公开(公告)号：DE69324439D1

公开(公告)日：1999-05-20

申请号：DE69324439

申请日：1993-10-29

Applicant: IBM

Inventor： BREYTA GREGORY ,  CLECAK NICHOLAS JEFFRIES ,  HINSBERG III WILLIAM DINAN ,  HOFER DONALD CLIFFORD ,  ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  SOORIJAKUMARAN RATMAN

IPC: G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027 ,  H01L21/47

Abstract: A lithographic imaging process is provided for use in the manufacture of integrated circuits. A substrate is coated with a polymeric film comprising a vinyl polymer, a photosensitive acid generator, and acid labile groups. It is then heated to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. The film is then expose imagewise to radiation to generate free acid, and the film is once more heated, again to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. Finally the image is developed. The process provides protection to the photoresist film from airborne chemical contaminants.

公开(公告)号：DE2308580A1

公开(公告)日：1973-09-13

申请号：DE2308580

申请日：1973-02-21

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  COX ROBERT JAMES

IPC: G03C1/00 ,  C08F2/00 ,  C08F2/50 ,  G03F7/004 ,  G03F7/008 ,  G03F7/016 ,  C07C117/00

公开(公告)号：DE3467430D1

公开(公告)日：1987-12-17

申请号：DE3467430

申请日：1984-05-16

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  MCKEAN DENNIS RICHARD ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  WILLSON CARLTON GRANT

IPC: G03F7/20 ,  C07D213/77 ,  G03C1/72 ,  G03C5/08 ,  G03F7/008 ,  G03F7/016 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/08

Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.

公开(公告)号：DE3063170D1

公开(公告)日：1983-06-16

申请号：DE3063170

申请日：1980-10-15

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  C08K5/1575 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022 ,  G03F7/038 ,  G03F7/26 ,  H01L21/26 ,  G03F7/02 ,  G03F7/08 ,  G03C1/68

Abstract: The invention relates to a lithographic resist composition for use in a method of forming a film (17) on a substrate (11) comprising the steps of providing a deposition mask (10) of the resist composition on the substrate (11), exposing a selected portion of the mask to ultra-violet rays, dissolving the exposed portion with aqueous alkali to form an aperture (15) with negative slope or overhang, depositing on said substrate (11) through the aperture (15) said film (17) and removing the deposition mask (10). The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: wherein R1 is C1 to C20 alkyl or aryl, R2 is H, C1 to C20 alkyl or aryl, or together R1 and R2 are cycloalkyl, A is N or H.

公开(公告)号：DE3062249D1

公开(公告)日：1983-04-14

申请号：DE3062249

申请日：1980-03-20

Applicant: IBM

Inventor： BALANSON RICHARD DAVID ,  CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  OUANO AUGUSTUS CENIZA

IPC: G03C1/72 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/08

公开(公告)号：DE3272766D1

公开(公告)日：1986-09-25

申请号：DE3272766

申请日：1982-11-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  MCKEAN DENNIS RICHARD ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  TWIEG ROBERT JAMES ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  H01L21/027 ,  G03F7/08

Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.

公开(公告)号：DE2960177D1

公开(公告)日：1981-04-09

申请号：DE2960177

申请日：1979-02-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  JAFFE ANNETTE BRONKESH ,  KELLER GARY SCOTT

IPC: C09K9/02 ,  G02F1/15 ,  G02F1/17 ,  G09F9/30

Abstract: This invention relates to a composition for use as a reactive medium in a reversible electrochromic display device. The reactive medium is placed between two electrically conductive electrodes of the device, at least one of the electrodes being transparent, the composition includes an anhydrous solvent and an oxidant/reductant pair in which the reductant is an electron acceptor, and the oxidant is a substituted fluorene compound.

公开(公告)号：DE2260540A1

公开(公告)日：1973-07-05

申请号：DE2260540

申请日：1972-12-11

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  COX ROBERT JAMES ,  SOLAR SAMUEL LOUIS

IPC: C09B35/033 ,  G03G5/06 ,  C09B35/10

公开(公告)号：DE3662317D1

公开(公告)日：1989-04-13

申请号：DE3662317

申请日：1986-03-14

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  WILLSON CARLTON GRANT

IPC: C08L101/00 ,  C08K5/00 ,  C08K5/53 ,  C08L33/00 ,  C08L33/02 ,  C08L61/10 ,  G03C1/72 ,  G03C5/16 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027 ,  G03F7/10

Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

公开(公告)号：DE2314868A1

公开(公告)日：1973-10-04

申请号：DE2314868

申请日：1973-03-26

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  COX ROBERT JAMES

IPC: C07D277/62 ,  C09B62/78 ,  G03F7/008 ,  G03F7/10