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1.发明申请IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 审中-公开通过使用饲料进料前进和测量细胞再利用改进的方法
公开(公告)号：WO2010011560A2
公开(公告)日：2010-01-28
申请号：PCT/US2009050834
申请日：2009-07-16
Applicant: KLA TENCOR CORP , ADEL MICHAEL E , POSLAVSKY LEONID , FIELDEN JOHN , MADSEN JONATHAN MICHAEL , PETERS ROBERT
Inventor： ADEL MICHAEL E , POSLAVSKY LEONID , FIELDEN JOHN , MADSEN JONATHAN MICHAEL , PETERS ROBERT
IPC: H01L21/66
CPC classification number: H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
Abstract translation: 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。
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2.发明公开IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 审中-公开VERBSSERTE基于测量的前馈饲料侧身测量单元复用的用途
公开(公告)号：EP2311079A4
公开(公告)日：2013-02-20
申请号：EP09800821
申请日：2009-07-16
Applicant: KLA TENCOR CORP
Inventor： ADEL MICHAEL E , POSLAVSKY LEONID , FIELDEN JOHN , MADSEN JONATHAN MICHAEL , PETERS ROBERT
IPC: H01L21/66
CPC classification number: H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
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