Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor photocathode capable of improving quantum efficiency as compared with the conventional GaN photocathode, and a method for manufacturing the semiconductor photocathode.SOLUTION: When Xrepresents a minimum value for a composition ratio X in an intermediate region 1M, and Xrepresents a minimum value for a composition ratio X in a second region 12, in a first region 11, 0≤g(x)≤Xis satisfied, in the intermediate region 1M, g(x) is a monotone decreasing function and g(x)≤Xis satisfied, in the second region 12, g(x) is a monotone decreasing function or a constant value, in a case where g(x) in the second region 12 is a monotone decreasing function, a thickness D1 of the first region 11 is 18 (nm) or more, and in a case where g(x) in the second region 12 is a constant value, the thickness D1 of the first region 11 is 31 (nm) or more.
Abstract:
PROBLEM TO BE SOLVED: To provide a photocathode which can make various characteristics improved. SOLUTION: In the photocathode 10, an intermediate layer 14, an underlying layer 16, and a photoelectron emitting layer 18 are formed in this order on a substrate 12. The photoelectron emitting layer 18 contains Sb and Bi, and is equipped with a function of emitting photoelectrons outside by incident light. In the photoelectron emitting layer 18, Bi of 32 mol% or less relative to Sb and Bi is contained. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a photocathode capable of improving various characteristics.SOLUTION: In a photocathode 10, an intermediate layer 14, an underlying layer 16, and a photoelectron emitting layer 18 are formed in this order on a substrate 12. The photoelectron emitting layer 18 contains Sb and Bi, and comprises a function for emitting photoelectrons outside by incident light. The photoelectron emitting layer 18 contains the Bi of 6.9 mol% or more and 32 mol% or less to SbBi.
Abstract:
PROBLEM TO BE SOLVED: To provide a photocathode which can improve various characteristics.SOLUTION: In a photocathode 10, an intermediate layer 14, an underlying layer 16, and a photoelectron emitting layer 18 are formed in this order on a substrate 12. The photoelectron emitting layer 18 contains Sb and Bi, and comprises a function of emitting photoelectrons outside by incident light. The photoelectron emitting layer 18 contains the Bi of 32 mol% or less relative to SbBi.
Abstract:
PROBLEM TO BE SOLVED: To improve the characteristics of a GaN-system compound semiconductor layer, by forming an AlN layer containing Mg on a substrate, and forming the GaN-system compound semiconductor layer on the AlN layer at a specified temperature. SOLUTION: A saphire substrate 1 is maintained at, e.g. 1,000 deg.C, NH3 is introduced into a growing chamber and the surface of the substrate 1 is nitrided. Then, the temperature of the substrate 1 is lowered to, e.g. 600 deg.C, trimethyl aluminum and NH3 are introduced, bis(ethyl cyclopentadienyl) Mg is introduced and a capped AlN layer 2 is formed. After the AlN layer 2, wherein Mg is added, is formed on the substrate 1, the substrate 1 is heated. With the temperature of the substrate 1 being maintained at, e.g. 950 deg.C, trimethyl gallium and NH3 are introduced into the growing chamber, and a P-type GaN layer 3 is formed. When the GaN layer 3 is formed, Mg in the AlN layer 2 is diffused in the GaN layer 3 and made active, and the P-type GaN layer 3 is formed.