公开(公告)号：BE851929A

公开(公告)日：1977-06-16

申请号：BE175352

申请日：1977-02-28

Applicant: IBM

Inventor： BARILE C A ,  BRILL R M ,  FORNERIS J L ,  REGH J

IPC: H01L21/306 ,  H01L21/033 ,  H01L21/22 ,  H01L21/223 ,  H01L21/265 ,  H01L21/266 ,  H01L21/331 ,  H01L29/73 ,  H01L

公开(公告)号：AU511889B2

公开(公告)日：1980-09-11

申请号：AU3424778

申请日：1978-03-17

Applicant: IBM

Inventor： FORNERIS J L ,  HICKS W W ,  KELLER J H ,  MCKENNA C M ,  SEIRMARCO J A

IPC: H01J37/20 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J37/04 ,  H01J27/00 ,  H01L21/425 ,  H01L21/68

Abstract: In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, i.e., electron and other particle and photon radiations between said source and said target. This prevents heating of the target by the electron source and cross-contamination between the source and the target. A further structure is provided for the measurement of the ion beam current while controlling said surface potential of the target which includes: walls adjacent to and electrically insulated from the target and surrounding the beam whereby the walls and target provide a Faraday Cage, means for introducing variable quantities of electrons into the beam within the Faraday Cage, means for measuring the target current, means for combining and measuring the target and wall currents to provide said ion beam current measurement and means for varying the quantities of introduced electrons to control the target current and thereby the target surface potential.

公开(公告)号：SE7702443L

公开(公告)日：1977-10-06

申请号：SE7702443

申请日：1977-03-04

Applicant: IBM

Inventor： BARILE C A ,  BRILL R M ,  FORNERIS J L ,  REGH J

IPC: H01L21/306 ,  H01L21/033 ,  H01L21/22 ,  H01L21/223 ,  H01L21/265 ,  H01L21/266 ,  H01L21/331 ,  H01L29/73 ,  H05K3/00

公开(公告)号：SE430188B

公开(公告)日：1983-10-24

申请号：SE7804119

申请日：1978-04-12

Applicant: IBM

Inventor： FORNERIS J L ,  HICKS W W ,  KELLER J H ,  MCKENNA C M ,  SEIRMARCO J A

IPC: H01J37/20 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J37/30

Abstract: In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, i.e., electron and other particle and photon radiations between said source and said target. This prevents heating of the target by the electron source and cross-contamination between the source and the target. A further structure is provided for the measurement of the ion beam current while controlling said surface potential of the target which includes: walls adjacent to and electrically insulated from the target and surrounding the beam whereby the walls and target provide a Faraday Cage, means for introducing variable quantities of electrons into the beam within the Faraday Cage, means for measuring the target current, means for combining and measuring the target and wall currents to provide said ion beam current measurement and means for varying the quantities of introduced electrons to control the target current and thereby the target surface potential.

公开(公告)号：DK194178A

公开(公告)日：1978-11-06

申请号：DK194178

申请日：1978-05-03

Applicant: IBM

Inventor： FORNERIS J L ,  HICKS W W ,  KELLER J H ,  MCKENNA C M ,  SEIRMARCO J A

IPC: H01J37/20 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01L

Abstract: In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, i.e., electron and other particle and photon radiations between said source and said target. This prevents heating of the target by the electron source and cross-contamination between the source and the target. A further structure is provided for the measurement of the ion beam current while controlling said surface potential of the target which includes: walls adjacent to and electrically insulated from the target and surrounding the beam whereby the walls and target provide a Faraday Cage, means for introducing variable quantities of electrons into the beam within the Faraday Cage, means for measuring the target current, means for combining and measuring the target and wall currents to provide said ion beam current measurement and means for varying the quantities of introduced electrons to control the target current and thereby the target surface potential.

公开(公告)号：AU504131B2

公开(公告)日：1979-10-04

申请号：AU2365277

申请日：1977-03-25

Applicant: IBM

Inventor： BARILE C A ,  BRILL R M ,  FORNERIS J L ,  REGH J

IPC: H01L21/306 ,  H01L21/033 ,  H01L21/22 ,  H01L21/223 ,  H01L21/265 ,  H01L21/266 ,  H01L21/331 ,  H01L29/73 ,  H01L21/283 ,  H01L21/31 ,  H01L21/32 ,  H01L27/04

公开(公告)号：SE7804119L

公开(公告)日：1978-11-06

申请号：SE7804119

申请日：1978-04-12

Applicant: IBM

Inventor： FORNERIS J L ,  HICKS W W ,  KELLER J H ,  MCKENNA C M ,  SEIRMARCO J A

IPC: H01J37/20 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J37/30

Abstract: In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, i.e., electron and other particle and photon radiations between said source and said target. This prevents heating of the target by the electron source and cross-contamination between the source and the target. A further structure is provided for the measurement of the ion beam current while controlling said surface potential of the target which includes: walls adjacent to and electrically insulated from the target and surrounding the beam whereby the walls and target provide a Faraday Cage, means for introducing variable quantities of electrons into the beam within the Faraday Cage, means for measuring the target current, means for combining and measuring the target and wall currents to provide said ion beam current measurement and means for varying the quantities of introduced electrons to control the target current and thereby the target surface potential.

公开(公告)号：SE7804119A

公开(公告)日：1978-11-06

申请号：SE7804119

申请日：1978-04-12

Applicant: IBM

Inventor： FORNERIS J L ,  HICKS W W ,  KELLER J H ,  MCKENNA C M ,  SEIRMARCO J A

IPC: H01J37/20 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J37/30

CPC classification number: H01J37/026 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/24507

公开(公告)号：SE380676B

公开(公告)日：1975-11-10

申请号：SE1512672

申请日：1972-11-21

Applicant: IBM

Inventor： DORLER J A ,  FORNERIS J L ,  SWIETEK D J

IPC: H01L29/872 ,  H01L20060101 ,  H01L29/47 ,  H01L29/48