4.
    发明专利
    未知

    公开(公告)号:DE1907637A1

    公开(公告)日:1971-01-21

    申请号:DE1907637

    申请日:1969-02-15

    Applicant: IBM

    Abstract: A transparent, protective coating overlies a photoconductive layer and is integral therewith. The coating, which has a resistivity at least equal to the dark resistivity of the photoconductive material, has a thickness in the range of 50A-4000A. The coating is deposited on the photoconductive layer by sputtering through utilization of a high frequency alternating voltage whereby the properties of the coating may be controlled. When applying the high frequency alternating voltage, the power is kept low to produce a relatively high compressive stress of the coating. Controlling the power results in controlling the compressive stress of the coating. The temperature of the photoconductive layer may be maintained at a sufficiently low temperature so that the photoconductive layer retains its photoconductive properties.

    5.
    发明专利
    未知

    公开(公告)号:IT8020407D0

    公开(公告)日:1980-03-07

    申请号:IT2040780

    申请日:1980-03-07

    Applicant: IBM

    Abstract: A method for fabricating an interconnection package for a plurality of semiconductor chips which include the fabrication of a multi-layered glass-ceramic superstructure with a multi-layered distribution of conductors on a preformed multi-layered glass-ceramic base, by the repeatable steps of depositing a conductor pattern on the base and forming thereon a crystallizable glass dielectric layer which is then crystallized to a glass-ceramic prior to further additions of conductor patterns and crystallizable glass layers to form a monolithic compatible substrate all through. Semiconductor chips can be electrically connected to expose conductor patterns at the top surface of the resultant glass-ceramic package.

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