Patent search ap:("INFINEON TECHNOLOGIES AG") AND inv:"ROESIGER MARTIN" Page 1

1.

发明专利
未知

公开(公告)号：DE10340436B4

公开(公告)日：2006-07-27

申请号：DE10340436

申请日：2003-09-02

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KUECHLER BERND , ROESIGER MARTIN

IPC: G03F7/20 , G05B17/00

2.

发明专利
Method for adjusting substrate, e.g. semiconductor wafer, prior to projection in exposure appliance, using two planes on test substrate for two subsequently exposed planes 未知

公开(公告)号：DE10335816A1

公开(公告)日：2005-03-03

申请号：DE10335816

申请日：2003-08-05

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FUELBER CARSTEN , ROESIGER MARTIN , ZIEBOLD RALF

IPC: G03F7/20 , G03F9/00 , H01L21/68

Abstract: Firstly element (20) of first structure (2) and first measuring mark (6) is projected into first layer on test substrate, followed by projecting element (40), allocated to first element, as part of second structure (4), and of second mark (8), into second layer on substrate.First transposition (103) between two measuring marks on substrate is measured, as is second different transposition (104) between two transpositions is computed for correcting adjustment of substrate, due to lens distortion of exposure appliance.

3.

发明专利
Transformation of positional information relating to structural elements in a pattern representing one or more levels of an integrated circuit between two different coordinate systems by use of a transformation step library 未知

公开(公告)号：DE102004006372A1

公开(公告)日：2005-09-08

申请号：DE102004006372

申请日：2004-02-09

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ROESIGER MARTIN , HAFFNER HENNING

IPC: G03F1/00 , G03F7/20 , G06F17/50 , G06T3/00 , H01L21/027

Abstract: Method for transformation of positional information relating to structural elements in a pattern representing one or more levels of an integrated circuit in two different coordinate systems has the following steps: provision of a transformation step library; selection of the first of two description types; transfer of a data structure to a computer; reading of the data structure using the library and; use of the defined transformation steps with the position information in the first system to output it in the second reference system with the second description type. An independent claim is made for a system for transformation of positional information relating to structural elements in a pattern representing one or more levels of an integrated circuit between two different coordinate systems.

4.

发明专利
未知

公开(公告)号：DE10151207C2

公开(公告)日：2003-11-27

申请号：DE10151207

申请日：2001-10-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ROESIGER MARTIN

IPC: G06F17/18 , H01L21/66 , H01L21/822

5.

发明专利
未知

公开(公告)号：DE10335816B4

公开(公告)日：2007-07-12

申请号：DE10335816

申请日：2003-08-05

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FUELBER CARSTEN , ROESIGER MARTIN , ZIEBOLD RALF

IPC: H01L21/68 , G03F7/20 , G03F9/00

6.

发明专利
Method of modeling characteristics of resist in lithographic exposure process for manufacture of integrated circuits, by adapting polynomial function to results of simulations and deriving error function 未知

公开(公告)号：DE10340436A1

公开(公告)日：2005-05-19

申请号：DE10340436

申请日：2003-09-02

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KUECHLER BERND , ROESIGER MARTIN

IPC: G03F7/20 , G05B17/00

Abstract: The method involves selecting parameters describing the model, and combining them to form a number of nodes which cover the parameter space in a grid shape. Simulations for the exposure of a projection apparatus are carried out to determine geometric parameters such as line width of the structural elements formed in the resist. A polynomial function is adapted to the results of the simulation, and a total error function is derived by comparison with recorded measurements.

7.

发明专利
未知

公开(公告)号：DE10151207A1

公开(公告)日：2003-05-08

申请号：DE10151207

申请日：2001-10-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ROESIGER MARTIN

IPC: G06F17/18 , H01L21/66 , H01L21/822

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