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公开(公告)号：US3639143A
公开(公告)日：1972-02-01
申请号：US3639143D
申请日：1969-02-19
Applicant: IBM
Inventor： LUSSOW ROBERT O , WIRTZ LOUIS H
CPC classification number: G03F1/54 , C03C17/10 , C23C18/1865 , C23C18/1893 , C23C18/32
Abstract: A process for electroless deposition of uniform and consistent dense nickel films on nonconductive substrates utilizing conventional techniques. The process requires at least two repetitive cycles of activation, electroless plating of nickel and heating.
Abstract translation: 使用常规技术在非导电基材上无电沉积均匀且一致的致密镍膜的方法。 该过程需要至少两个重复的活化循环，镍的无电镀和加热。
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公开(公告)号：US3862831A
公开(公告)日：1975-01-28
申请号：US35302673
申请日：1973-04-20
Applicant: IBM
Inventor： BERKENBLIT MELVIN , LUSSOW ROBERT O , REISMAN ARNOLD
CPC classification number: C03C3/102 , C03B19/00 , C03C3/072 , C03C17/02 , H01J2211/38
Abstract: A process for the in situ fabrication of a glass from an admixed frit, for example, of two starting glasses on the required existing substrate structure therefore. The admixed frit comprises a low glass transition temperature glass and a higher glass transition temperature glass, which glasses are uniquely capable of forming a continuous vitreous phase over their entire compositional range. During thermal cycling, the low glass transition temperature glass flows out and solubilizes the higher glass transition temperature glass to thereby synthesize in situ a new glass. The temperature required to form the glass by the in situ process is less than that required where a glass of identical composition is first preequilibrated externally and then applied in frit form to the existing substrate structure and flowed out thereon. The in situ synthesized new glass softens and flows at a temperature higher than that of the low glass transistion temperature glass and lower than that of the higher glass transition temperature glass, and exhibits a glass transition temperature intermediate to the two starting glasses.
Abstract translation: 因此，在所需的现有衬底结构上从混合玻璃料例如两个起始玻璃原位制造玻璃的方法。 混合玻璃料包括低玻璃化转变温度玻璃和较高玻璃化转变温度的玻璃，该玻璃独特地能够在其整个组成范围内形成连续的玻璃相。 在热循环期间，低玻璃化转变温度玻璃流出并溶解较高的玻璃化转变温度玻璃，从而原位合成新的玻璃。 通过原位方法形成玻璃所需的温度小于首先在外部首先平衡的玻璃相同的组合物然后以玻璃料形式施加到现有的衬底结构并在其上流出所需的温度。 原位合成的新玻璃在高于低玻璃化转变温度玻璃的温度下软化并流动，并且低于较高玻璃化转变温度玻璃的温度，并且在两个起始玻璃之间呈现玻璃化转变温度。
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公开(公告)号：FR2317758A1
公开(公告)日：1977-02-04
申请号：FR7618339
申请日：1976-06-09
Applicant: IBM
Inventor： BERKENBLIT MELVIN , LUSSOW ROBERT O , PARK KYU C , REISMAN ARNOLD
Abstract: An in situ process is disclosed for fabricating gas discharge display panels in a sequential seal, bake-out and backfill mode of operation. The single thermal cycle process involves placing unassembled panel parts in a controlled gas ambient furnace system with required seal frame, evacuating said furnace and backfilling with an appropriate ambient atmosphere to an appropriate pressure while heating the furnace. During the heating, the furnace is repeatedly evacuated to moderate vacuum and refilled to some predetermined pressure. The furnace is heated to just above the glass transition temperature of the seal frame in this evacuate-refill mode, then held for some time to achieve outgassing of both panel parts and furnace chamber. Thereafter, the furnace chamber is refilled to one atmosphere and further heated to complete the sealing of the panel. The panel is then cooled to approximately 300 DEG C, still under one atmosphere, after which the evacuate-refill cycle is continuously repeated as the temperature is lowered down to the temperature of tip-off using the refill gas for the pressurization. The panel is refilled to an appropriate pressure at elevated temperature such that at room temperature the pressure is the desired pressure and the panel is tipped off. The process of successive evacuations and backfillings at the appropriate portions of the cycle are highly desirable for cleaning of the panel parts via contaminant dilution.
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公开(公告)号：DE2503239A1
公开(公告)日：1975-11-13
申请号：DE2503239
申请日：1975-01-27
Applicant: IBM
Inventor： BRUSIC VLASTA , LUSSOW ROBERT O
Abstract: Chromium is passivated by forming a chromium oxide layer thereon by heating at temperatures of about 450 DEG C in an atmosphere containing oxygen. While useful, per se, the process finds particular application as an integral part of overall processing schemes where thermal cycles are used.
