MOSFET AND MANUFACTURING METHOD THEREFOR

    公开(公告)号:JP2001189452A

    公开(公告)日:2001-07-10

    申请号:JP2000307041

    申请日:2000-10-06

    Abstract: PROBLEM TO BE SOLVED: To provide a MOSFET and its manufacturing method used for an application for changing over power, in which drift resistance and channel resistance are improved. SOLUTION: This MOSFET has an epitaxial layer under a gate oxide layer 460, and has a substrate 410, in which a part of the epitaxial layer is used as a part of a gate region in a metal-oxide semiconductor field effect transistor(MOSFET), an N-type drift region 430 located so as to be brought into contact with a gate region from the side-face direction, and a source region 440 and a drain region 450 located in the epitaxial layer and laterally straddling the gate region 420 and the N-type drift region 430, respectively.

    6.
    发明专利
    未知

    公开(公告)号:DE60020011D1

    公开(公告)日:2005-06-16

    申请号:DE60020011

    申请日:2000-06-13

    Abstract: An integrated circuit and method of manufacturing therefor. In one embodiment, the integrated circuit includes a substrate with an insulator and a capacitor formed over the substrate. The integrated circuit further includes an adhesive formed over the insulator. The integrated circuit still further includes a micromagnetic device. The micromagnetic device includes a ferromagnetic core formed over the adhesive. The adhesive forms a bond between the insulator and the ferromagnetic core to secure the ferromagnetic core to the substrate. The micromagnetic device also includes at least one winding, located proximate the ferromagnetic core, to impart a desired magnetic property to the ferromagnetic core. The micromagnetic device is electrically coupled to the capacitor.

    7.
    发明专利
    未知

    公开(公告)号:DE60041233D1

    公开(公告)日:2009-02-12

    申请号:DE60041233

    申请日:2000-10-03

    Abstract: A metal-oxide semiconductor field effect transistor (MOSFET), a method of manufacturing the MOSFET and a power supply incorporating at least one such MOSFET. In one embodiment, the MOSFET includes: (1) a substrate having an epitaxial layer underlying a gate oxide layer, a portion of the epitaxial layer being a gate region of the MOSFET, (2) an N-type drift region located in the epitaxial layer laterally proximate the gate region and (3) source and drain regions located in the epitaxial layer and laterally straddling the gate and drift regions.

    8.
    发明专利
    未知

    公开(公告)号:DE60020011T2

    公开(公告)日:2006-03-16

    申请号:DE60020011

    申请日:2000-06-13

    Abstract: An integrated circuit and method of manufacturing therefor. In one embodiment, the integrated circuit includes a substrate with an insulator and a capacitor formed over the substrate. The integrated circuit further includes an adhesive formed over the insulator. The integrated circuit still further includes a micromagnetic device. The micromagnetic device includes a ferromagnetic core formed over the adhesive. The adhesive forms a bond between the insulator and the ferromagnetic core to secure the ferromagnetic core to the substrate. The micromagnetic device also includes at least one winding, located proximate the ferromagnetic core, to impart a desired magnetic property to the ferromagnetic core. The micromagnetic device is electrically coupled to the capacitor.

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