公开(公告)号：JP2003149159A

公开(公告)日：2003-05-21

申请号：JP2002201635

申请日：2002-07-10

Applicant: KLA TENCOR TECH CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STAN ,  BIELLAK STEPHEN ,  SULLIVAN JAMIE ,  WELLS KEITH ,  NIKOONAHAD MEHRDAD

IPC: G01N21/84 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a system and method for inspecting the surface of a specimen such as a semiconductor wafer. SOLUTION: The system contains a lighting system wherein a 1st light beam is directed at the specimen surface at a slant angle of incidence and a 2nd light beam is directed at the same with a virtually vertical angle of incidence, a collecting system for collecting at east a part of the beams reflected from the specimen surface, and a detection system wherein the collected part of the reflected beams are processed. Defects if any in presence on the specimen are detected in the collected part of the 1st and 2nd beams.