PATTERNING OF MAGNETIC MEDIUM
    1.
    发明专利

    公开(公告)号:JP2000123363A

    公开(公告)日:2000-04-28

    申请号:JP28385399

    申请日:1999-10-05

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To extend the possibility of local formation or modification of a pattern of specific magnetization direction in a planar magnetic surface or in a magnetic film and to obtain an improved magnetic storage and recording device having one or more surfaces in which such patterns are formed. SOLUTION: A method for locally forming or modifying a pattern of specific magnetization modification in an at least potentially ferromagnetic surface includes a step for forming a prescribed pattern of discrete magnetization regions on the magnetic surface preferably by exposing the magnetic surface to the bombardment of activated subatom corpuscles directed toward the magnetic surface in the form of electron beams. The method increases the density of information magnetically encoded on a magnetic medium such as a hard disk.

    Probe and data storage device for scanning on substrate
    2.
    发明专利
    Probe and data storage device for scanning on substrate 审中-公开
    用于在基板上扫描的探测和数据存储设备

    公开(公告)号:JP2006194883A

    公开(公告)日:2006-07-27

    申请号:JP2006004967

    申请日:2006-01-12

    CPC classification number: G01Q70/14 G01Q80/00 G11B9/1409 G11B11/007

    Abstract: PROBLEM TO BE SOLVED: To provide a probe and a data storage device, requiring less power consumption. SOLUTION: The data storage device includes a storage medium for storing data in a form of marks, and at least one probe for scanning this storage medium, and the storage medium can be included in the substrate. The probe contains a cantilever including a terminal, where this terminal functions as an electrical contact to mechanically be fixed on a probe retention structure, which can be a common frame of the data storage device during probe operation. The probe also contains a support structure, to which it mechanically connects the terminal directly or via a hinge. This support structure extends so as to separate from the terminal. The end section having a nano-scaled vertex is provided. A beam structure, which contains a heat resistor, is installed at the end section of the support structure. This beam structure is thinner than the area of the support structure, directly contacting the beam structure in at least the direction parallel to the shaft of the end section. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供探头和数据存储设备,需要较少的功耗。 解决方案:数据存储装置包括用于以标记形式存储数据的存储介质和用于扫描该存储介质的至少一个探针,并且存储介质可以包括在基板中。 探头包含一个包括端子的悬臂,其中该端子作为电触头用于机械地固定在探针保持结构上,该探针保持结构可以是探针操作期间数据存储装置的公共框架。 探头还包含一个支撑结构,它直接或通过铰链机械连接端子。 该支撑结构延伸以与终端分离。 提供具有纳米级顶点的端部。 在支撑结构的端部处安装有包含热电阻器的梁结构。 该梁结构比支撑结构的区域更薄,至少在平行于端部的轴的方向上直接接触梁结构。 版权所有(C)2006,JPO&NCIPI

    DEVICE AND METHOD FOR PATTERNING A SURFACE OF A POLYMER LAYER
    3.
    发明申请
    DEVICE AND METHOD FOR PATTERNING A SURFACE OF A POLYMER LAYER 审中-公开
    用于构图聚合物层的表面的装置和方法

    公开(公告)号:WO2008012734A3

    公开(公告)日:2008-04-03

    申请号:PCT/IB2007052869

    申请日:2007-07-18

    CPC classification number: G11B9/1472 B82Y10/00 G11B9/14 G11B11/007

    Abstract: The present invention relates to a device for forming topographic features on a surface of a polymer layer comprising: a polymer layer (1 ); a substrate (2) comprising a conductor, a first surface (1 a) of the polymer layer (1 ) being provided on the substrate (2); and at least one electrode (3) which, when the device is in use, interacts with a second surface (1 b) of the polymer layer (1 ), wherein, when in use, the device is operable to apply a first electrical potential (P1 ) to the at least one electrode (3) relative to the substrate (2), thereby to cause a protrusion (4) to be formed on the second surface (1 b) of the polymer layer (1 ).