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Patent Agency Ranking
公开(公告)号：CA1040984A
公开(公告)日：1978-10-24
申请号：CA221463
申请日：1975-03-05
Applicant: IBM
Inventor： BRUSIC VLASTA , LUSSOW ROBERT O
Abstract: METHOD FOR PASSIVATING CHROMIUM Chromium is passivated by forming a chromium oxide layer thereon by heating at temperatures of about 450.degree.C in an atmosphere containing oxygen. While useful, per se, the process finds particular application as an integral part of overall processing schemes where thermal cycles are used.
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公开(公告)号：FR2314601A1
公开(公告)日：1977-01-07
申请号：FR7610908
申请日：1976-04-08
Applicant: IBM
Inventor： CHANCE DUDLEY A , CHASTANG JEAN-CLAUDE A , LUSSOW ROBERT O
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公开(公告)号：CA1051507A
公开(公告)日：1979-03-27
申请号：CA255965
申请日：1976-06-29
Applicant: IBM
Inventor： BERKENBLIT MELVIN , LUSSOW ROBERT O , PARK KYU C , REISMAN ARNOLD
Abstract: GAS DISCHARGE DISPLAY PANEL FABRICATION An in situ process is disclosed for fabricating gas discharge display panels in a sequential seal, bake-out and backfill mode of operation. The single thermal cycle process involves placing unassembled panel parts in a controlled gas ambient furnace system with required seal frame, evacuating said furnace and backfilling with an appropriate ambient atmosphere to an appropriate pressure while heating the furnace. During the heating, the furnace is repeatedly evacuated to moderate vacuum and refilled to some predetermined pressure. The furnace is heated to just above the glass transition temperature of the seal frame in this evacuate-refill mode, then held for some time to achieve outgassing of both panel parts and furnace chamber. Thereafter, the furnace chamber is refilled to one atmosphere and further heated to complete the sealing of the panel. The panel is then cooled to approximately 300.degree.C, still under one atmosphere, after which the evacuate-refill cycle is continuously repeated as the temperature is lowered down to the temperature of tip-off using the refill gas for the pressurization. The panel is refilled to an appropriate pressure at elevated temperature such that at room temperature the pressure is the desired pressure and the panel is tipped off. The process of successive evacuations and backfillings at the appropriate portions of the cycle are highly desirable for cleaning of the panel parts via contaminant dilution.
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公开(公告)号：CA1016193A
公开(公告)日：1977-08-23
申请号：CA195120
申请日：1974-03-15
Applicant: IBM
Inventor： BERKENBLIT MELVIN , LUSSOW ROBERT O , REISMAN ARNOLD
Abstract: A process for the in situ fabrication of a glass from an admixed frit, for example, of two starting glasses on the required existing substrate structure therefore. The admixed frit comprises a low glass transition temperature glass and a higher glass transition temperature glass, which glasses are uniquely capable of forming a continuous vitreous phase over their entire compositional range. During thermal cycling, the low glass transition temperature glass flows out and solubilizes the higher glass transition temperature glass to thereby synthesize in situ a new glass. The temperature required to form the glass by the in situ process is less than that required where a glass of identical composition is first preequilibrated externally and then applied in frit form to the existing substrate structure and flowed out thereon. The in situ synthesized new glass softens and flows at a temperature higher than that of the low glass transistion temperature glass and lower than that of the higher glass transition temperature glass, and exhibits a glass transition temperature intermediate to the two starting glasses.
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公开(公告)号：DE2628819A1
公开(公告)日：1977-01-27
申请号：DE2628819
申请日：1976-06-26
Applicant: IBM
Inventor： BERKENBLIT MELVIN , LUSSOW ROBERT O , PARK KYU CHANG , REISMAN ARNOLD
Abstract: An in situ process is disclosed for fabricating gas discharge display panels in a sequential seal, bake-out and backfill mode of operation. The single thermal cycle process involves placing unassembled panel parts in a controlled gas ambient furnace system with required seal frame, evacuating said furnace and backfilling with an appropriate ambient atmosphere to an appropriate pressure while heating the furnace. During the heating, the furnace is repeatedly evacuated to moderate vacuum and refilled to some predetermined pressure. The furnace is heated to just above the glass transition temperature of the seal frame in this evacuate-refill mode, then held for some time to achieve outgassing of both panel parts and furnace chamber. Thereafter, the furnace chamber is refilled to one atmosphere and further heated to complete the sealing of the panel. The panel is then cooled to approximately 300 DEG C, still under one atmosphere, after which the evacuate-refill cycle is continuously repeated as the temperature is lowered down to the temperature of tip-off using the refill gas for the pressurization. The panel is refilled to an appropriate pressure at elevated temperature such that at room temperature the pressure is the desired pressure and the panel is tipped off. The process of successive evacuations and backfillings at the appropriate portions of the cycle are highly desirable for cleaning of the panel parts via contaminant dilution.
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