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公开(公告)号:GB2547122A
公开(公告)日:2017-08-09
申请号:GB201704242
申请日:2016-02-08
Applicant: IBM
Inventor: JOY CHENG , ANINDARUPA CHUNDER , ANKIT VORA , MELIA TJIO , DANIEL PAUL SANDERS
IPC: C08L25/08 , B82Y30/00 , C08F12/20 , C08F12/24 , C08F212/08 , C08F220/22 , C08F220/24 , C08G64/18 , C08L27/00 , C08L53/00 , C08L69/00 , C09D125/18 , C09D169/00 , H01L21/027
Abstract: A film layer comprising a high-chi (ϰ) block copolymer for self-assembly and a hexafluoroalcohol-containing surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a substituted or unsubstituted styrene-based block). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.
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公开(公告)号:GB2547121A
公开(公告)日:2017-08-09
申请号:GB201704200
申请日:2016-02-08
Applicant: IBM
Inventor: JOY CHENG , MELIA TJIO , GURPREET SINGH , ALEXANDER FRIZ , HSINYU TSAI , MARKUS BRINK , MICHAEL GUILLORN , CHI-CHUN LIU , GREGORY DOERK , DANIEL PAUL SANDERS
IPC: C08J7/04 , H01L21/02 , H01L21/311 , H01L29/06 , H05K3/00
Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self- assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.
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公开(公告)号:GB2547122B
公开(公告)日:2019-09-18
申请号:GB201704242
申请日:2016-02-08
Applicant: IBM
Inventor: JOY CHENG , ANINDARUPA CHUNDER , ANKIT VORA , MELIA TJIO , DANIEL PAUL SANDERS
IPC: C08L25/08 , B82Y30/00 , C08F12/20 , C08F12/24 , C08F212/08 , C08F220/22 , C08F220/24 , C08G64/18 , C08L27/00 , C08L53/00 , C08L69/00 , C09D125/18 , C09D169/00 , H01L21/027
Abstract: A film layer comprising a high-chi (χ) block copolymer for self-assembly and a hexafluoroalcohol-containing surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a substituted or unsubstituted styrene-based block). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0 Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.
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4.
公开(公告)号:GB2547121B
公开(公告)日:2019-09-18
申请号:GB201704200
申请日:2016-02-08
Applicant: IBM
Inventor: JOY CHENG , MELIA TJIO , GURPREET SINGH , ALEXANDER FRIZ , HSINYU TSAI , MARKUS BRINK , MICHAEL GUILLORN , CHI-CHUN LIU , GREGORY DOERK , DANIEL PAUL SANDERS
IPC: C08J7/04 , B05D1/18 , G03F7/00 , H01L21/02 , H01L21/033 , H01L21/311 , H01L29/06 , H05K3/00
Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.
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