中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

33 records (took 0.048 seconds)

    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film using the composition, and pattern formation method
    4.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film using the composition, and pattern formation method 有权
    化学敏感性或辐射敏感性树脂组合物，以及使用组合物的丙烯酸敏感或辐射敏感性膜，以及图案形成方法

    公开(公告)号：JP2013044810A

    公开(公告)日：2013-03-04

    申请号：JP2011180895

    申请日：2011-08-22

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： MATSUDA TOMOKI ,  TOKUGAWA YOKO ,  SHIBUYA AKINORI

    IPC: G03F7/004 ,  C07C309/06 ,  C07C309/10 ,  C07C309/17 ,  C07C311/48 ,  C07D333/46 ,  C07D333/76 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

    Abstract: PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition having all of high sensitivity, excellent exposure latitude, and excellent line edge roughness performance at a high level; an actinic ray-sensitive or radiation-sensitive film using the composition; and a pattern formation method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by the following general formula (1-1). In the formula, Rrepresents an alkyl group, an alkenyl group, an alkoxy group, an aliphatic cyclic group, an aromatic hydrocarbon group or a heterocyclic group; Rrepresents a hydrogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aliphatic cyclic group, an aromatic hydrocarbon group, a heterocyclic group, a cyano group or an alkoxycarbonyl group; and Rrepresents an alkylene group where one or more -CH- groups may be substituted by an ether group, a carbonyl group, an ester group, an amide group, an urethane group or an urea group.

    Abstract translation: 要解决的问题：提供：具有高灵敏度，优异的曝光宽容度以及优异的线边缘粗糙度性能的光化射线敏感或辐射敏感性树脂组合物; 使用该组合物的光化射线敏感或辐射敏感膜; 和图案形成方法。 光解射线敏感性或辐射敏感性树脂组合物含有（A）由以下通式（1-1）表示的化合物。 式中，R“表示烷基，烯基，烷氧基，脂肪族环，芳香族烃基，杂环基等。 R 2 表示氢原子，烷基，烷氧基，烯基，脂族环状基团，芳香族烃基，杂环基，氰基或 烷氧基羰基 R 3表示亚烷基，其中一个或多个-CH- SB POS =“2” - >可以被醚基取代，羰基 基团，酯基，酰胺基，氨基甲酸酯基或脲基。 版权所有（C）2013，JPO＆INPIT

    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film, method for forming pattern, method for manufacturing electronic device and electronic device using the composition
    6.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film, method for forming pattern, method for manufacturing electronic device and electronic device using the composition 有权
    化学敏感性或辐射敏感性树脂组合物和丙烯酸类敏感性或辐射敏感性膜，形成图案的方法，使用该组合物制造电子设备的方法和电子设备

    公开(公告)号：JP2013120245A

    公开(公告)日：2013-06-17

    申请号：JP2011267348

    申请日：2011-12-06

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TANGO NAOHIRO ,  KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  IWATO KAORU ,  SUGIYAMA SHINICHI ,  FUKUHARA TOSHIAKI ,  YOSHITOME MASAHIRO ,  TOKUGAWA YOKO

    IPC: G03F7/039 ,  C08F220/26 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of satisfying, in a high level, all of reducing the number of development defects (bridge defects), reducing fluctuations of a critical dimension (CD) of a pattern line width per 1°C of PEB temperature (PEB temperature dependence), and enlarging a focus latitude in a space (space-DOF (depth of focus)), and to provide an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin, a method for forming a pattern, a method for manufacturing an electronic device, and an electronic device using the above composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having a repeating unit expressed by general formula (1A) and a repeating unit expressed by general formula (1B) that is decomposed by an acid to generate a carboxyl group, and (B) a compound that generates an acid by irradiation with actinic rays or radiation. In general formula (1A), L represents a single bond or a divalent connecting group; and Z represents a cyclic acid anhydride group.

    Abstract translation: 要解决的问题：提供能够高水平地满足显影缺陷（桥缺陷）数量的所有降低的光化学敏感或辐射敏感性树脂组合物，减少临界尺寸的波动（ CD），PEB温度（PEB温度依赖性）每1℃的图案线宽度，以及放大空间（空间自由度（深度焦点））中的焦点纬度），并且提供光化学敏感或辐射 - 使用光化射线敏感或辐射敏感树脂的感光膜，形成图案的方法，使用上述组合物的电子器件的制造方法和电子器件。 光敏性或辐射敏感性树脂组合物包含（A）具有由通式（1A）表示的重复单元的树脂和由酸分解的通式（1B）表示的重复单元 以产生羧基，和（B）通过用光化射线或辐射照射产生酸的化合物。 在通式（1A）中，L表示单键或二价连接基团; Z表示环状酸酐基。 版权所有（C）2013，JPO＆INPIT

    Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the composition, and method for manufacturing electronic device and electronic device
    7.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the composition, and method for manufacturing electronic device and electronic device 有权
    丙烯酸类敏感性或辐射敏感性树脂组合物，耐腐蚀膜和使用该组合物的图案形成方法，以及用于制造电子器件和电子器件的方法

    公开(公告)号：JP2013113944A

    公开(公告)日：2013-06-10

    申请号：JP2011258327

    申请日：2011-11-25

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： SUGIYAMA SHINICHI ,  KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  IWATO KAORU ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  TOKUGAWA YOKO ,  YOSHITOME MASAHIRO

    IPC: G03F7/039 ,  C08F20/28 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition achieving a favorable cross-sectional shape with high rectangularity, a high film residual rate and reduction of bridge defects, and to provide a resist film and a pattern forming method using the composition, and a method for manufacturing an electronic device and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin having a repeating unit expressed by following general formula (1), a repeating unit having a lactone structure or a sultone structure, and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group; and (B) a compound that generates an acid by irradiation with actinic rays or radiation. In general formula (1), L represents a single bond or a divalent connecting group; Rrepresents a hydrogen atom or an alkyl group; and Z represents a cyclic acid anhydride group.

