公开(公告)号：JP2003149159A

公开(公告)日：2003-05-21

申请号：JP2002201635

申请日：2002-07-10

Applicant: KLA TENCOR TECH CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STAN ,  BIELLAK STEPHEN ,  SULLIVAN JAMIE ,  WELLS KEITH ,  NIKOONAHAD MEHRDAD

IPC: G01N21/84 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a system and method for inspecting the surface of a specimen such as a semiconductor wafer. SOLUTION: The system contains a lighting system wherein a 1st light beam is directed at the specimen surface at a slant angle of incidence and a 2nd light beam is directed at the same with a virtually vertical angle of incidence, a collecting system for collecting at east a part of the beams reflected from the specimen surface, and a detection system wherein the collected part of the reflected beams are processed. Defects if any in presence on the specimen are detected in the collected part of the 1st and 2nd beams.

公开(公告)号：WO2004051220A3

公开(公告)日：2004-08-05

申请号：PCT/US0337937

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： STOKOWSKI STAN ,  SAIDIN ZAIN K

IPC: G01N21/956 ,  G01N21/00

CPC classification number: G01M11/0264 ,  G01N21/95607

Abstract: Disclosed are methods and apparatus for altering the phase and/or amplitude of an optical beam within an inspection system (100, 200, 300) using one or more spatial light modulator(s) (SLMs) (108, 112, 122, 212, 220, 230, 312, 332, 320). In one embodiment, an apparatus for optically inspecting a sample with an optical beam is disclosed. The apparatus includes a beam generator (102, 202) for directing an incident optical beam onto the sample whereby at least a first portion of the incident optical beam is directed from the sample (118) as an output beam and a detector (126, 234, 336) positioned to receive at least a portion of the output beam. The detector is also operable to generate an output signal based on the output beam. The apparatus further includes one or more imaging optics (e.g., 224, 228, 226, 232) for directing the output beam to the detector and a programmable spatial light modulator (SLM) positioned within an optical path of the incident or output beam. The SLM is configurable to adjust a phase and/or amplitude profile of the incident beam or the output beam. The apparatus also has a control system (128, 236, 338) operable to configure the SLM to alter the phase and/or amplitude profile of the incident beam or the output beam. For example, the SLM may be configured to alter the illumination profile of the incident beam to achieve different inspection modes. In another example, the SLM may be configured to alter the phase and/or amplitude profile of the output beam so as to substantially eliminate aberrations produced by the imaging optics. In other embodiments, the apparatus may include two or more SLM's which are configurable to alter the phase and/or amplitude profile of both the incident beam and the output beam.

Abstract translation: 公开了一种使用一个或多个空间光调制器（SLM）（108,112,122,212，...）来改变检查系统（100,200,300）内的光束的相位和/或幅度的方法和装置， 220,230,312,332,320）。 在一个实施例中，公开了一种用光学光学检查样品的装置。 该装置包括用于将入射光束引导到样品上的光束发生器（102,202），由此入射光束的至少第一部分作为输出光束从样品（118）引导，并且检测器（126,234） ，336）定位成接收输出光束的至少一部分。 检测器还可操作以基于输出光束产生输出信号。 该装置还包括用于将输出光束引导到检测器的一个或多个成像光学器件（例如，224,228,226,232）和位于入射或输出光束的光路内的可编程空间光调制器（SLM）。 SLM可配置为调整入射光束或输出光束的相位和/或幅度分布。 该装置还具有可操作以配置SLM以改变入射光束或输出光束的相位和/或幅度分布的控制系统（128,236,338）。 例如，SLM可以被配置为改变入射光束的照明轮廓以实现不同的检查模式。 在另一示例中，SLM可以被配置为改变输出光束的相位和/或幅度分布，以便基本上消除由成像光学器件产生的像差。 在其他实施例中，该装置可以包括可配置为改变入射光束和输出光束两者的相位和/或幅度分布的两个或多个SLM。

公开(公告)号：EP1570252A4

公开(公告)日：2011-12-07

申请号：EP03796492

申请日：2003-11-25

Applicant: KLA TENCOR TECH CORP

Inventor： STOKOWSKI STAN ,  SAIDIN ZAIN K

IPC: G01N21/00 ,  G01N21/956

CPC classification number: G01M11/0264 ,  G01N21/95607