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公开(公告)号:JPS63225603A
公开(公告)日:1988-09-20
申请号:JP26553987
申请日:1987-10-22
Applicant: HOECHST AG
Inventor: WIENERS GERHARD , HEUMUELLER RUDOLF , COUTANDIN JOCHEN , GROH WERNER , HERBRECHTSMEIER PETER
IPC: G02B6/00 , B29D11/00 , C08F20/22 , C08F220/22 , G02B1/04
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公开(公告)号:JPS63277207A
公开(公告)日:1988-11-15
申请号:JP26554087
申请日:1987-10-22
Applicant: HOECHST AG
Inventor: WIENERS GERHARD , HEUMUELLER RUDOLF , COUTANDIN JOCHEN , GROH WERNER , HERBRECHTSMEIER PETER
IPC: G02B6/00 , B29D11/00 , C08F2/02 , C08F20/22 , C08F220/22
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公开(公告)号:CA1303626C
公开(公告)日:1992-06-16
申请号:CA551842
申请日:1987-11-13
Applicant: HOECHST AG
Inventor: WEGENER PETER , HEUMUELLER RUDOLF
IPC: C07C69/54 , C07B59/00 , C07C67/00 , C07C67/08 , C07C69/013 , C07C69/533 , C07C69/653 , C07C253/00 , C07C255/14 , C07C255/16 , C08F20/10 , C08F20/12 , C08F20/18 , C08F20/22 , C08F20/34 , G02B1/04
Abstract: HOE 86/F 281 of the disclosure: Esterification of wholly or partially deuterated (meth)acrylic acid with alcohols which have only a little hydrogen or none at all in the molecule gives monomers which, after polymerization give transparent polymeric materials with low attenuation of light waves and with a high glass temperature.
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公开(公告)号:CA1280118C
公开(公告)日:1991-02-12
申请号:CA509875
申请日:1986-05-23
Applicant: HOECHST AG
Inventor: HEUMUELLER RUDOLF , SIEGEMUND GUENTER , GROH WERNER , WIENERS GERHARD , HERBRECHTSMEIER PETER
IPC: C07C67/465 , C07C51/34 , C07C51/377 , C07C51/60 , C07C57/54 , C07C67/08 , C07C67/14 , C07C67/31 , C07C69/63 , C07C69/653 , C07C69/675 , C08F20/00 , C08F20/02 , C08F20/10 , C08F20/22 , C08F20/24 , C08F220/02 , C08F220/10 , C08F220/18 , C08F220/22 , G02B1/04 , G02B6/00
Abstract: of the disclosure: .alpha.-Fluoroacrylic acid esters and polymers thereof Esters of .alpha.-fluoroacrylic acid are accessible by hydrolysis of an .alpha.-hydroxymethyl-.alpha.-fluoromalonic acid ester, decarboxylation and dehydration of the hydrolysis product and subsequent esterification of the resulting .alpha.-fluoro-acrylic acid with an alcohol. The esters are polymerizable and are suitable for use as a starting material for preparing fluoropolymers which in turn are usable as materials for manufacturing transparent articles. The polymers are high-molecular and non-crystalline and have softening temperatures of above 100.degree.C.
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公开(公告)号:DK596987D0
公开(公告)日:1987-11-13
申请号:DK596987
申请日:1987-11-13
Applicant: HOECHST AG
Inventor: WEGENER PETER , HEUMUELLER RUDOLF
IPC: C07C69/54 , C07B59/00 , C07C67/00 , C07C67/08 , C07C69/013 , C07C69/533 , C07C69/653 , C07C253/00 , C07C255/14 , C07C255/16 , C08F20/10 , C08F20/12 , C08F20/18 , C08F20/22 , C08F20/34 , G02B1/04 , C07C121/38
Abstract: By esterification of completely or partially deuterated (meth)acrylic acid with alcohols which contain no or only a little hydrogen in the molecule, monomers are obtained which, after polymerisation, yield transparent polymer materials having low damping for light waves and a high glass transition temperature.
