公开(公告)号：SG11201607824YA

公开(公告)日：2016-10-28

申请号：SG11201607824Y

申请日：2015-03-19

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  JI CHENGXIANG ,  MADDEN ERIN ,  POKIDOV ILYA ,  WENZEL KEVIN W

IPC: H05H1/46

Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

公开(公告)号：ES2768714T3

公开(公告)日：2020-06-23

申请号：ES15715899

申请日：2015-03-19

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  JI CHENGXIANG ,  MADDEN ERIN ,  POKIDOV ILYA ,  WENZEL KEVIN

IPC: H05H1/46

Abstract: Un aparato (200,200A) para generar plasma, que comprende: un tubo de descarga de plasma (250A) sustancialmente transparente a la energía de microondas, el tubo de descarga de plasma que tiene un eje longitudinal (151); una bobina conductora (160) enrollada alrededor de una superficie externa del tubo de descarga de plasma, la bobina conductora que comprende un material eléctricamente conductor; una cavidad de microondas (252A) que rodea el tubo de descarga de plasma, una guía de ondas (272, 372) acoplada a la cavidad de microondas para guiar la energía de microondas hacia el tubo de descarga de plasma de manera que el plasma se genere en el tubo de descarga de plasma, la guía de ondas que tiene una sección transversal rectangular que define un lado más estrecho de la sección transversal rectangular y un lado más ancho de la sección transversal rectangular, un primer eje de sección transversal (170) de la sección transversal rectangular que es paralelo al lado más ancho de la sección transversal rectangular y un segundo eje de sección transversal (271) de la sección transversal rectangular que es paralelo al lado más estrecho de la sección transversal rectangular, la guía de ondas (272, 372) que se dispone de manera que el segundo eje de sección transversal (271), y por lo tanto, el campo eléctrico de microondas en uso forma un ángulo predeterminado con respecto al eje longitudinal del tubo de descarga de plasma de manera que, en uso, el campo eléctrico de microondas induce una corriente eléctrica en la bobina conductora, la corriente eléctrica que afecta la absorción de energía en el tubo de descarga de plasma, caracterizado porque el ángulo predeterminado puede seleccionarse de manera que la absorción de energía en el tubo de descarga de plasma es de acuerdo con un perfil predeterminado con respecto al eje longitudinal del tubo de descarga de plasma; y mediante un actuador (318A, 318B) para recibir una señal para ajustar el ángulo predeterminado mediante la rotación de la guía de ondas alrededor del eje longitudinal de la guía de ondas.

公开(公告)号：SG11201402773XA

公开(公告)日：2014-06-27

申请号：SG11201402773X

申请日：2012-12-04

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  GU YOUFAN ,  JI CHENGXIANG ,  LOOMIS PAUL A ,  POKIDOV ILYA ,  WENZEL KEVIN W

IPC: H01J37/32 ,  C23C16/455

Abstract: A plasma chamber for use with a reactive gas source that includes a first conduit comprising a wall, an inlet, an outlet, an inner and outer surface, and a plurality of openings through the wall, the inlet receives a first gas for generating a reactive gas in the first conduit with a plasma formed in the first conduit. The plasma chamber also includes a second conduit that includes a wall, an inlet, and an inner surface. The first conduit is disposed in the second conduit defining a channel between the outer surface of the first conduit and the inner surface of the second conduit. A second gas provided to the inlet of the second conduit flows along the channel and through the plurality of openings of the wall of the first conduit into the first conduit to surround the reactive gas and plasma in the first conduit.

公开(公告)号：SG11202013181YA

公开(公告)日：2021-01-28

申请号：SG11202013181Y

申请日：2019-07-01

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  POKIDOV ILYA ,  GUPTA ATUL

IPC: H01J37/32

Abstract: A plasma chamber of a plasma processing system is provided. The plasma chamber defines a plasma channel having a first side and a second side oppositely disposed along a length of the plasma channel. The plasma chamber comprises a first section and a second section constructed from a dielectric material and an interface that bonds together the first and second sections at between a first flange of the first section and a third flange of the second section and between a second flange of the first section and a fourth flange of the second section.

公开(公告)号：SG10201705205WA

公开(公告)日：2017-07-28

申请号：SG10201705205W

申请日：2014-03-14

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  POKIDOV ILYA ,  TIAN FENG ,  TRAN KEN ,  LAM DAVID ,  WENZEL KEVIN W

Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.

公开(公告)号：SG11201507152RA

公开(公告)日：2015-10-29

申请号：SG11201507152R

申请日：2014-03-14

Applicant: MKS INSTR INC

Inventor： CHEN XING ,  POKIDOV ILYA ,  TIAN FENG ,  TRAN KEN ,  LAM DAVID ,  WENZEL KEVIN W

IPC: B01D53/32 ,  B01J12/00 ,  H01J37/32

Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.