    Abstract translation: 本发明涉及一种用于在聚合物层的表面上形成地形特征的装置,该装置包括:聚合物层(1);聚合物层 包括导体的衬底(2),所述聚合物层(1)的第一表面(1a)设置在所述衬底(2)上; 和至少一个电极(3),当所述装置在使用中时,所述电极(3)与所述聚合物层(1)的第二表面(1b)相互作用,其中当使用时,所述装置可操作以施加第一电势 (P1)施加到所述至少一个电极(3),从而在所述聚合物层(1)的所述第二表面(1b)上形成突起(4)。

    WEAR-LESS OPERATION OF A MATERIAL SURFACE WITH A SCANNING PROBE MICROSCOPE
    4.
    发明申请
    WEAR-LESS OPERATION OF A MATERIAL SURFACE WITH A SCANNING PROBE MICROSCOPE 审中-公开
    使用扫描探针显微镜对材料表面进行无磨损操作

    公开(公告)号:WO2011055346A2

    公开(公告)日:2011-05-12

    申请号:PCT/IB2010055062

    申请日:2010-11-08

    CPC classification number: G01Q60/363 G01Q70/10

    Abstract: The invention concerns a method for scanning a surface (52) of a material (50) with a scanning probe microscope or SPM (10), the SPM having a cantilever sensor (100) configured to exhibit distinct spring behaviors (C, Ck), the method comprising: - operating the SPM in contact mode, whereby the sensor is scanned on the material surface and a first spring behavior (C) of the sensor (e.g. a fundamental mode of flexure thereof) is excited by deflection of the sensor by the material surface; and - exciting with excitation means a second spring behavior (Ck) of the sensor at a resonance frequency thereof (e.g. one or more higher-order resonant modes) of the cantilever sensor to modulate an interaction of the sensor and the material surface and thereby reduce the wearing of the material surface.

    Abstract translation: 本发明涉及一种用扫描探针显微镜或SPM(10)扫描材料(50)的表面(52)的方法,SPM具有悬臂传感器(100),其被配置为呈现明显的弹簧行为(C,Ck), 该方法包括: - 以接​​触模式操作SPM,由此在材料表面上扫描传感器,并且传感器的第一弹性(C)(例如其基本弯曲模式)被传感器的偏转激发 材料表面; 和 - 激发激励意味着传感器在悬臂传感器的共振频率(例如一个或多个高阶谐振模式)下的第二弹簧行为(Ck),以调制传感器和材料表面的相互作用,从而减少 材料表面的磨损。

    MICROSYSTEM AND METHOD FOR POSITIONING A SECOND ELEMENT WITH RESPECT TO A FIRST ELEMENT IN A MICROSYSTEM
    5.
    发明申请
    MICROSYSTEM AND METHOD FOR POSITIONING A SECOND ELEMENT WITH RESPECT TO A FIRST ELEMENT IN A MICROSYSTEM 审中-公开
    用于将第二元件定位在微结构中的第一元件的微结构和方法

    公开(公告)号:WO2006040654A3

    公开(公告)日:2006-06-01

    申请号:PCT/IB2005003037

    申请日:2005-09-29

    CPC classification number: B81B3/0018 F03G7/06 F03G7/065 H01H2037/008

    Abstract: A microsystem, comprising a first static element (1), a second, movable and unattached element (2), an actuator (3) for effecting a force between the first and the second element (1, 2), which actuator (3) is designed for controlling a temperature (T1, T2) of one of the first element (1) and the second element (2). A corresponding method for positioning a second element (2) with respect to a first element (1) in a microsystem is introduced.

    Abstract translation: 一种微系统,包括第一静态元件(1),第二可移动和未附接元件(2),用于在第一和第二元件(1,2)之间产生力的致动器(3),该致动器(3) 被设计用于控制第一元件(1)和第二元件(2)之一的温度(T1,T2)。 引入了相对于在微系统中相对于第一元件(1)定位第二元件(2)的方法。

    Verfahren und Vorrichtungen zur Positionierung von Nanoobjekten mit Seitenverhältnissen

