公开(公告)号：WO0215238A3

公开(公告)日：2002-10-03

申请号：PCT/US0125196

申请日：2001-08-10

Applicant: SENSYS INSTR CORP

Inventor： WEBER-GRABAU MICHAEL ,  TONG EDRIC H ,  NORTON ADAM E ,  STANKE FRED E ,  CAHILL JAMES M ,  RUTH DOUGLAS E ,  JOHNSON KENNETH C

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  G01R31/311

CPC classification number: G03F7/70625 ,  G01N21/956

Abstract: A wafer measurement station (19) integrated within a process tool (11) has a scatterometry instrument (35) for measuring patterned features on wafers (31). A wafer handler (17) feeds wafers between a cassette (15) and one or more process stations (13) of the process tool. Wafers presented to the measurement station are held on a wafer support (33), which may be moveable, and a scatterometry instrument has an optical measurement system (41) that is moveable by a stage (39) over the wafer support. A window (37) isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.

Abstract translation: 集成在处理工具（11）内的晶片测量站（19）具有用于测量晶片（31）上的图案特征的散射仪（35）。 晶片处理器（17）在处理工具的盒（15）和一个或多个处理站（13）之间馈送晶片。 提供给测量站的晶片保持在可以是可移动的晶片支撑件（33）上，并且散射仪器具有可由晶片支撑件上的台（39）移动的光学测量系统（41）。 窗口（37）将可移动光学器件与晶片隔离。 光学测量系统是形成低NA系统的基于显微镜的光学器件。 晶片上的照明光点尺寸大于图案化特征的周期，数据处理使用散射模型来分析所收集的光的光学特征。