公开(公告)号：KR20200128071A

公开(公告)日：2020-11-11

申请号：KR20207027692

申请日：2019-02-26

Applicant: FUJIFILM CORP

Inventor： NIHASHI WATARU ,  SHIRAKAWA MICHIHIRO ,  OGAWA MICHIHIRO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/26

Abstract: 본발명은, 미싱결함의발생이억제되고, 또한패턴붕괴가억제된패턴을형성가능한 EUV광용네거티브형감광성조성물을제공한다. 패턴형성방법, 및전자디바이스의제조방법을제공한다. 본발명의 EUV광용네거티브형감광성조성물은, 산의작용에의하여탈리되는보호기로극성기가보호된산분해성기를갖는반복단위를갖는수지 A, 및광산발생제를포함하며, 수지 A로부터보호기가탈리된후의수지의 ClogP값이 1.4 이하이고, 식 (1)로계산되는값 x가 1.2 이상이며, 식 (1)로계산되는값 x와, 식 (2)로계산되는값 y가, 식 (3)의관계를충족시킨다.

公开(公告)号：KR20200132973A

公开(公告)日：2020-11-25

申请号：KR20207029889

申请日：2019-04-12

Applicant: FUJIFILM CORP

Inventor： SHIRAKAWA MICHIHIRO ,  FURUTANI HAJIME ,  OKA HIRONORI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20

Abstract: Z-factor가양호하고, 또한브리지결함이억제된패턴을형성가능한 EUV광용감광성조성물, 패턴형성방법, 및전자디바이스의제조방법을제공한다. EUV광용감광성조성물은, 소정의수지, 및광산발생제를포함하거나, 또는광산발생기를갖는반복단위를갖는, 소정의수지를포함하며, 요건 1~요건 3을충족시킨다. 요건 1: 식 (1)로구해지는 A값이 0.14 이상이다. 식 (1): A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127) 요건 2: EUV광용감광성조성물중의고형분농도가 5.0질량% 이하이다. 요건 3: 광산발생제의함유량이, EUV광용감광성조성물중의전고형분에대하여, 5~50질량%이다.

公开(公告)号：SG192982A1

公开(公告)日：2013-09-30

申请号：SG2013065016

申请日：2012-02-24

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITOH SHOICHI

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

公开(公告)号：SG178526A1

公开(公告)日：2012-03-29

申请号：SG2012012027

申请日：2010-08-17

Applicant: FUJIFILM CORP

Inventor： SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  KATO TAKAYUKI ,  TANGO NAOHIRO

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein a molar extinction coefficient e of the compound (PA) at a wavelength of 193 nm as measured in acetonitrile solvent is 55,000 or less, and a pattern forming method using the composition are provided.

公开(公告)号：SG11201606466YA

公开(公告)日：2016-09-29

申请号：SG11201606466Y

申请日：2015-02-04

Applicant: FUJIFILM CORP

Inventor： UEBA RYOSUKE ,  IGUCHI NAOYA ,  YAMANAKA TSUKASA ,  TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  KATO KEITA

IPC: G03F7/40 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：EP2715451A4

公开(公告)日：2015-03-04

申请号：EP12793094

申请日：2012-05-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  SHIRAKAWA MICHIHIRO ,  TAKAHASHI HIDENORI ,  SAITOH SHOICHI ,  YOSHINO FUMIHIRO

IPC: G03F7/039 ,  C08F220/12 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0382 ,  C08F220/12 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/325

公开(公告)号：EP2681623A4

公开(公告)日：2015-05-06

申请号：EP12752967

申请日：2012-02-24

Applicant: FUJIFILM CORP

Inventor： TAKAHASHI HIDENORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITOH SHOICHI

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

公开(公告)号：EP2478415A4

公开(公告)日：2015-02-25

申请号：EP10817324

申请日：2010-09-16

Applicant: FUJIFILM CORP

Inventor： IIZUKA YUSUKE ,  TAKAHASHI HIDENORI ,  SHIRAKAWA MICHIHIRO ,  YOSHIDOME MASAHIRO ,  HIRANO SHUJI

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F220/26 ,  G03F7/0397 ,  G03F7/2041

公开(公告)号：EP2470957A4

公开(公告)日：2015-06-10

申请号：EP10811784

申请日：2010-08-17

Applicant: FUJIFILM CORP

Inventor： SHIBUYA AKINORI ,  YAMAGUCHI SHUBEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  KATO TAKAYUKI ,  TANGO NAOHIRO

IPC: G03F7/004 ,  C08F20/10 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

公开(公告)号：EP2414896A4

公开(公告)日：2012-08-08

申请号：EP10758878

申请日：2010-03-26

Applicant: FUJIFILM CORP

Inventor： TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO ,  YAMAGUCHI SHUHEI ,  SHUBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C07C381/12 ,  C07D217/08 ,  C07D285/00 ,  C07D333/16 ,  C08F20/10 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C08F220/18 ,  C08F220/28 ,  C08F220/42 ,  G03F7/0397 ,  G03F7/2041 ,  C08F220/22

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.