公开(公告)号：JP2004026831A

公开(公告)日：2004-01-29

申请号：JP2003180250

申请日：2003-06-24

Applicant: Infineon Technologies Ag ,  インフィネオン テクノロジーズ アクチェンゲゼルシャフト

Inventor： WALTHER ANDREAS ,  GNUECHTEL INGO ,  MALTENBERGER ANNA ,  SEZI RECAI ,  HARTMANN HORST

IPC: C07C215/82 ,  C07B61/00 ,  C07C213/02 ,  C07C215/80 ,  C07C217/90

CPC classification number: C07C217/90 ,  C07C215/80 ,  C07C2603/24

Abstract: PROBLEM TO BE SOLVED: To obtain a new starting material for forming an insulating polymer which has a small dielectric constant, high-temperature stability, and chemical stability.
SOLUTION: A new bis-o-aminophenol is expressed by formula I (M is a bivalent residue having a specified structure). Heat-resistant polybenzoxazole is formed out of the bis-o-aminophenol. The bis-o-aminophenol is preferably produced by nitrosating a diol which corresponds to the aminophenol to form a nitroso compound, and hydrogenating the nitroso compound with H
2 in the presence of Pd/C, so as to obtain the amino compound by reduction.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2007084580A

公开(公告)日：2007-04-05

申请号：JP2006356839

申请日：2006-12-29

Applicant: Infineon Technologies Ag ,  インフィネオン テクノロジーズ アクチエンゲゼルシャフト

Inventor： WALTHER ANDREAS ,  GNUECHTEL INGO ,  MALTENBERGER ANNA ,  SEZI RECAI ,  HARTMANN HORST

IPC: C07C215/80 ,  C07C215/82 ,  C07B61/00 ,  C07C201/00 ,  C07C207/04 ,  C07C213/02 ,  C07C217/90

CPC classification number: C07C217/90 ,  C07C215/80 ,  C07C2603/24

Abstract: PROBLEM TO BE SOLVED: To enable the use of a new starting material that has a small dielectric constant, good high-temperature stability and good chemical stability and enables the preparation of an insulating polymer. SOLUTION: A new bis-o-aminophenol of formula I (wherein M represents a particular group) is provided. The bis-o-aminophenol enables the preparation of a heat-resistant polybenzoxazole. The bis-o-aminophenol is preferably prepared from a corresponding diol, which is first nitrosated. A nitroso compound is then reduced to an amino compound through the hydrogenation using Pd/C and H 2 . COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了能够使用具有小的介电常数，良好的高温稳定性和良好的化学稳定性的新的起始材料，并且能够制备绝缘聚合物。 解决方案：提供了新的式I的双邻氨基苯酚（其中M表示特定的基团）。 双邻氨基苯酚能够制备耐热聚苯并恶唑。 双邻氨基苯酚优选由相应的二醇制备，其首先被亚硝化。 然后通过使用Pd / C和H SB 2的氢化将亚硝基化合物还原成氨基化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：DE50308900D1

公开(公告)日：2008-02-14

申请号：DE50308900

申请日：2003-05-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WALTER ANDREAS ,  GNUECHTEL INGO ,  MALTENBERGER ANNA ,  SEZI RECAI ,  HARTMANN HORST

IPC: C07C215/82 ,  C07C217/90 ,  C07B61/00 ,  C07C213/02 ,  C07C215/80

Abstract: Bis-aminophenols are new. Bis-aminophenols of formula (I) are new. G = oxgyen or sulfur; M = formula (II)-(IX); R1, R2 = phenyl, -(CH2)nCH3, -G-(CH2)nCH3, -C(CH3)3, -GC(CH3)3, -(CF2)nCF3, -G-(CF2)nCF3, -G-CH(CH3)2, -CH(CH3)2, -CF(CF3)2, -C(CF3)3, -N(CH3)2, -N(CF3)2, -C(R1)(R2)-, -C(O)-, -O-, -S- or -N(R1)-; n = 0-5. An Independent claim is included for a process for the preparation of bis-aminophenols (I) by reaction of a diol (II) to form a nitroso compound followed by reduction to form the bis-aminophenol (I).

公开(公告)号：SG122789A1

公开(公告)日：2006-06-29

申请号：SG200303512

申请日：2003-06-25

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WALTER ANDREAS ,  GNUECHTEL INGO ,  MALTENBERGER ANNA ,  SEZI RECAI ,  HARTMANN HORST

IPC: C07C215/82 ,  C07B61/00 ,  C07C213/02 ,  C07C215/80 ,  C07C217/90

Abstract: Bis-aminophenols are new. Bis-aminophenols of formula (I) are new. G = oxgyen or sulfur; M = formula (II)-(IX); R1, R2 = phenyl, -(CH2)nCH3, -G-(CH2)nCH3, -C(CH3)3, -GC(CH3)3, -(CF2)nCF3, -G-(CF2)nCF3, -G-CH(CH3)2, -CH(CH3)2, -CF(CF3)2, -C(CF3)3, -N(CH3)2, -N(CF3)2, -C(R1)(R2)-, -C(O)-, -O-, -S- or -N(R1)-; n = 0-5. An Independent claim is included for a process for the preparation of bis-aminophenols (I) by reaction of a diol (II) to form a nitroso compound followed by reduction to form the bis-aminophenol (I).

公开(公告)号：AU2003292984A1

公开(公告)日：2004-07-22

申请号：AU2003292984

申请日：2003-11-24

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HARTMANN HORST ,  SCHMID GUNTER ,  GERSTNER PETER ,  HALIK MARKUS

IPC: C07D333/36 ,  C07D417/14 ,  H01L51/00 ,  H01L51/30

公开(公告)号：DE10228763A1

公开(公告)日：2004-01-29

申请号：DE10228763

申请日：2002-06-27

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WALTER ANDREAS ,  GNUECHTEL INGO ,  MALTENBERGER ANNA ,  SEZI RECAI ,  HARTMANN HORST

IPC: C07C215/82 ,  C07B61/00 ,  C07C213/02 ,  C07C215/80 ,  C07C217/90

Abstract: Bis-aminophenols are new. Bis-aminophenols of formula (I) are new. G = oxgyen or sulfur; M = formula (II)-(IX); R1, R2 = phenyl, -(CH2)nCH3, -G-(CH2)nCH3, -C(CH3)3, -GC(CH3)3, -(CF2)nCF3, -G-(CF2)nCF3, -G-CH(CH3)2, -CH(CH3)2, -CF(CF3)2, -C(CF3)3, -N(CH3)2, -N(CF3)2, -C(R1)(R2)-, -C(O)-, -O-, -S- or -N(R1)-; n = 0-5. An Independent claim is included for a process for the preparation of bis-aminophenols (I) by reaction of a diol (II) to form a nitroso compound followed by reduction to form the bis-aminophenol (I).

公开(公告)号：DE10394111D2

公开(公告)日：2005-10-20

申请号：DE10394111

申请日：2003-11-24

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HALIK MARKUS ,  HARTMANN HORST ,  SCHMID GUENTER ,  GERSTNER PETER

IPC: C07D333/36 ,  C07D417/14 ,  H01L51/00 ,  H01L51/30