    Abstract translation: 要解决的问题：提供具有高矩形性，高膜残留率和桥缺陷减少的良好横截面形状的光化射线敏感或辐射敏感性树脂组合物，并提供抗蚀剂膜和 使用该组合物的图案形成方法，以及电子设备和电子设备的制造方法。 光敏性或辐射敏感性树脂组合物包括：（A）具有由以下通式（1）表示的重复单元的树脂，具有内酯结构或磺内酯结构的重复单元，和 通过酸的作用分解以产生碱溶性基团的重复单元; 和（B）通过用光化射线或辐射照射产生酸的化合物。 在通式（1）中，L表示单键或二价连接基团; R 1 表示氢原子或烷基; Z表示环状酸酐基。 版权所有（C）2013，JPO＆INPIT

    Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
    9.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition 有权
    丙烯酸类敏感性或辐射敏感性树脂组合物，以及使用该组合物的耐腐蚀膜和图案形成方法

    公开(公告)号：JP2012159690A

    公开(公告)日：2012-08-23

    申请号：JP2011019329

    申请日：2011-01-31

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： HIRANO DAISUKE ,  FUJITA MITSUHIRO ,  MATSUDA TOMOKI ,  TOKUGAWA YOKO

    IPC: G03F7/039 ,  C08F20/10 ,  G03F7/004 ,  G03F7/033 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in line width roughness (LWR) performance and corner proximity performance, and to provide a resist film and a pattern forming method using the composition.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that has a group represented by general formula (A1) and exhibits increase in solubility with an alkali developing solution by an action of an acid; (B) an onium salt compound that has a nitrogen atom in a cationic moiety and is decomposed by irradiation with actinic rays or radiation to generate an acid; and (D) a solvent. A resist film and a pattern forming method using the above composition are also provided. In general formula (A1), Rrepresents an oxygen atom or a sulfur atom; Rrepresents a hydrogen atom or a group represented by -COR; Rrepresents a monovalent hydrocarbon group which may have a hetero atom; and Rrepresents a hydrogen atom, methyl group, trifluoromethyl group or cyano group.

    Abstract translation: 要解决的问题：提供能够形成线宽粗糙度（LWR）性能和角接近性能优异的图案的光化射线敏感或辐射敏感性树脂组合物，并提供抗蚀剂膜和图案形成 方法使用该组合物。 提供了一种光化射线敏感或辐射敏感性树脂组合物，其包括：（A）具有由通式（A1）表示的基团并通过作用显示出与碱性显影液的溶解度增加的树脂 的酸 （B）在阳离子部分具有氮原子并通过用光化射线或辐射照射而分解产生酸的鎓盐化合物; 和（D）溶剂。 还提供了使用上述组合物的抗蚀剂膜和图案形成方法。 在通式（A1）中，R 3 表示氧原子或硫原子; R 4 表示氢原子或由-CO 2表示的基团。 SB>; R 5 表示可以具有杂原子的一价烃基; R 6表示氢原子，甲基，三氟甲基或氰基。 版权所有（C）2012，JPO＆INPIT

    Photosensitive resin composition, production method of cured film using the composition, cured film, liquid crystal display device and organic electroluminescence display device
    10.
    发明专利
    Photosensitive resin composition, production method of cured film using the composition, cured film, liquid crystal display device and organic electroluminescence display device 审中-公开
    光敏树脂组合物，使用组合物的固化膜的生产方法，固化膜，液晶显示装置和有机电致发光显示装置

    公开(公告)号：JP2014071308A

    公开(公告)日：2014-04-21

    申请号：JP2012217641

    申请日：2012-09-28

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： MATSUDA TOMOKI ,  YAMAZAKI KENTA ,  YONEZAWA HIROYUKI ,  SHIMONO KATSUHIRO

    IPC: G03F7/039 ,  C07D331/02 ,  C08G75/08 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a uniform contact hole can be formed while maintaining high sensitivity.SOLUTION: The photosensitive resin composition comprises: (1) a polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group and (a2) a structural unit having a crosslinking group, or (2) a polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group and a polymer having (a2) a structural unit having a crosslinking group; (B) a photo-acid generator; (C) a compound having a thiirane ring in the molecule (excluding a compound having a thiirane ring in a side chain of a structural unit derived from a (meth)acrylate); and (D) a solvent.

    Abstract translation: 要解决的问题：提供一种能够在保持高灵敏度的同时形成均匀接触孔的感光性树脂组合物。溶解性：感光性树脂组合物包含：（1）具有（a1）具有以下基团的结构单元的聚合物，其中， 酸基被酸可分解基团保护，（a2）具有交联基团的结构单元，或（2）具有（a1）具有酸基被酸分解基团保护的基团的结构单元的聚合物 和具有（a2）具有交联基团的结构单元的聚合物; （B）光酸发生器; （C）在分子中具有硫脲环的化合物（不包括衍生自（甲基）丙烯酸酯的结构单元的侧链中的具有硫脲环的化合物）; 和（D）溶剂。

Patent Agency Ranking