公开(公告)号：JPH05224411A

公开(公告)日：1993-09-03

申请号：JP26846992

申请日：1992-10-07

Applicant: IBM

Inventor： KURISUTOFUAA JIYON NOOZU ,  SUTEIIBU SEIICHI MIURA ,  MERUBIN UOREN MONTOGOMERII ,  UEIN MAATEIN MOROO ,  RANDORUFU JIYOZEFU SUMISU

IPC: G03F7/022 ,  H01L21/027

Abstract: PURPOSE: To obtain a high sensitivity, high contrast, excellent durability to the etching of an unexposed zone and vertical side wall shape, by containing a sensitizing agent of a mixed ester of bis and trisalkanes with a specific sulfonic acid. CONSTITUTION: This positive resist is constituted of a mixture of 100 pts.wt. phenol-aldehyde resin with 18-100 pts.wt. dissolution suppressing agent. The dissolution suppressing agent is the mixed ester introduced by esterifying a mixture naphthoquinone diazide 4- and 5-sulfonic acid with a polyphenol. The polyphenol is expressed by a formula, (ph(OH)x )y CR4-y . In the formula, ph expresses benzen ring, (x) expresses integers of 1-3, (y) expresses 2 or 3, R expresses hydrogen, fluorine or the like. The dissolution suppressing agnet has >=80% esterified hydroxyl group and contains 10-90mol% 4-sulfonate ester and 90-10mol% 5-sulfonate ester.

公开(公告)号：JPH04217251A

公开(公告)日：1992-08-07

申请号：JP3137491

申请日：1991-02-01

Applicant: IBM

Inventor： UIRIAMU ROSU BURANZUBOURUDO ,  KURISUTOFUAA JIYON NOOZU ,  MERUBIN UOREN MONGOMERII ,  UEIN MAATEIN MOROO ,  KEBIN MAIKURU UERUSHIYU

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To obtain the acid-sensitized photoresist composition comprising an acid generation photoinitiator and a polymer binder and/or a polymerizable compound and an acid responsive group and being accelerated in photochemical reaction velocity. CONSTITUTION: This acid-initiation photoresist composition to be used comprises the acid generation photoinitiator and the polymer binder and/or a matrix, the acid responsive group capable of patternizing the composition by an acid initiation chemical reaction, and a sufficient amount of a hydroxyaromatic compound for accelerating a reaction velocity of the photoresist composition during irradiation for image formation, and the photoreaction velocity is remarkably enhanced by adding this hydroxyaromatic compound to the photoresist composition in a amount of 1-5weight%.