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公开(公告)号:DE3161411D1
公开(公告)日:1983-12-22
申请号:DE3161411
申请日:1981-04-10
Applicant: IBM
Inventor: CORCORAN RICHARD ALAN , KEENAN WILLIAM ANDREW , MICHAELIDES DEMETRIOS , YUN BOB HONG
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公开(公告)号:DE2646300A1
公开(公告)日:1977-05-05
申请号:DE2646300
申请日:1976-10-14
Applicant: IBM
Inventor: KEENAN WILLIAM ANDREW , KROLL CHARLES THOMAS
IPC: H01L21/265 , H01L21/266 , H01L21/318 , H01L21/425 , H01L21/471
Abstract: The disclosure teaches the use of aluminum nitride as a mask for utilization of ion implantation in the formation of semiconductor configurations as well as an underlying material for use in semiconductor lift-off techniques in device formation and the deposition of metallization contact lines and interconnections.
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公开(公告)号:DE2330515A1
公开(公告)日:1974-01-31
申请号:DE2330515
申请日:1973-06-15
Applicant: IBM
Inventor: KEENAN WILLIAM ANDREW , POPONIAK MICHAEL ROBERT , YEH TSU-HSING
IPC: H01L21/66 , G01N21/95 , G01R31/265 , G01R31/26
Abstract: An apparatus for detecting the presence of inclusions in semiconductor material having a polychromatic light source, a support for a semiconductor body, a light sensing means positioned to operate on light transmitted through the body from the light source, the sensing means including a substrate of the same type of semiconductor materials as the material of the semiconductor body, and having at least a PN junction in the substrate with means to backbias the junction, a means to indicate the relative amounts of light transmitted through the semiconductor body that is sensed by the sensing means.
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