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公开(公告)号：JPH10112253A
公开(公告)日：1998-04-28
申请号：JP28140497
申请日：1997-09-29
Applicant: MOTOROLA INC
Inventor： COLL BERNARD , MENU ERIC P , TALIN ALBERT ALEC
Abstract: PROBLEM TO BE SOLVED: To provide an electron-emitting film, emitting uniform electrons at low field intensity and capable f being manufactured at a relatively low temperature. SOLUTION: The forming method of an electron-emitting film includes the following stages: (i) a graphite source 120 is vaporized in a cathode arc adhered device 100 to generate carbon plasma 170. (ii) a potential difference is applied between the graphite source 120 and a glass or silicone adhered substrate 130 to accelerate the carbon plasma 170 toward the adhered substrate 130. (iii) working gas is provided in the cathode arc adhered device 100. (iiii) the carbon plasma 170 is adhered onto the adhered substrate 130.
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公开(公告)号：DE69724376T2
公开(公告)日：2004-03-25
申请号：DE69724376
申请日：1997-09-29
Applicant: MOTOROLA INC
Inventor： COLL BERNARD , MENU ERIC P , TALIN ALBERT ALEC
IPC: C23C14/06 , C23C14/32 , H01J1/304 , H01J9/02 , H01J29/04 , H01J31/12 , H01J1/30 , H01J37/073 , C23C16/26 , C23C16/50
Abstract: A method for forming an electron emissive film (200, 730, 830) includes the steps of: (i) evaporating a graphite source (120, 620) in a cathodic arc deposition apparatus (100, 600) to create a carbon plasma (170, 670), (ii) applying a potential difference between the graphite source (120, 620) and a glass or silicon deposition substrate (130, 630, 710, 810) for accelerating the carbon plasma (170, 670) toward the deposition substrate (130, 630, 710, 810), (iii) providing a working gas within the cathodic arc deposition apparatus (100, 600), and (ii) depositing the carbon plasma (170, 670) onto the deposition substrate (130, 630, 710, 810).
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公开(公告)号：AU2002356519A1
公开(公告)日：2003-04-01
申请号：AU2002356519
申请日：2002-08-09
Applicant: MOTOROLA INC
Inventor： RAWLETT ADAM MADISON , TALIN ALBERT ALEC , WEI YI , COLL BERNARD F , STAINER MATTHEW , DEAN KENNETH ANDREW , ALLMEN PAUL A VON
Abstract: A field emission device and method of forming a field emission device are provided in accordance with the present invention. The field emission device is comprised of a substrate ( 12 ) having a deformation temperature that is less than about six hundred and fifty degrees Celsius and a nano-supported catalyst ( 22 ) formed on the substrate ( 12 ) that has active catalytic particles that are less than about five hundred nanometers. The field emission device is also comprised of a nanotube ( 24 ) that is catalytically formed in situ on the nano-supported catalyst ( 22 ), which has a diameter that is less than about twenty nanometers.
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公开(公告)号：AU5317200A
公开(公告)日：2001-05-10
申请号：AU5317200
申请日：2000-06-02
Applicant: MOTOROLA INC
Inventor： TALIN ALBERT ALEC , COLL BERNARD F , DEAN KENNETH A , JASKIE JAMES E , HOWARD EMMETT
IPC: H01J9/02
Abstract: A method for fabricating an electron-emissive film (100) includes the steps of providing a powder (124), which has a plurality of carbon nanotubes (104); providing a substrate (102), a surface (103) of which defines a plurality of interstices (107); and dry spraying powder (124) onto surface (103) of substrate (102). The adjustable parameters of the dry spraying step include a separation distance of a spray nozzle (120) from surface (103), a spray angle between a spray (121) and surface (103), and a nozzle pressure at an opening (123) of spray nozzle (120).The separation distance, spray angle, and nozzle pressure are selected to achieve, for example, uniformity of electron-emissive film (100) and adhesion of carbon nanotubes (104) to substrate (102). They can also be selected to achieve a perpendicular orientation of a length-wise axis (105) of each of carbon nanotubes (104) with respect to surface (103) and to achieve the break down of aggregates of carbon nanotubes (104), so that carbon nanotubes (104) are deposited on substrate (102) substantially as individually isolated carbon nanotubes (104).
