公开(公告)号：DE60200679T2

公开(公告)日：2005-08-25

申请号：DE60200679

申请日：2002-04-25

Applicant: JSR CORP

Inventor： OKADA TAKASHI ,  SINOHARA NORIYASU ,  SHIRATO KAORI ,  EBISAWA MASAHIKO ,  NISHIKAWA MICHINORI ,  YAMADA KINJI

IPC: C08J5/18 ,  C08F38/02 ,  C08G61/00 ,  C08G61/02 ,  C08G61/12 ,  C09D165/00 ,  C09D201/00 ,  C08F38/00 ,  C08F238/00

Abstract: a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1): wherein Z and Y are as defined hereinabove.t

公开(公告)号：DE60200679D1

公开(公告)日：2004-08-05

申请号：DE60200679

申请日：2002-04-25

Applicant: JSR CORP

Inventor： OKADA TAKASHI ,  SINOHARA NORIYASU ,  SHIRATO KAORI ,  EBISAWA MASAHIKO ,  NISHIKAWA MICHINORI ,  YAMADA KINJI

IPC: C08J5/18 ,  C08F38/02 ,  C08G61/00 ,  C08G61/02 ,  C08G61/12 ,  C09D165/00 ,  C09D201/00 ,  C08F38/00 ,  C08F238/00

Abstract: a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1): wherein Z and Y are as defined hereinabove.t