公开(公告)号：JP2002351354A

公开(公告)日：2002-12-06

申请号：JP2001148769

申请日：2001-05-18

Applicant: IBM

Inventor： HIROMASU YASUNOBU ,  NAKASOGI AKIHIRO

IPC: G02F1/1333 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/1368 ,  G09F9/30 ,  G09F9/35 ,  H01L21/302 ,  H01L21/311 ,  H01L21/768 ,  H01L21/77 ,  H01L27/32 ,  H01L29/12 ,  H01L29/786

Abstract: PROBLEM TO BE SOLVED: To provide a thin-film transistor(TFT) array substrate, a method of manufacturing the TFT array substrate and a display device. SOLUTION: This TFT array substrate includes an insulating substrate 12, TFTs formed in a matrix form on the insulating substrate 10 and extraction wires 46 electrically connected to the TFTs. A gate insulating film 32 is formed in the upper parts of the extraction wires 46 and a passivation film 38 is formed in the upper part of the gate insulating film 32. Further, an interlayer insulating film 42 including an organic polymer formed with ends is formed. Etching stoppers 50 are formed on the upper parts of at least either of the gate insulating 32 or passivation film 38 exposed from the end 48 of the interlayer insulating film 42.

公开(公告)号：JP2001215514A

公开(公告)日：2001-08-10

申请号：JP2000026263

申请日：2000-02-03

Applicant: IBM

Inventor： NAKASOGI AKIHIRO ,  NOGAMI TETSUYA ,  MURAYAMA KOJI

IPC: G02F1/1337 ,  G02F1/137 ,  G02F1/139

Abstract: PROBLEM TO BE SOLVED: To provide a liquid crystal device having uniform perpendicular alignment a method and a device for the production of that liquid crystal device, with respect to the production of an electrically controlled birefringence effect (ECB) type perpendicular alignment liquid crystal device. SOLUTION: The liquid crystal device contains liquid crystal molecules 12 having negative dielectric anisotropy and a polyimide 18 for parallel alignment. The method of producing the device includes a process exposing one surface or the both surfaces of a substrate 14 of the liquid crystal device, having the liquid crystal molecules having a negative dielectric anisotropy aligned parallel by the alignment polyimide and to align the liquid crystal molecules in the perpendicular direction. The exposure device used for the exposure is equipped with a filter, so as to cut the light having =600 nm wavelength, to use the light having the wavelength of 400 nm to 600 nm. When a voltage is applied between electrodes 16 of the liquid crystal device, a response time becomes faster.

公开(公告)号：JPH06104171A

公开(公告)日：1994-04-15

申请号：JP24903892

申请日：1992-09-18

Applicant: IBM JAPAN

Inventor： SATO KIMIHIRO ,  NAKASOGI AKIHIRO

IPC: H01L21/027 ,  H01L21/302 ,  H01L21/3065

Abstract: PURPOSE:To form a resist mask whose reflow effect is fixed without depending on a resist pattern by applying a thin film resist layer all over a resist pattern with a step or a recessed part, by exposing it vertically and by making the thin film resist layer remaining on a vertical wall reflow by heating. CONSTITUTION:A resist material layer applied all over a processing surface 2 is exposed by a reduction projection aligner and then developed to form a resist pattern 1. The resist pattern 1 is provided with a step or a recessed part 5 having a right-angled vertical sidewall 4 to a plane part 3, and set by heating type far ultraviolet ray setting, etc., to form a set resist pattern 6. Then, a thin film resist layer 7 of low viscosity resist is applied all over the surface, exposed by batch exposure in a vertical direction and is developed to make only the thin film resist layer 7 on the vertical wall 4 remain. The remaining thin film resist layer 7 is made to reflow and is formed to a side cross sectional contour with a forward taper or a forward tilt together with the vertical wall 4.