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    1.
    发明专利
    未知

    公开(公告)号：DE3751134D1

    公开(公告)日：1995-04-13

    申请号：DE3751134

    申请日：1987-10-23

    Applicant: IBM

    Inventor： BURNS FRANCIS CHARLES ,  CARDEN GARY RICHARD

    IPC: C23F4/00 ,  B23K26/06 ,  C23F4/04 ,  H01L21/268 ,  H01L21/48 ,  H01L21/60 ,  H05K3/00 ,  G03F1/00 ,  C23F4/02 ,  H01L21/306

    Abstract: A method for performing differential etching of material by using electromagnetic radiation. Material having two predetermined regions is provided. A beam of electromagnetic radiation is generated. The energy intensity of predetermined areas within the beam of electromagnetic radiation is selectively varied so that both of the predetermined regions of the material are etched simultaneously and each of the predetermined regions is etched at a rate independent of the etching rate of the other of the predetermined regions. In an alternate embodiment, a substance having at least two materials is provided. A beam of electromagnetic radiation is generated. The energy intensity of predetermined areas within the beam of electromagnetic radiation is selectively varied so that the time required to etch one of the materials is substantially equal to the time required to etch any selected combination of the materials remaining. A mask (16) with a properly patterned reflective coating (14) can be used to selectively vary the energy intensity of predetermined areas within the beam of electromagnetic radiation.

    2.
    发明专利
    未知

    公开(公告)号：DE69212552D1

    公开(公告)日：1996-09-05

    申请号：DE69212552

    申请日：1992-09-19

    Applicant: IBM

    Inventor： CARDEN GARY RICHARD ,  DANOVITCH DAVID HIRSCH ,  FOSTER ERIC MICHAEL ,  VETTER WILLIAM WALTER

    IPC: G02B6/42

    Abstract: An optoelectronic assembly which provides for enhanced alignment between the internal components thereof. The assembly includes a housing (17) having a base portion (19) and a cover portion (21), the housing including therein a circuitized substrate (27). A pair of optoelectronic devices (31, 33) (transmitter and receiver components) are initially movably (loosely) positioned within the housing. The invention utilizes an alignment member (110) which is secured to the housing while positively engaging the movably positioned devices and precisely align these devices with respect thereto such that these devices are in turn precisely aligned with optic means (e.g., a duplex optical connector) when the optic means is positioned within the alignment member. In one embodiment, the housing is of metallic material while the alignment member is a molded plastic structure. The alignment member may also include shutter means therein for safety purposes.

    3.
    发明专利
    未知

    公开(公告)号：DE3751134T2

    公开(公告)日：1995-09-14

    申请号：DE3751134

    申请日：1987-10-23

    Applicant: IBM

    Inventor： BURNS FRANCIS CHARLES ,  CARDEN GARY RICHARD

    IPC: C23F4/00 ,  B23K26/06 ,  C23F4/04 ,  H01L21/268 ,  H01L21/48 ,  H01L21/60 ,  H05K3/00 ,  G03F1/00 ,  C23F4/02 ,  H01L21/306

    Abstract: A method for performing differential etching of material by using electromagnetic radiation. Material having two predetermined regions is provided. A beam of electromagnetic radiation is generated. The energy intensity of predetermined areas within the beam of electromagnetic radiation is selectively varied so that both of the predetermined regions of the material are etched simultaneously and each of the predetermined regions is etched at a rate independent of the etching rate of the other of the predetermined regions. In an alternate embodiment, a substance having at least two materials is provided. A beam of electromagnetic radiation is generated. The energy intensity of predetermined areas within the beam of electromagnetic radiation is selectively varied so that the time required to etch one of the materials is substantially equal to the time required to etch any selected combination of the materials remaining. A mask (16) with a properly patterned reflective coating (14) can be used to selectively vary the energy intensity of predetermined areas within the beam of electromagnetic radiation.

    4.
    发明专利
    未知

    公开(公告)号：DE69212552T2

    公开(公告)日：1997-02-06

    申请号：DE69212552

    申请日：1992-09-19

    Applicant: IBM

    Inventor： CARDEN GARY RICHARD ,  DANOVITCH DAVID HIRSCH ,  FOSTER ERIC MICHAEL ,  VETTER WILLIAM WALTER

    IPC: G02B6/42

    Abstract: An optoelectronic assembly which provides for enhanced alignment between the internal components thereof. The assembly includes a housing (17) having a base portion (19) and a cover portion (21), the housing including therein a circuitized substrate (27). A pair of optoelectronic devices (31, 33) (transmitter and receiver components) are initially movably (loosely) positioned within the housing. The invention utilizes an alignment member (110) which is secured to the housing while positively engaging the movably positioned devices and precisely align these devices with respect thereto such that these devices are in turn precisely aligned with optic means (e.g., a duplex optical connector) when the optic means is positioned within the alignment member. In one embodiment, the housing is of metallic material while the alignment member is a molded plastic structure. The alignment member may also include shutter means therein for safety purposes.

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