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公开(公告)号：AU2002329725A1
公开(公告)日：2003-03-18
申请号：AU2002329725
申请日：2002-08-09
Applicant: MOTOROLA INC
Inventor： TRUJILLO JOHANN , TALIN ALBERT ALEC , MOYER CURTIS D , DEAN KENNETH ANDREW
Abstract: A field emission source comprising a first conductive region, a layer of nanotubes deposited on the first conductive region, and a second conductive region placed over and spaced from the nanotube coated first conductive region. After the device structure is fabricated, a laser beam is used to dislodge one end of the nanotube from the first conductive surface and an electric field is simultaneously applied to point the freed end of the nanotube at the second conductive region.
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Patent Agency Ranking
公开(公告)号：AU3814001A
公开(公告)日：2001-08-27
申请号：AU3814001
申请日：2001-02-08
Applicant: MOTOROLA INC
Inventor： JASKIE JAMES E , TALIN ALBERT ALEC
Abstract: A method for scrubbing and passivating an anode plate (100) of a field emission display (120) includes the steps of providing a scrubbing passivation material (127); imparting to scrubbing passivation material (127) an energy selected to cause removal of a contamination layer (123, 117) from anode plate (100); causing scrubbing passivation material (127) to be received by contamination layer (123, 117), thereby removing contamination layer (123, 117); and depositing at least a portion of scrubbing passivation material (127) on anode plate (100), thereby forming a passivation layer (129).
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公开(公告)号：AU8007200A
公开(公告)日：2001-06-18
申请号：AU8007200
申请日：2000-09-10
Applicant: MOTOROLA INC
Inventor： TALIN ALBERT ALEC , MOYER CURTIS D , DEAN KENNETH A , BAKER JEFFREY H , VOIGHT STEVEN A
Abstract: A field emission device (100, 200, 300, 400, 500) includes a substrate (110, 210, 310, 410, 510), a cathode (115, 215, 315, 415, 515) formed thereon, a plurality of electron emitters (170, 270, 370, 470, 570) and a plurality of gate electrodes (150, 250, 350, 450, 550) proximately disposed to the plurality of electron emitters (170, 270, 370, 470, 570) for effecting electron emission therefrom, a dielectric layer (140, 240, 340, 440, 540) having a major surface (143, 243, 343, 443, 543), a surface passivation layer (190, 290, 390, 490, 590) formed on the major surface (143, 243, 343, 443, 543), and an anode (180, 280, 380, 480, 580) spaced from the gate electrodes (250, 350, 450, 550).
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公开(公告)号：AU2003256620A1
公开(公告)日：2004-03-03
申请号：AU2003256620
申请日：2003-07-18
Applicant: MOTOROLA INC
Inventor： TALIN ALBERT ALEC , BAKER JEFFREY H , DAUKSHER WILLIAM J , HOOPER ANDY , RESNICK DOUGLAS J
Abstract: This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, photonic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template ( 10 ) is formed having a substrate ( 12 ), a transparent conductive layer ( 16 ) formed on a surface ( 14 ) of the substrate ( 12 ) by low pressure sputtering to a thickness that allows for preferably 90% transmission of ultraviolet light therethrough, and a patterning layer ( 20 ) formed on a surface ( 18 ) of the transparent conductive layer ( 16 ). The template ( 10 ) is used in the fabrication of a semiconductor device ( 30 ) for affecting a pattern in device ( 30 ) by positioning the template ( 10 ) in close proximity to semiconductor device ( 30 ) having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the relief image present on the template. Radiation is then applied through the template so as to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template ( 10 ) is then removed to complete fabrication of semiconductor device ( 30 ).
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公开(公告)号：DE69724376D1
公开(公告)日：2003-10-02
申请号：DE69724376
申请日：1997-09-29
Applicant: MOTOROLA INC
Inventor： COLL BERNARD , MENU ERIC P , TALIN ALBERT ALEC
IPC: C23C14/06 , C23C14/32 , H01J1/304 , H01J9/02 , H01J29/04 , H01J31/12 , H01J1/30 , H01J37/073 , C23C16/26 , C23C16/50
Abstract: A method for forming an electron emissive film (200, 730, 830) includes the steps of: (i) evaporating a graphite source (120, 620) in a cathodic arc deposition apparatus (100, 600) to create a carbon plasma (170, 670), (ii) applying a potential difference between the graphite source (120, 620) and a glass or silicon deposition substrate (130, 630, 710, 810) for accelerating the carbon plasma (170, 670) toward the deposition substrate (130, 630, 710, 810), (iii) providing a working gas within the cathodic arc deposition apparatus (100, 600), and (ii) depositing the carbon plasma (170, 670) onto the deposition substrate (130, 630, 710, 810).
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公开(公告)号：AU2002359578A1
公开(公告)日：2003-06-30
申请号：AU2002359578
申请日：2002-12-05
Applicant: MOTOROLA INC
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