合物，其通过用光化射线照射产生酸。 K表示环状酸酐基，A表示环状有机基团。

公开(公告)号：JP2013083971A

公开(公告)日：2013-05-09

申请号：JP2012215289

申请日：2012-09-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： ITO JUNICHI ,  SHIBUYA AKINORI ,  MATSUDA TOMOKI ,  TOKUGAWA YOKO ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C07C381/12 ,  C08F8/12 ,  C09K3/00 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/027 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  C07D279/30 ,  C07D307/33 ,  C07D327/08 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has excellent pattern roughness properties such as exposure latitude and LWR and less variation in performance with time, a radiation-sensitive film and a pattern formation method using the same, and an electronic device manufacturing method and an electronic device.SOLUTION: A radiation-sensitive resin composition contains a compound represented by the following general formula (1) which decomposes to generate acid under exposure of radiation and a resin which decomposes under the action of acid so as to increase solubility in alkali developer. In general formula (1), Rand Reach independently represent an aryl, and Rand Rmay be connected. Rand Reach independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, or an aryl group. Rand Rmay be also connected. Rrepresents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group, or an alkyl carbonyl group. Rmay be connected to Ror R.

Abstract translation: 要解决的问题：为了提供具有优异的图案粗糙性，例如曝光宽容度和LWR以及随时间的性能变化较小的辐射敏感性树脂组合物，使用该辐射敏感性树脂组合物的图案形成方法， 电子装置的制造方法和电子装置。 解决方案：辐射敏感性树脂组合物含有由下列通式（1）表示的化合物，其在辐射暴露下分解产生酸，并在酸的作用下分解树脂，以增加在碱性显影剂中的溶解度 。 在通式（1）中，R 1 和R 2 各自独立地表示芳基，R 1 和R 2 。 R 3 和R 4 各自独立地表示氢原子，烷基，环烷基，烯基或 芳基。 也可以连接R 3 和R 4 。 R“表示烷基，环烷基，烯基，芳基，芳烷基或烷基羰基。 可以将R 5 连接到R 3 或R 4 。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012133331A

公开(公告)日：2012-07-12

申请号：JP2011246335

申请日：2011-11-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition improved in development defects and capable of forming a good pattern profile, and to provide an actinic ray-sensitive or radiation-sensitive film formed by using the above composition, and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a compound generating an acid expressed by general formula (I) or (I') by irradiation with actinic rays or radiation; and (B) a resin that is decomposed by an action of an acid to increase the solubility with an alkali developing solution. Each of symbols in general formulae (I) and (I') indicates the meaning described in the claims of the present invention.

Abstract translation: 要解决的问题：提供改善显影缺陷并且能够形成良好图案轮廓的光化射线敏感或辐射敏感性树脂组合物，并且提供通过使用形成的光化射线敏感或辐射敏感膜 上述组合物和使用该组合物的图案形成方法。 光解射线敏感性或辐射敏感性树脂组合物含有：（A）通过用光化射线或辐射照射产生由通式（I）或（I'）表示的酸的化合物; 和（B）通过酸的作用分解以增加与碱性显影液的溶解度的树脂。 通式（I）和（I'）中的每个符号表示在本发明的权利要求中描述的含义。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2014006491A

公开(公告)日：2014-01-16

申请号：JP2012232271

申请日：2012-10-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI ,  ITO JUNICHI ,  KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI

IPC: G03F7/004 ,  C08F20/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide: an actinic ray- or radiation-sensitive resin composition which is excellent in exposure latitude and pattern roughness such as LWR, reduces occurrence of particles over time, and reduces, in the case of liquid-immersion exposure, elution of generated acids into an immersion liquid; an actinic ray- or radiation-sensitive film based on the same; and a method of forming a pattern.SOLUTION: The actinic ray- or radiation-sensitive resin composition includes (A) a compound represented by the specified general formula (1) that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract translation: 要解决的问题：提供：曝光宽容度和图案粗糙度如LWR优异的光化射线或辐射敏感性树脂组合物可以减少颗粒随时间的发生，并且在液浸曝光的情况下， 将产生的酸溶解到浸液中; 基于其的光化射线或辐射敏感膜; 以及形成图案的方法。解决方案：光化射线或辐射敏感性树脂组合物包含（A）当暴露于光化射线或辐射时产生酸的特定通式（1）表示的化合物和（B ）树脂。

公开(公告)号：JP2013167731A

公开(公告)日：2013-08-29

申请号：JP2012030486

申请日：2012-02-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI ,  ITO JUNICHI ,  KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI

