公开(公告)号：WO0171781A3

公开(公告)日：2002-02-28

申请号：PCT/US0109544

申请日：2001-03-22

Applicant: MKS INSTR INC

Inventor： HOLCOMB GARRY ,  GU YOUFAN ,  STAFFORD JAMES ,  MUELLER JAMES ,  WADE STACY

IPC: H01L21/00 ,  H01L21/677

CPC classification number: H01L21/67748 ,  H01L21/67201 ,  H01L21/67253 ,  Y10S414/139

Abstract: Transducer (10) apparatus and method combining both an absolute pressure sensor (20) for sensing absolute pressure in the load lock chamber (60) and a differential pressure sensor (30) for sensing a pressure difference between ambient atmospheric pressure and pressure in a load lock chamber (60) and provides control signals for opening an interior door (62) from the load lock chamber (60) into a vacuum processing chamber (70) and for opening an exterior door (64) between ambient atmosphere and the load lock chamber (60). The transducer (10) can also produce signals to control transition from slow to fast vacuum pump-down of load lock chamber (60) pressure at a predetermined pressure set point.

Abstract translation: 传感器（10）装置和方法组合用于感测负载锁定室（60）中的绝对压力的绝对压力传感器（20）和差压传感器（30），用于感测环境大气压力和负载压力之间的压力差 锁定室（60），并且提供用于将内门（62）从负载锁定室（60）打开到真空处理室（70）中并且用于打开环境大气和负载锁定室之间的外门（64）的控制信号 （60）。 换能器（10）还可以产生信号以控制在预定压力设定点处从负载锁定室（60）压力的慢速到快速真空泵送的转变。

公开(公告)号：WO03008085A2

公开(公告)日：2003-01-30

申请号：PCT/US0222599

申请日：2002-07-16

Applicant: MKS INSTR INC

Inventor： GU YOUFAN ,  DOZORETZ PAUL ,  MUELLER JAMES ,  GOSS BENJAMIN ,  NEUMEISTER DAVID

IPC: F22B35/00 ,  B01D1/00 ,  F22B1/28 ,  B01J4/00

CPC classification number: B01D1/0082

Abstract: The present invention provides a vapor delivery system and a method for efficiently producing water vapor on demand. More particularly, the present invention produces low-temperature water vapor, without the formation of ice, by maintaining a sufficient volume of water at a sufficient temperature within a vaporizer chamber when the pressure in the vaporizer chamber is lowered.

Abstract translation: 本发明提供了一种蒸气输送系统和一种根据需要有效产生水蒸气的方法。 更具体地说，本发明通过在蒸发器室内的压力降低时在蒸发器室内保持足够温度的足够体积的水来产生低温水蒸气而不形成冰。

公开(公告)号：WO02078818A3

公开(公告)日：2003-08-14

申请号：PCT/US0207839

申请日：2002-03-12

Applicant: MKS INSTR INC

Inventor： LIVINGSTON DARREN ,  GU YOUFAN ,  MUELLER JAMES ,  DOZORETZ PAUL

IPC: B01D45/14 ,  B01D45/16

CPC classification number: B01D45/14

Abstract: Trap apparatus (10) and method for removing contaminants (142) from the gaseous effluent flows (136) from chemical vapor deposition chambers (20) and processes by flowing the particle laden gas (140) into an upper chamber (90) of the trap apparatus, (10) imparting additional kinetic energy to the powder particles (142) to enhance separation of the powder particles (142) from the gas (140), and then flowing the gas (152), sans the powder particles (142), out of the trap (10), while the powder particles (142) fall into and are captured by a lower chamber (92) positioned below the upper chamber (90) and remote from the flowing gas (152). An impeller (120) positioned in the upper chamber (90) in the inlet path (140) imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas (148) into the upper chamber (90) for capture as previously described.