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公开(公告)号:AT115593T
公开(公告)日:1994-12-15
申请号:AT90906164
申请日:1990-04-12
Applicant: HOECHST AG
Inventor: GROH WERNER , HERBRECHTSMEIER PETER , HEUMUELLER RUDOLF , THEIS JUERGEN , WIENERS GERHARD
IPC: C08F20/02 , C08F16/14 , C08F20/10 , C08F20/22 , C08F214/26 , C08F216/14 , C08F220/22 , G02B1/04 , G02B6/00 , G09B1/04
Abstract: A thermoplastic molding compound consisting of units of 2,3-difluoroacrylic acid esters or their deuterated derivatives, or containing units of these esters, is distinguished by a high glass transition temperature and a high transparency. It is therefore suitable for the manufacture of beam waveguides for long transmission distances and high continuous use temperatures.
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公开(公告)号:DK596987A
公开(公告)日:1988-05-16
申请号:DK596987
申请日:1987-11-13
Applicant: HOECHST AG
Inventor: WEGENER PETER , HEUMUELLER RUDOLF
IPC: C07C69/54 , C07B59/00 , C07C67/00 , C07C67/08 , C07C69/013 , C07C69/533 , C07C69/653 , C07C253/00 , C07C255/14 , C07C255/16 , C08F20/10 , C08F20/12 , C08F20/18 , C08F20/22 , C08F20/34 , G02B1/04 , C07C121/38
Abstract: By esterification of completely or partially deuterated (meth)acrylic acid with alcohols which contain no or only a little hydrogen in the molecule, monomers are obtained which, after polymerisation, yield transparent polymer materials having low damping for light waves and a high glass transition temperature.
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公开(公告)号:DE3636401A1
公开(公告)日:1988-04-28
申请号:DE3636401
申请日:1986-10-25
Applicant: HOECHST AG
Inventor: WIENERS GERHARD , HEUMUELLER RUDOLF , COUTANDIN JOCHEN , GROH WERNER , HERBRECHTSMEIER PETER
Abstract: A transparent material of very good heat resistance and very good light conductivity is essentially composed of a polymer derived mainly from bromophenyl acrylates or bromophenyl methacrylates.
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公开(公告)号:CA2061771A1
公开(公告)日:1993-12-15
申请号:CA2061771
申请日:1992-02-25
Applicant: HOECHST AG
Inventor: GROH WERNER , HEUMUELLER RUDOLF , SCHUETZE GERALD , STERN ROLAND , WIENERS GERHARD
IPC: C08F220/18 , C08F20/10 , C08F220/10 , C08F220/22 , G02B1/04 , G02B6/00 , C08F214/00 , G02B6/18
Abstract: of the disclosure Transparent thermoplastic molding composition, process for its preparation and its use Transparent thermoplastic molding composition of a polymer containing a) 10 to 95 % by weight of units which are derived from a compound of the formula (I) R12C=CF-COO-C(CF3)2R2 (I) b) 90 to 5 % by weight of units which are derived from one or more compounds of the formula (II) (II) and c) 0 to 85 % by weight of units which are derived from a compound of the formula (III) R72C = CF-COO-CR83 (III) The molding composition is used for the production of optical objects, in particular for the production of optical fibers.
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公开(公告)号:CA2092693A1
公开(公告)日:1992-03-14
申请号:CA2092693
申请日:1991-09-12
Applicant: HOECHST AG
Inventor: DAPPERHELD STEFFEN , HEUMUELLER RUDOLF , ULMSCHNEIDER DIETER , WILDT MANFRED
Abstract: WO 92/05299 PCT/EP91/0173B Process for the preparation of halogenated acrylic acids Process for the preparation of compounds of the formula (I) (I) by electrolytic reduction. R1 is a fluorine atom or a methyl or deuteromethyl group; R2 and R3 are identical or different and are a fluorine, chlorine, hydrogen or deuterium atom; R4 is a group, in which R5 is -OH, -OD, C1-C4-alkoxy or -OMe, where Me = alkali metal, alkaline earth metal or NH4 ion. A compound of the formula (II) (II) or a compound of the formula (III) (III) (R1, R2, R3 and R4 have the abovementioned meaning; R6 is a chlorine atom) is subjected to electrolysis in an undivided or divided cell in an electrolysis liquid in the presence of iron salts, which are present in the electrolyte in a concentration of 1 to 500 ppm,
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