公开(公告)号：DE10118902A1

公开(公告)日：2002-03-14

申请号：DE10118902

申请日：2001-04-18

Applicant: IBM

Inventor： WALLOW THOMAS I ,  ALLEN ROBERT D ,  BROCK PHILLIP JOE ,  DI PIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  TRUONG HOA DAO ,  VARANASI PUSHKARA RAO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/40 ,  H01L21/027 ,  G03F7/038

Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.