公开(公告)号：JP2003149159A

公开(公告)日：2003-05-21

申请号：JP2002201635

申请日：2002-07-10

Applicant: KLA TENCOR TECH CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STAN ,  BIELLAK STEPHEN ,  SULLIVAN JAMIE ,  WELLS KEITH ,  NIKOONAHAD MEHRDAD

IPC: G01N21/84 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a system and method for inspecting the surface of a specimen such as a semiconductor wafer. SOLUTION: The system contains a lighting system wherein a 1st light beam is directed at the specimen surface at a slant angle of incidence and a 2nd light beam is directed at the same with a virtually vertical angle of incidence, a collecting system for collecting at east a part of the beams reflected from the specimen surface, and a detection system wherein the collected part of the reflected beams are processed. Defects if any in presence on the specimen are detected in the collected part of the 1st and 2nd beams.

公开(公告)号：WO2004049016A3

公开(公告)日：2004-12-09

申请号：PCT/US0337939

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

IPC: G01N21/88 ,  G01N21/95 ,  G01J4/00 ,  G01B11/06 ,  G01N21/00 ,  G01N21/86

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: In an optical system (20) measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation (34) used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system (20). In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample (42) does not need to be placed in a vacuum, thereby enhancing system throughput.

Abstract translation: 在测量样品特性的光学系统（20）中，通过减少在测量中使用的真空紫外（VUV）辐射（34）所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量 可以减少这种波长成分的衰减。 这种还原可以通过一种方法来实现，而不需要从测量系统（20）排出所有的气体和水分。 在一个实施例中，可以通过置换至少一部分测量路径中的吸收气体和水分中的至少一些来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品（42）不需要放置在真空中，从而提高系统生产量。

公开(公告)号：WO2004049016A9

公开(公告)日：2004-09-02

申请号：PCT/US0337939

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

IPC: G01N21/88 ,  G01N21/95 ,  G02B

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.

Abstract translation: 在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量， 可以减少波长分量。 这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。 在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品不需要放置在真空中，从而提高系统产量。