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    DEVICE FOR SUPPLYING GAS MIXTURES TO A CVD REACTOR
    1.
    发明申请
    DEVICE FOR SUPPLYING GAS MIXTURES TO A CVD REACTOR 审中-公开
    用于向CVD反应器供应气体混合物的装置

    公开(公告)号：WO03016590A3

    公开(公告)日：2003-05-30

    申请号：PCT/DE0202592

    申请日：2002-07-15

    Applicant: INFINEON TECHNOLOGIES AG ,  KOGLER RUDOLF ,  SCHOENHERR HELMUT ,  SKRABL SILKE ,  URSCHITZ ROLF

    Inventor： KOGLER RUDOLF ,  SCHOENHERR HELMUT ,  SKRABL SILKE ,  URSCHITZ ROLF

    IPC: C23C16/44 ,  C23C16/448 ,  C23C16/455

    CPC classification number: C23C16/4408 ,  C23C16/4481 ,  C23C16/455 ,  C23C16/45561

    Abstract: The invention relates to a device comprising a supply line branch (Z1) for a gas mixture consisting of an atomized medium (M1) and a carrier gas (T) to a CVD reactor (R). The supply line branch (Z1) comprises a supply line for the liquid medium (M1), a supply line for the carrier gas (T) and a processing unit which is fed by the supply lines and is used to convert the liquid medium (M1) into a gaseous state using an injector valve (EV1) and to mix the medium (M1) with the carrier gas (T). The supply lines are respectively provided with a through flow control unit (DS11, DS12)

    Abstract translation: 本发明涉及一种具有用于雾化介质（M1）和载气（T）的气体混合物到CVD反应器（R）的进料分支（Z1）的装置。 输送支路（Z1）包括用于将所述液体介质的进料管线（M1），用于将载气（T）的供给线，并且通过进料管线处理单元，用于通过在所述气体状态的喷射阀（EV1）的装置将流体传递介质（M1）进给，并 用于将介质（M1）与载气（T）混合。 供电线路各有一个流量控制单元（DS11，DS12）。

    2.
    发明专利
    未知

    公开(公告)号：DE502004002981D1

    公开(公告)日：2007-04-05

    申请号：DE502004002981

    申请日：2004-07-28

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： BAUMGARTL JOHANNES ,  KOGLER RUDOLF ,  VALLANT THOMAS

    IPC: H01L21/205 ,  B01F23/10 ,  C23C16/455 ,  C30B25/02 ,  C30B25/14 ,  F17C13/04

    Abstract: The invention relates to a gas-supply assembly (10) for a process reactor (270). The gas-supply assembly (10) contains at least one changeover unit (420), a process-gas line (470) and an auxiliary line (460). The process reactor (270) contains at least one gas-inlet connection (404). A reactor line (450) lies between the changeover unit (420) and the gas-inlet connection (404). The reactor line (450) is shorter than one metre, producing excellent operating characteristics for the gas-supply assembly.

    3.
    发明专利
    未知

    公开(公告)号：DE10337568A1

    公开(公告)日：2005-03-17

    申请号：DE10337568

    申请日：2003-08-14

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： BAUMGARTL JOHANNES ,  KOGLER RUDOLF ,  VALLANT THOMAS

    IPC: B01F23/10 ,  C23C16/455 ,  C30B25/02 ,  C30B25/14 ,  H01L21/205

    Abstract: The invention relates to a gas-supply assembly (10) for a process reactor (270). The gas-supply assembly (10) contains at least one changeover unit (420), a process-gas line (470) and an auxiliary line (460). The process reactor (270) contains at least one gas-inlet connection (404). A reactor line (450) lies between the changeover unit (420) and the gas-inlet connection (404). The reactor line (450) is shorter than one metre, producing excellent operating characteristics for the gas-supply assembly.

    4.
    发明专利
    未知

    公开(公告)号：DE10137673A1

    公开(公告)日：2003-02-27

    申请号：DE10137673

    申请日：2001-08-01

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： KOGLER RUDOLF ,  URSCHITZ ROLF ,  SKRABL SILKE ,  SCHOENHERR HELMUT

    IPC: C23C16/44 ,  C23C16/448 ,  C23C16/455

    Abstract: The invention relates to a device comprising a supply line branch (Z1) for a gas mixture consisting of an atomized medium (M1) and a carrier gas (T) to a CVD reactor (R). The supply line branch (Z1) comprises a supply line for the liquid medium (M1), a supply line for the carrier gas (T) and a processing unit which is fed by the supply lines and is used to convert the liquid medium (M1) into a gaseous state using an injector valve (EV1) and to mix the medium (M1) with the carrier gas (T). The supply lines are respectively provided with a through flow control unit (DS11, DS12)

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