公开(公告)号：DE3381335D1

公开(公告)日：1990-04-19

申请号：DE3381335

申请日：1983-09-06

Applicant: IBM

Inventor： CHANG TAI-HON PHILIP ,  WILSON ALAN DICKSON

IPC: B23K26/00 ,  H01J37/302 ,  H01J37/317

Abstract: A large lithographic pattern is written as quickly as possible by writing successive subpatterns in a vector scan mode of operation without any interruption between successive subpatterns. This is made possible by arranging the subpatterns so that they are adjacent to each other and are preferably overlapping and by gradually moving the workpiece with respectto the writing field so as to always keep the subpattern being written within the writing field of the beam. The speed and direction of the workpiece movement (relative to the writing field) is not predetermined for all patterns but is controlled instead by the pattern being written. A sparsely written pattern or portion of a pattern is accompanied by a more rapid table movement than what accompanies a densely written pattern or portion of a pattern. This is made possible by embedding pattern determined workpiece movement commands within the pattern defining data. Through the workpiece movement commands, relative movement between the workpiece and the writing field may be continuously controlled with respect to movement direction, velocity and acceleration.Beam source 10 is controllably turned on and off by blanking apparatus 12 and deflected by deflector apparatus 14. The beam is incident on workpiece 18 on table 16. The position of table 16 is detected by X, Y detectors 24, 26 and controlled by X, Y servos 20, 22. Servos 20, 22 are, in turn, contolled from comparator 28 which compares the desired workpiece position obtained from pattern data memory 34 with the actual workpiece position. The pattern data is used to control X, Y deflection drivers 58, 60 together with X Y correction signals from comparator 30 and representing any difference between the workpiece reference position and its actual position.

公开(公告)号：DE3370697D1

公开(公告)日：1987-05-07

申请号：DE3370697

申请日：1983-04-05

Applicant: IBM

Inventor： VETTIGER PETER ,  WILSON ALAN DICKSON

IPC: G01N21/88 ,  G01B15/00 ,  G01N21/956 ,  H01J37/304 ,  H01L21/027 ,  H01L21/66 ,  G03B41/00

Abstract: An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system.The drawing shows apparatus for testing the print of the mask. The print is carried by substrate 14 mounted on XY table 24. The print is scanned by electron beam 28 under the control of pattern generator 30. Digital signals from the generator are changed to analogue signals by D/A converter 32, amplified at 34 and applied to deflection coil 35. Scattered electrons are received by detector 37, the video signal amplified in 36 and passed to compare unit 38. Unit 38 receives a correct input from the generator 30 and this is compared with the actual signal from video 36. The compare output is validated by being AND'ed with a further signal from the generator 30. The output of the AND gate is stored in defect catalog 42.

公开(公告)号：DE3582404D1

公开(公告)日：1991-05-08

申请号：DE3582404

申请日：1985-11-12

Applicant: IBM

Inventor： BEUMER KARL WILLI ,  GASTON CHARLES ARDEN ,  MACK ALFRED ,  O'NEILL BRIAN COLLINS ,  PINCKNEY WARREN JOHN ,  LOCKE CHARLES HENRY ,  WILSON ALAN DICKSON

IPC: H01L21/30 ,  H01J37/20 ,  H01L21/027 ,  H01L21/68 ,  H05K13/02 ,  H01L21/00

Abstract: A high precision, high throughput submicrometer workpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithography systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand.The positioning system comprises a movable positioning table (12), a workpiece supporting superstructure (14) which is elastically joined to the movable positioning table (12) by three geometrically distinct kinematic support means (16. 18, 20) and a two-stage coupling means (24) which mounts a workpiece (32) (i.e., semiconductor mask or wafer) to the workpiece supporting superstructure (14). A laser interferometer locating-positioning system is utilized to position the workpfece. The interferometer mirrors (28) are integral with the workpiece supporting superstructure (14).The coupling means (24) mounts a workpiece (22) to the workpiece supporting superstructure (14) with a minimum of mechanical distortion. Three two-stage coupling means (24) are utilized in preferred form. The first stage (34) is removable from the positioning, and allows for workpiece loading and unloading outside of the positioning system. The removable stage (34) comprises an integral unit (33) which includes two opposing arms (42, 44) with large radii spherical ends and a tab member. The spherical end center lines are collinear, providing for vertical clamping of the workpiece (32). The second stage (36) is stationary and integral with the workpiece supporting superstructure (14). The stationary stage (36) comprises two opposing arms (38, 40) with large radii spherical ends and clamps the tab (46) of the removable stage by verticai clamping.

公开(公告)号：DE2422201A1

公开(公告)日：1975-01-16

申请号：DE2422201

申请日：1974-05-08

Applicant: IBM

Inventor： DESKEVICH STEPHEN ,  PEACOCK JAMES CRAWFORD ,  TYNAN RICHARD FRANCIS ,  WILSON ALAN DICKSON

IPC: H05B41/30 ,  H05B41/32

Abstract: Charging circuit for a flash lamp in which flash holdover is prevented by establishing a high impedance charging circuit for a predetermined time after flash initiation to allow deionization of the lamp plasma and, after a predetermined time, establishing a low impedance charging circuit to provide a fast charging rate for the energy storage device. Impedance levels are changed in the circuit by gating a silicon controlled rectifier (SCR) with a control signal a predetermined time after flash initiation so as to bypass a high impedance circuit path in parallel therewith. As the energy storage device becomes fully charged, the SCR returns to its blocking condition, the control signal terminates and the lamp can be fired again.