IPC: G03F7/004 ,  C08F220/26 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of suppressing pattern collapse and improving LWR (line width roughness) and storage stability, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) resin having a repeating unit expressed by the following general formula (1) and a repeating unit that is decomposed by an action of an acid to increase the solubility in an alkali developing solution; (B) a compound Rincluding at least one nitrogen atom or a compound which is an ionic compound including a basic moiety Rincluding at least one nitrogen atom, both having such a property that R-Hor R-Has conjugated acids thereof has a pKa of 8 or lower; and (C) a compound that generates an acid by irradiation with actinic rays or radiation. In the general formula (1), L represents a single bond or a divalent connecting group; Rrepresents a hydrogen atom or an alkyl group; and Z represents a cyclic acid anhydride structure.

Abstract translation: 要解决的问题：提供能够抑制图案塌陷并提高LWR（线宽粗糙度）和保存稳定性的光化射线敏感性或辐射敏感性树脂组合物以及使用该组合物的图案形成方法。解决方案： 敏感或辐射敏感性树脂组合物包含：（A）具有由以下通式（1）表示的重复单元的树脂和通过酸作用分解以提高在碱性显影液中的溶解度的重复单元; （B）包含至少一个氮原子的化合物或作为包含碱性部分的离子化合物的化合物包含至少一个氮原子的化合物，其具有R-Hor R-has共轭酸的pKa为8的性质 或更低; 和（C）通过用光化射线或辐射照射产生酸的化合物。 在通式（1）中，L表示单键或二价连接基团; R表示氢原子或烷基; Z表示环状酸酐结构。

公开(公告)号：JP2013044811A

公开(公告)日：2013-03-04

申请号：JP2011180896

申请日：2011-08-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO

IPC: G03F7/004 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07D217/08 ,  C07D335/06 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition excellent in exposure latitude and pattern roughness such as LWR (line width roughness) and having little elution of a generated acid in an immersion liquid, and to provide a resist film and a pattern forming method using the composition, and a method for manufacturing an electronic device and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a compound expressed by general formula (I) and (B) a resin that is decomposed by an action of an acid to increase the solubility with an alkali developing solution.

Abstract translation: 要解决的问题：提供曝光宽容度和图案粗糙度如LWR（线宽粗糙度）并且在浸没液中几乎不洗脱所产生的酸的光化射线敏感或辐射敏感性树脂组合物，以及 以提供使用该组合物的抗蚀剂膜和图案形成方法，以及电子器件和电子器件的制造方法。 光敏性或辐射敏感性树脂组合物包含（A）由通式（I）表示的化合物和（B）通过酸的作用分解以增加溶解度的树脂 碱显影液。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013020089A

公开(公告)日：2013-01-31

申请号：JP2011153233

申请日：2011-07-11

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  MATSUDA TOMOKI ,  SHIMONO KATSUHIRO ,  TOKUGAWA YOKO

IPC: G03F7/004 ,  C07C309/06 ,  C08F20/10 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07D209/82 ,  C07D307/91 ,  C07D333/76 ,  C07D409/14 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition ensuring excellent high exposure sensitivity and little development defect, a resist film and a pattern forming method each using the composition, a manufacturing method of an electronic device and an electronic device.SOLUTION: An actinic-ray- or radiation-sensitive resin composition includes: (A) a compound represented by the following general formula (I); and (B) a resin. In the general formula (I), X represents an oxygen atom, a sulfur atom or -N(Rx)-; each of R1 to R8 and Rx independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an alkylcarbonyloxy group, an aryl group, an aryloxy group, an aryloxycarbonyl group, or an arylcarbonyloxy group; and Rto Rmay combine with each other to form a ring, provided that at least two members out of Rto Rrepresent a structure represented by the following general formula (II).

Abstract translation: 要解决的问题：提供确保优异的高曝光灵敏度和小的显影缺陷的光化射线或辐射敏感性树脂组合物，使用该组合物的抗蚀剂膜和图案形成方法，电子学的制造方法 设备和电子设备。 光敏射线或辐射敏感性树脂组合物包括：（A）由以下通式（I）表示的化合物： 和（B）树脂。 在通式（I）中，X表示氧原子，硫原子或-N（Rx） - ; R 1至R 8和R x各自独立地表示氢原子，烷基，环烷基，烷氧基，烷氧基羰基，酰基，烷基羰基氧基，芳基，芳氧基，芳氧基羰基或 芳基羰基氧基; 并且R 1 到R 8 可以彼此组合以形成环，条件是R < SB POS =“POST”> 1 到R 8 表示由以下通式（II）表示的结构。 版权所有（C）2013，JPO＆INPIT