2.
    发明专利
    未知

    公开(公告)号:DE2646300A1

    公开(公告)日:1977-05-05

    申请号:DE2646300

    申请日:1976-10-14

    Applicant: IBM

    Abstract: The disclosure teaches the use of aluminum nitride as a mask for utilization of ion implantation in the formation of semiconductor configurations as well as an underlying material for use in semiconductor lift-off techniques in device formation and the deposition of metallization contact lines and interconnections.

    3.
    发明专利
    未知

    公开(公告)号:DE2330515A1

    公开(公告)日:1974-01-31

    申请号:DE2330515

    申请日:1973-06-15

    Applicant: IBM

    Abstract: An apparatus for detecting the presence of inclusions in semiconductor material having a polychromatic light source, a support for a semiconductor body, a light sensing means positioned to operate on light transmitted through the body from the light source, the sensing means including a substrate of the same type of semiconductor materials as the material of the semiconductor body, and having at least a PN junction in the substrate with means to backbias the junction, a means to indicate the relative amounts of light transmitted through the semiconductor body that is sensed by the sensing means.

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