公开(公告)号：US3881115A

公开(公告)日：1975-04-29

申请号：US42941373

申请日：1973-12-28

Applicant: IBM

Inventor： HODGSON RODNEY TREVOR ,  LANKARD JOHN ROBERT ,  SOROKIN PETER PITIRINOVICH

IPC: H01S3/22 ,  G02F1/35 ,  H01S3/095 ,  H01S3/23 ,  H01S3/30 ,  H03F7/04

CPC classification number: H01S3/2316 ,  G02F1/3534 ,  H01S3/095 ,  H01S3/305

Abstract: A double quantum laser employing volatile monoiodides as the active medium and using a combination of stimulated Raman emission and four wave parametric conversion to generate two pulses suitable for triggering the double quantum amplification process.

Abstract translation: 使用挥发性单碘化物作为活性介质并使用受激拉曼发射和四波参数转换的组合的双量子激光器来产生适于触发双量子扩增过程的两个脉冲。

公开(公告)号：DE2446219A1

公开(公告)日：1975-07-10

申请号：DE2446219

申请日：1974-09-27

Applicant: IBM

Inventor： HODGSON RODNEY TREVOR ,  LANKARD JOHN ROBERT ,  SOROKIN PETER PITIRIMOVICH

IPC: H01S3/22 ,  G02F1/35 ,  H01S3/095 ,  H01S3/23 ,  H01S3/30 ,  H01S3/00

Abstract: A double quantum laser employing volatile monoiodides as the active medium and using a combination of stimulated Raman emission and four wave parametric conversion to generate two pulses suitable for triggering the double quantum amplification process.

公开(公告)号：DE3785292T2

公开(公告)日：1993-10-28

申请号：DE3785292

申请日：1987-09-18

Applicant: IBM

Inventor： KIRCH STEVEN JAMES ,  LANKARD JOHN ROBERT ,  RITSKO JOHN HAMES ,  SMITH KURT ALAN ,  SPEIDELL JAMES LOUIS ,  YEH JAMES TIEN-CHENG

IPC: G03F1/24 ,  G03F1/58 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03F1/00

公开(公告)号：DE3477022D1

公开(公告)日：1989-04-13

申请号：DE3477022

申请日：1984-12-11

Applicant: IBM

Inventor： CHEN LEE ,  LANKARD JOHN ROBERT ,  MATHAD GANGADHARA SWAMI

IPC: C23F4/00 ,  C23F4/02 ,  C23F4/04 ,  H01L21/302 ,  H05K3/02 ,  B23K26/18

Abstract: Disclosed is a method of etching a metallized substrate by excimer laser radiation. The substrate is exposed to a selected gas, e.g., a halogen gas, which spontaneously reacts with the metal forming a solid reaction product layer on the metal by a partial consumption of the metal. A beam of radiation from an excimer laser, e.g. XeF laser operating at a wavelength of 351 nm or XeCl laser at 308 nm or KrF laser at 248 nm or KrCi laser at 222 nm or ArF laser at 193 nm or F 2 laser at 157 nm, is applied to the reaction product in a desired pattern to vaporize the reaction product and thereby selectively etch the metal with a high resolution.

公开(公告)号：DE2308531A1

公开(公告)日：1973-12-06

申请号：DE2308531

申请日：1973-02-21

Applicant: IBM

Inventor： LANKARD JOHN ROBERT ,  SOROKIN PETER PITIRINOVICH

IPC: H01S3/113 ,  G02F1/01 ,  G02F1/35 ,  H01S3/09 ,  H01S3/098 ,  H01S3/11

Abstract: A capacitive discharge in cesium vapor is used to realize an externally controllable Q-switch synchronizing the appearance of pulse trains from a passively mode-locked neodymium glass laser with other events occurring on a microsecond time scale.

公开(公告)号：DE3785292D1

公开(公告)日：1993-05-13

申请号：DE3785292

申请日：1987-09-18

Applicant: IBM

Inventor： KIRCH STEVEN JAMES ,  LANKARD JOHN ROBERT ,  RITSKO JOHN HAMES ,  SMITH KURT ALAN ,  SPEIDELL JAMES LOUIS ,  YEH JAMES TIEN-CHENG

IPC: G03F1/24 ,  G03F1/58 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03F1/00

公开(公告)号：DE2363065A1

公开(公告)日：1974-10-03

申请号：DE2363065

申请日：1973-12-19

Applicant: IBM

Inventor： HODGOSON RODNEY TREVOR ,  LANKARD JOHN ROBERT ,  SOROKIN PETER PITITINOVICH ,  WYNNE JAMES JEFFREY

IPC: H01S3/108 ,  G02F1/35 ,  G02F1/355 ,  G02F1/39 ,  H01S3/10 ,  H01S3/30

Abstract: An infrared source producing a coherent output having a spectrally narrow and continuously tunable frequency is described. Such a source uses a four wave mixing process in an alkali metal vapor, wherein the initial input beams to the alkali metal vapor come from two dye lasers. In an alternative mode of operation, tunable ultraviolet output is obtained.