Abstract translation: 捕集装置（10）和用于从化学气相沉积室（20）从气态流出物流（136）去除污染物（142）的方法，以及通过使载有颗粒的气体（140）流入捕集器的上室（90） 装置，（10）向粉末颗粒（142）施加额外的动能，以增强粉末颗粒（142）与气体（140）的分离，然后使没有粉末颗粒（142）的气体（152）流动， （10）中，而粉末颗粒（142）落入并被位于上室（90）下方并远离流动气体（152）的下室（92）捕获。 定位在入口路径（140）中的上腔室（90）中的叶轮（120）赋予额外的动能。 对于一些反应气体系统，具有亲水的旋转生长衬底的任选的反应器增强并加速固体颗粒的生长，然后固体颗粒从介质中移出，并由流动气体（148）进料到上室（90）中以捕获为 之前描述。

公开(公告)号：AU4943601A

公开(公告)日：2001-10-03

申请号：AU4943601

申请日：2001-03-22

Applicant: MKS INSTR INC

Inventor： HOLCOMB GARRY ,  GU YOUFAN ,  STAFFORD JAMES ,  MUELLER JAMES ,  WADE STACY

IPC: H01L21/00 ,  H01L21/677

Abstract: A pirani absolute pressure sensor for sensing absolute pressure in a load lock in a range from 100 to 10 -4 torr and a differential pressure sensor for sensing a pressure difference between ambient atmospheric pressure and pressure in the load lock chamber are combined together in a module with a manifold and common circuit components to provide a pressure transducer that is capable of producing not only analog output for absolute pressure measurements, but also control signals at settable absolute and differential pressure values for opening interior and exterior doors of a load lock used to shuttle wafers and other devices into and out of a vacuum processing chamber. The transducer can also produce signals to control transition from slow to fast vacuum pumping of the load lock chamber at a settable threshold pressure.

公开(公告)号：DE10297050T5

公开(公告)日：2004-07-08

申请号：DE10297050

申请日：2002-07-16

Applicant: MKS INSTR INC

Inventor： GU YOUFAN ,  DOZORETZ PAUL ,  MUELLER JAMES ,  GOSS BENJAMIN ,  NEUMEISTER DAVID

IPC: F22B35/00 ,  B01D1/00 ,  F22B1/28 ,  B01J4/00

Abstract: The present invention provides a vapor delivery system and method for efficiently producing water vapor on demand. More particularly, the present invention produces low-temperature water vapor, without the formation of ice, by maintaining a sufficient volume of water at a sufficient temperature within a vaporizer chamber when the pressure in the vaporizer chamber is lowered.

公开(公告)号：AU2002354927A1

公开(公告)日：2003-03-03

申请号：AU2002354927

申请日：2002-07-16

Applicant: MKS INSTR INC

Inventor： MUELLER JAMES ,  GU YOUFAN ,  NEUMEISTER DAVID ,  DOZORETZ PAUL ,  GOSS BENJAMIN

IPC: F22B35/00 ,  B01D1/00 ,  F22B1/28 ,  B01J4/02 ,  B01D53/70

Abstract: The present invention provides a vapor delivery system and method for efficiently producing water vapor on demand. More particularly, the present invention produces low-temperature water vapor, without the formation of ice, by maintaining a sufficient volume of water at a sufficient temperature within a vaporizer chamber when the pressure in the vaporizer chamber is lowered.

公开(公告)号：AU2002250328A1

公开(公告)日：2002-10-15

申请号：AU2002250328

申请日：2002-03-12

Applicant: MKS INSTR INC

Inventor： LIVINGSTON DARREN ,  MUELLER JAMES ,  GU YOUFAN ,  DOZORETZ PAUL

IPC: B01D45/14 ,  B01D45/16

Abstract: Trap apparatus and method for removing contaminants from the gaseous effluent flows from chemical vapor deposition chambers and processes by flowing the particle laden gas into an upper chamber of the trap apparatus, imparting additional kinetic energy to the powder particles to enhance separation of the powder particles from the gas, and then flowing the gas, sans the powder particles, out of the trap, while the powder particles fall into and are captured by a lower chamber positioned below the upper chamber and remote from the flowing gas. An impeller positioned in the upper chamber in the inlet path imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas into the upper chamber for capture as previously described.