    公开(公告)号:DE112013001196T5

    公开(公告)日:2014-11-20

    申请号:DE112013001196

    申请日:2013-04-25

    Applicant: IBM

    Abstract: Die vorliegende Erfindung betrifft insbesondere Vorrichtungen und Verfahren zur Positionierung von Nanoobjekten (20) auf einer Oberfläche. Das Verfahren weist auf: Bereitstellen (S10 bis S50) zweier einander gegenüberliegender Oberflächen (15, 17) einschließlich einer ersten Oberfläche (15) und einer zweiten Oberfläche (17), wobei mindestens eine der zwei Oberflächen eine oder mehrere Positionierungsstrukturen (16, 16a) mit Abmessungen im Nanometerbereich aufweist; und einer ionischen Flüssigkeitssuspension (30) der Nanoobjekte zwischen den zwei Oberflächen, wobei jede der Oberflächen mit der ionischen Flüssigkeitssuspension eine elektrische Doppelschicht bildet, wobei jede der zwei Oberflächen ein selbes elektrisches Ladungsvorzeichen aufweist; und Sich-positionieren-lassen (S60) der Nanoobjekte in der Suspension einer Potenzialenergie (31) gemäß, die aus der elektrischen Ladung der zwei Oberflächen resultiert, und Abscheiden (S70) eines oder mehrerer der Nanoobjekte auf der ersten Oberfläche den Positionierungsstrukturen gemäß durch Verschieben von Minima (32) der Potenzialenergie zur ersten Oberfläche hin.

    Verschleissfreie Behandlung einer Materialoberfläche mit einem Rastersondenmikroskop

    公开(公告)号:DE112010004305T5

    公开(公告)日:2012-10-04

    申请号:DE112010004305

    申请日:2010-11-08

    Applicant: IBM

    Abstract: Die Erfindung betrifft ein Verfahren zum Abtasten einer Oberfläche (52) aus einem Material (50) mit einem Rastersondenmikroskop (SPM) (10), wobei das SPM einen Hebelarmsensor (100) aufweist, der so aufgebaut ist, dass er verschiedene Federverhaltensweisen (C, Ck) aufweist, und wobei das Verfahren die folgenden Schritte umfasst: – Betreiben des SPM im Kontaktmodus, wobei der Sensor die Materialoberfläche rasterförmig abtastet und durch Auslenken des Sensors durch die Materialoberfläche ein erstes Federverhalten (C) des Sensors (z. B. ein Grundbiegemodus des Sensors) bewirkt wird; und – Anregen eines zweiten Federverhaltens (Ck) des Sensors mit einem Anregungsmittel bei einer Resonanzfrequenz (z. B. eines oder mehrerer Resonanzmodi höherer Ordnung) des Hebelarmsensors, um eine Wechselwirkung zwischen dem Sensor und der Materialoberfläche zu modulieren und dadurch den Verschleiß der Materialoberfläche zu verringern.

    METHOD AND APPARATUS FOR READING AN ARRAY OF THERMAL RESISTANCE SENSORS

    公开(公告)号:MY134296A

    公开(公告)日:2007-12-31

    申请号:MYPI20015114

    申请日:2001-11-07

    Applicant: IBM

    Abstract: DESCRIBED IS A METHOD FOR READING AN ARRAY OF SENSORS (10) HAVING A SET OF ROW CONDUCTORS (60) EACH CONNECTED TO THE SENSORS IN A CORRESPONDING ROW OF THE ARRAY AND A SET OF COLUMN CONDUCTORS (50) EACH CONNECTED TO THE SENSORS IN A CORRESPONDING COLUMN OF THE ARRAY SUCH THAT EACH SENSOR IS CONNECTED BETWEEN A ROW CONDUCTOR AND A COLUMN CONDUCTOR. THE METHOD COMPRISES: FOR EACH ROW OF SENSORS IN THE ARRAY, PERFORMING A READ CYCLE (TR) COMPRISING APPLYING AN ACTIVATION PULSE (UB) TO THE CORRESPONDING ROW CONDUCTOR TO ACTIVATE THE SENSORS IN THE ROW, APPLYING A READING PULSE (UR) TO THE ROW CONDUCTOR ON EXPIRY OF A PREDETERMINED TIME INTERVAL FROM AN EDGE OF THE ACTIVATION PULSE, AND DURING THE READING PULSE, DETECTING, FOR EACH SENSOR IN THE ROW, A VALUE DEPENDENT ON A VARIABLE CHARACTERISTIC OF THAT SENSOR. THE READ CYCLE FOR AT LEAST ONE ROW IS COMMENCED DURING THE PREDETERMINED TIME INTERVAL OF THE READ CYCLE FOR ANOTHER ROW. IN A PREFERRED EXAMPLE DESCRIBED IN DETAIL, THE SENSORS ARE THERMAL RESISTANCE SENSORS, THE ACTIVATION PULSE IS A HEATING PULSE TO HEAT THE SENSORS, AND THE VARIABLE CHARACTERISTIC IS RESISTANCE.(FIG.1)

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