公开(公告)号：WO0214840A3

公开(公告)日：2002-08-15

申请号：PCT/US0124940

申请日：2001-08-09

Applicant: SENSYS INSTR CORP

Inventor： JOHNSON KENNETH C ,  STANKE FRED E

IPC: G01B11/00 ,  G01B11/14 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G02B5/18 ,  G06F17/10 ,  H01L21/66 ,  G01B11/30

CPC classification number: G02B5/18 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956

Abstract: A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure (501) as part of a real-time optical measurement process. The interpolated optical response (602) is a continuous and (in a preferred embodiment) (801) smooth function of measurement parameters (X), and it matches the theoretically-calculated optical response at the database-stored interpolation points (701, 702).

Abstract translation: 使用数据库插值方法来快速计算作为实时光学测量过程的一部分的衍射微结构（501）的预测光学响应特性。 内插光学响应（602）是连续的（在优选实施例中）（801）测量参数（X）的平滑函数，并且它与在数据库存储的插值点（701,702）处的理论计算的光学响应相匹配， 。

公开(公告)号：WO0216893A3

公开(公告)日：2002-08-29

申请号：PCT/US0141770

申请日：2001-08-17

Applicant: SENSYS INSTR CORP

Inventor： NORTON ADAM E ,  JOHNSON KENNETH C ,  STANKE FRED E

IPC: G01J3/02 ,  G01J3/28 ,  G01N21/27 ,  G01N21/31 ,  G01N21/47 ,  G01N21/956 ,  G02B5/30 ,  G02B21/36 ,  G02B27/28 ,  G02B21/06

CPC classification number: G01N21/31 ,  G01J3/02 ,  G01J3/0224 ,  G01J3/0243 ,  G01J3/28 ,  G01N21/956 ,  G02B5/3083 ,  G02B27/28

Abstract: A small-spot imaging, spectrometry instrument (Fig. 1) for measuring properties of a sample (27) has a polarization-scrambling element, such as a Lyot depolarizer (19), incorporatied between the polarization-introducing components of the system, such as the beamsplitter (17), and the microscope objective (21) of the system. The Lyot depolarizer varies polarization with wavelength. Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent,l may be narrower than the wavelength resolution of the instrument.

Abstract translation: 用于测量样品（27）的性质的小点成像光谱仪（图1）具有包括在系统的偏振引入组分之间的偏振加扰元件，例如Lyot去极化器（19），诸如 作为分束器（17）和系统的显微镜物镜（21）。 Lyot去极化器使波长偏振。 可以通过数据处理技术去除所得测量光谱中的正弦扰动，或者如果去偏振器是厚的或高度双折射的，则l可能比仪器的波长分辨率窄。

公开(公告)号：WO0215238A3

公开(公告)日：2002-10-03

申请号：PCT/US0125196

申请日：2001-08-10

Applicant: SENSYS INSTR CORP

Inventor： WEBER-GRABAU MICHAEL ,  TONG EDRIC H ,  NORTON ADAM E ,  STANKE FRED E ,  CAHILL JAMES M ,  RUTH DOUGLAS E ,  JOHNSON KENNETH C

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  G01R31/311

CPC classification number: G03F7/70625 ,  G01N21/956

Abstract: A wafer measurement station (19) integrated within a process tool (11) has a scatterometry instrument (35) for measuring patterned features on wafers (31). A wafer handler (17) feeds wafers between a cassette (15) and one or more process stations (13) of the process tool. Wafers presented to the measurement station are held on a wafer support (33), which may be moveable, and a scatterometry instrument has an optical measurement system (41) that is moveable by a stage (39) over the wafer support. A window (37) isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.

