Abstract:
PROBLEM TO BE SOLVED: To manufacture exceptionally compact semiconductor lasers in high-volume. SOLUTION: A method of manufacturing a plurality of semiconductor lasers 100 includes (a) a step of preparing a supporting wafer 30, (b) a step of forming a complex 70 by fixing a plurality of semiconductor laser chips 4 to the surface 31 of the supporting wafer 30, and (c) a step of forming a plurality of semiconductor lasers 100 by dividing the complex 70. The semiconductor laser 100 has a fixing block 3 and at least one semiconductor laser chip 4. The fixing block 3 has a fixing surface 13, and the fixing surface 13 is extended substantially perpendicularly to the surface 12 of the fixing block 3. The semiconductor laser chip 4 is arranged on the fixing block 3, and the fixing surface 13 is formed when the complex 70 is divided. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To prevent the generation of shading in an emission profile. SOLUTION: A semiconductor laser device including at least one semiconductor laser chip is provided, wherein the semiconductor laser chip contains an active layer that emits electromagnetic radiation. Further, at least one corner reflector 1 is formed in the semiconductor laser chip. The corner reflector 1 has first and second reflective surfaces 14, 15, wherein the first and second reflection surfaces 14, 15 are arranged at an angle of less than 90 degrees with respect to one another. This results in an improved emission characteristic of radiation emitted from the semiconductor laser device. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor chip with improved optical output which can be manufactured by a thin-film technique, and a method for manufacturing it. SOLUTION: A thin-film active layer is processed into a plurality of mesa shapes, and an isolation layer and a metalized layer having reflexivity are formed over the surface of the mesa. Further, the thin-film active layer is mounted on another supporting substrate, and the thin-film active layer is separated from a growth substrate. By reflexing the light generated from an active zone in the thin-film active layer by the isolation layer and the metalized layer formed on the surface of the mesa, luminous efficiency is improved. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor chip having a layer sequence that is improved and excellent in the respect of improving oxidation protection of solder layers in particular, which is regulated for forming solder joints. SOLUTION: A semiconductor chip is provided with a layer sequence regulated for forming solder joints, in which this layer sequence further has solder layers and an oxidation protection layer following the solder layers when looked at in relation to the semiconductor chip. A barrier layer is provided between the solder layers and the oxidation protection layer. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a photoelectric element, a device having a number of the photoelectric elements which can be easily manufactured at a low cost, and an easy manufacturing method of the photoelectric element. SOLUTION: A photoelectric element 1 comprises an active zone and a semiconductor functional region 2 having a main extension direction in a lateral direction. The semiconductor functional region has at least one hole passing through the active zone, and a connection conductor material is disposed in a region of the hole. The connection conductor material is electrically insulated from the active zone at least in a partial region of the hole. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To reduce or compensate thermal stresses in a semiconductor element, which arise as a result of temperature changes during processing and during operation and on account of different expansion coefficients of a semiconductor and a carrier substrate. SOLUTION: In a method of producing the semiconductor element having a light-emitting semiconductor layer or a light-emitting semiconductor element, two contact locations, and a vertically or horizontally patterned carrier substrate, the carrier substrate is patterned in such a way that the thermal stresses are reduced or compensated sufficiently to ensure that the element does not fail. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a carrier layer for a semiconductor continuous layer, which improves conformity to the semiconductor continuous layer concerning thermal expansion coefficient property. SOLUTION: An electric insulation layer 2 contains AIN or ceramics in the case of the carrier layer 1 for the semiconductor continuous layer 7 including the electric insulation layer 2 by the carrier layer 1. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To make directly formable an electric contact area on an n-conductive AlGaInP based or AlGaInAs based semiconductor layer. SOLUTION: A method includes: adjusting by epitaxial growth semiconductor layers having the n-conductive AlGaInP based or AlGaInAs based outer layers and an active zone that emits electromagnetic radiation; making an electric contact material having Au and at least one doping substance adhered to the outer layer; and tempering the outer layer. The doping substance used in the step of making the electric contact material adhered to the outer layer contains at least one element selected from the group consisting of Ge, Si, Sn, and Te. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
The invention relates to a surface-emitting semiconductor laser comprising a semiconductor base (10) having an active zone (1) with a quantum well structure, the quantum well structure containing a plurality of quantum wells (2) which are formed by respective quantum well layers (3) arranged between barrier layers (4). The surface-emitting semiconductor laser further comprises a pump laser (6) which is monolithically integrated into the semiconductor base (10) and which emits pump radiation for optically pumping the active zone (1), the pump radiation forming a mode profile (21) in the semiconductor base (10) and the quantum wells (2) being interspaced in such a manner that they are arranged in the zone of a maximum (22) of the mode profile (21) of the pump radiation.