公开(公告)号：WO2005065246A3

公开(公告)日：2006-01-05

申请号：PCT/US2004043129

申请日：2004-12-17

Applicant: KLA TENCOR TECH CORP ,  VAEZ-IRAVANI MEHDI ,  ZHAO GUOHENG ,  STOWKOWSKI STANLEY E

Inventor： VAEZ-IRAVANI MEHDI ,  ZHAO GUOHENG ,  STOWKOWSKI STANLEY E

IPC: G02B6/00 ,  G02B6/04 ,  G02B6/32 ,  G02B27/48

CPC classification number: G02B27/48 ,  G02B6/0001 ,  G02B6/04

Abstract: Disclosed are apparatus and methods for illuminating a sample,

Abstract translation: 公开了用于照亮样品的装置和方法，

公开(公告)号：WO03069263A9

公开(公告)日：2004-03-04

申请号：PCT/US0304043

申请日：2003-02-11

Applicant: KLA TENCOR TECH CORP

Inventor： VAEZ-IRAVANI MEHDI ,  ZHAO GUOHENG ,  STOKOWSKI STANLEY E

IPC: G01B11/30 ,  G01B11/24 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/00

CPC classification number: G01N21/95623 ,  G01N21/47 ,  G01N21/94 ,  G01N2201/1045

Abstract: A cylindrical mirror or lens (12) is used to focus an input collimated beam of light onto a line (20) on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of CCD (32) parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter (106) before it is imaged onto the CCD. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shift in synchronism with the relative motion.

Abstract translation: 圆柱形镜或透镜（12）用于将输入的准直光束聚焦到要检查的表面上的线（20）上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的CCD阵列（32）上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。 为了在其上检查具有图案的表面，来自表面的光在其被成像到CCD之前首先通过空间滤光器（106）。 空间滤波器可以由选择性地将散射的辐射反射到检测器的反射条替代，其中反射条也与相对运动同步地移动。

公开(公告)号：WO2006076484A2

公开(公告)日：2006-07-20

申请号：PCT/US2006001067

申请日：2006-01-11

Applicant: KLA TENCOR TECH CORP ,  BAREKET NOAH ,  WACK DANIEL C ,  ZHAO GUOHENG

Inventor： BAREKET NOAH ,  WACK DANIEL C ,  ZHAO GUOHENG

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N21/8422 ,  G01N2021/213

Abstract: To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.

Abstract translation: 为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型 或与结构的其他特征相关的参数。 可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

公开(公告)号：WO2004049016A3

公开(公告)日：2004-12-09

申请号：PCT/US0337939

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

IPC: G01N21/88 ,  G01N21/95 ,  G01J4/00 ,  G01B11/06 ,  G01N21/00 ,  G01N21/86

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: In an optical system (20) measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation (34) used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system (20). In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample (42) does not need to be placed in a vacuum, thereby enhancing system throughput.

Abstract translation: 在测量样品特性的光学系统（20）中，通过减少在测量中使用的真空紫外（VUV）辐射（34）所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量 可以减少这种波长成分的衰减。 这种还原可以通过一种方法来实现，而不需要从测量系统（20）排出所有的气体和水分。 在一个实施例中，可以通过置换至少一部分测量路径中的吸收气体和水分中的至少一些来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品（42）不需要放置在真空中，从而提高系统生产量。

公开(公告)号：WO2004049016A9

公开(公告)日：2004-09-02

申请号：PCT/US0337939

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

IPC: G01N21/88 ,  G01N21/95 ,  G02B

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.

Abstract translation: 在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量， 可以减少波长分量。 这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。 在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品不需要放置在真空中，从而提高系统产量。