Abstract translation: 集成在处理工具（11）内的晶片测量站（19）具有用于测量晶片（31）上的图案特征的散射仪（35）。 晶片处理器（17）在处理工具的盒（15）和一个或多个处理站（13）之间馈送晶片。 提供给测量站的晶片保持在可以是可移动的晶片支撑件（33）上，并且散射仪器具有可由晶片支撑件上的台（39）移动的光学测量系统（41）。 窗口（37）将可移动光学器件与晶片隔离。 光学测量系统是形成低NA系统的基于显微镜的光学器件。 晶片上的照明光点尺寸大于图案化特征的周期，数据处理使用散射模型来分析所收集的光的光学特征。

公开(公告)号：WO0216893B1

公开(公告)日：2003-01-09

申请号：PCT/US0141770

申请日：2001-08-17

Applicant: SENSYS INSTR CORP

Inventor： NORTON ADAM E ,  JOHNSON KENNETH C ,  STANKE FRED E

IPC: G01J3/02 ,  G01J3/28 ,  G01N21/27 ,  G01N21/31 ,  G01N21/47 ,  G01N21/956 ,  G02B5/30 ,  G02B21/36 ,  G02B27/28 ,  G02B21/06

CPC classification number: G01N21/31 ,  G01J3/02 ,  G01J3/0224 ,  G01J3/0243 ,  G01J3/28 ,  G01N21/956 ,  G02B5/3083 ,  G02B27/28

Abstract: A small-spot imaging, spectrometry instrument (Fig. 1) for measuring properties of a sample (27) has a polarization-scrambling element, such as a Lyot depolarizer (19), incorporatied between the polarization-introducing components of the system, such as the beamsplitter (17), and the microscope objective (21) of the system. The Lyot depolarizer varies polarization with wavelength. Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent,l may be narrower than the wavelength resolution of the instrument.

Abstract translation: 用于测量样品（27）的性质的小点成像光谱仪（图1）具有包括在系统的偏振引入组分之间的偏振加扰元件，例如Lyot去极化器（19），诸如 作为分束器（17）和系统的显微镜物镜（21）。 Lyot去极化器使波长偏振。 可以通过数据处理技术去除所得测量光谱中的正弦扰动，或者如果去偏振器是厚的或高度双折射的，则l可能比仪器的波长分辨率窄。

公开(公告)号：AU7924701A

公开(公告)日：2002-02-25

申请号：AU7924701

申请日：2001-08-09

Applicant: SENSYS INSTR CORP

Inventor： JOHNSON KENNETH C ,  STANKE FRED E

IPC: G01B11/00 ,  G01B11/14 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G02B5/18 ,  G06F17/10 ,  H01L21/66 ,  G01B11/30

Abstract: A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process. The interpolated optical response is a continuous and (in a preferred embodiment) smooth function of measurement parameters, and it matches the theoretically-calculated optical response at the database-stored interpolation points.

公开(公告)号：AU8719001A

公开(公告)日：2002-03-04

申请号：AU8719001

申请日：2001-08-17

Applicant: SENSYS INSTR CORP

Inventor： NORTON ADAM E ,  JOHNSON KENNETH C ,  STANKE FRED E

IPC: G01J3/02 ,  G01J3/28 ,  G01N21/27 ,  G01N21/31 ,  G01N21/47 ,  G01N21/956 ,  G02B5/30 ,  G02B21/36 ,  G02B27/28

Abstract: A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a Lyot depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The Lyot depolarizer varies polarization with wavelength. Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, may be narrower than the wavelength resolution of the instrument.

公开(公告)号：AU8124301A

公开(公告)日：2002-02-25

申请号：AU8124301

申请日：2001-08-10

Applicant: SENSYS INSTR CORP

Inventor： WEBER-GRABAU MICHAEL ,  TONG EDRIC H ,  NORTON ADAM E ,  STANKE FRED E ,  CAHILL JAMES M JR ,  RUTH DOUGLAS E ,  JOHNSON KENNETH C

IPC: H01L21/66 ,  G01N21/956 ,  G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  H01L21/00

Abstract: A wafer measurement station integrated within a process tool has a scatterometry instrument for measuring patterned features on wafers. A wafer handler feeds wafers between a cassette and one or more process stations of the process tool. Wafers presented to the measurement station are held on a wafer support, which may be moveable, and a scatterometry instrument has an optical measurement system that is moveable by a stage over the wafer support. A window isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.