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公开(公告)号:DE602004023457D1
公开(公告)日:2009-11-19
申请号:DE602004023457
申请日:2004-06-29
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: ROBERT PHILIPPE , ANCEY PASCAL , CARUYER GREGORY
Abstract: The resonator has a piezoelectric layer (3) placed between two electrodes (1, 2). An electrical heating resistor (9) is placed in thermal contact with the electrode (1). The temporary heating of the electrode (1) permits to partially evaporate a material constituting the electrode (1) to make the electrode (1) thinner for adjusting resonance frequency. An independent claim is also included for a method of producing a thin film bulk acoustic resonator or a solidly mounted resonator.
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公开(公告)号:DE602005001245D1
公开(公告)日:2007-07-12
申请号:DE602005001245
申请日:2005-09-15
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: ANCEY PASCAL , ABELE NICOLAS , CASSET FABRICE
Abstract: A MOS transistor with a deformable gate formed in a semiconductor substrate (10), comprises : (A) some source and drain zones (11, 12) separated by a channel zone (13) extending in a first direction from the source to the drain and in a second direction perpendicular to the first direction; (B) a conducting gate beam (16) placed at least above the channel zone extending in the second direction between some support points placed on the substrate at each side of the channel zone. The surface of the channel zone is hollow and has a form similar to that of the gate beam when it is in maximum deflection towards the channel zone. Independent claims are also included for : (A) a circuit oscillator incorporating this transistor; (B) the fabrication of this transistor with a deformable gate.
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公开(公告)号:FR2881416B1
公开(公告)日:2007-06-01
申请号:FR0550276
申请日:2005-01-31
Inventor: ABELE NICOLAS , ANCEY PASCAL , TALBOT ALEXANDRE , SEGUENI KARIM , BOUCHE GUILLAUME , SKOTNICKI THOMAS , MONFRAY STEPHANE , CASSET FABRICE
Abstract: The microresonator has a resonant unit (160) made from monocrystalline silicon, and activation electrodes (120, 121) positioned close to the resonant unit. The unit (160) is placed in an opening in a semiconductor layer (110) that covers a substrate (100). The electrodes (120, 121) are formed in the layer and leveled with the opening. The unit (160) is in the shape of mushroom whose leg is fixed on the substrate. An independent claim is also included for a method of fabricating a microresonator.
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公开(公告)号:FR2881416A1
公开(公告)日:2006-08-04
申请号:FR0550276
申请日:2005-01-31
Inventor: ABELE NICOLAS , ANCEY PASCAL , TALBOT ALEXANDRE , SEGUENI KARIM , BOUCHE GUILLAUME , SKOTNICKI THOMAS , MONFRAY STEPHANE , CASSET FABRICE
Abstract: L'invention concerne un microrésonateur comprenant un élément résonant (160) en silicium monocristallin et au moins une électrode d'activation (120, 121) placée à proximité de l'élément résonant, dans lequel l'élément résonant est placé dans une ouverture d'une couche semiconductrice (110) recouvrant un substrat (100), l'électrode d'activation étant formée dans la couche semiconductrice et affleurant au niveau de l'ouverture.
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公开(公告)号:FR2857785A1
公开(公告)日:2005-01-21
申请号:FR0308715
申请日:2003-07-17
Applicant: COMMISSARIAT ENERGIE ATOMIQUE , ST MICROELECTRONICS SA
Inventor: ROBERT PHILIPPE , ANCEY PASCAL , CARUYER GREGORY
IPC: H03H3/04 , H03H9/17 , H01L41/047
Abstract: The resonator has a piezoelectric layer (3) placed between two electrodes (1, 2). An electrical heating resistor (9) is placed in thermal contact with the electrode (1). The temporary heating of the electrode (1) permits to partially evaporate a material constituting the electrode (1) to make the electrode (1) thinner for adjusting resonance frequency. An independent claim is also included for a method of producing a thin film bulk acoustic resonator or a solidly mounted resonator.
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公开(公告)号:FR2964789A1
公开(公告)日:2012-03-16
申请号:FR1003633
申请日:2010-09-10
Inventor: CASSET FABRICE , CADIX LIONEL , COUDRAIN PERCEVAL , FARCY ALEXIS , CHAPELON LAURENT LUC , FELK YACINE , ANCEY PASCAL
IPC: H01L23/495 , H01L21/027 , H01L21/441
Abstract: Le circuit intégré comporte un substrat de support (1) ayant des première et seconde faces principales (2a, 2b) opposées. Une cavité traverse le substrat de support (1) et relie les première et seconde faces principales (2a, 2b). Le circuit intégré comporte un dispositif à élément mobile (5) dont l'élément mobile (6) et un couple d'électrodes (7) associées sont inclus dans une cavité. Un nœud d'ancrage de l'élément mobile (6) est localisé au niveau de la première face principale (2a). Le circuit intégré comprend une première puce (3) élémentaire disposée au niveau de la première face principale (2a) et connectée électriquement au dispositif à élément mobile (5).
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公开(公告)号:DE602005001245T2
公开(公告)日:2008-01-24
申请号:DE602005001245
申请日:2005-09-15
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: ANCEY PASCAL , ABELE NICOLAS , CASSET FABRICE
Abstract: A MOS transistor with a deformable gate formed in a semiconductor substrate (10), comprises : (A) some source and drain zones (11, 12) separated by a channel zone (13) extending in a first direction from the source to the drain and in a second direction perpendicular to the first direction; (B) a conducting gate beam (16) placed at least above the channel zone extending in the second direction between some support points placed on the substrate at each side of the channel zone. The surface of the channel zone is hollow and has a form similar to that of the gate beam when it is in maximum deflection towards the channel zone. Independent claims are also included for : (A) a circuit oscillator incorporating this transistor; (B) the fabrication of this transistor with a deformable gate.
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公开(公告)号:FR2890229B1
公开(公告)日:2007-11-09
申请号:FR0552645
申请日:2005-08-31
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: BOUCHE GUILLAUME , CASSET FABRICE , ANCEY PASCAL
IPC: H01G5/16 , H01L21/02 , H01L21/822 , H01L27/04 , H01L29/92
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公开(公告)号:FR2875339B1
公开(公告)日:2006-12-08
申请号:FR0452070
申请日:2004-09-16
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: ANCEY PASCAL , ABELE NICOLAS , CASSET FABRICE
Abstract: A MOS transistor with a deformable gate formed in a semiconductor substrate (10), comprises : (A) some source and drain zones (11, 12) separated by a channel zone (13) extending in a first direction from the source to the drain and in a second direction perpendicular to the first direction; (B) a conducting gate beam (16) placed at least above the channel zone extending in the second direction between some support points placed on the substrate at each side of the channel zone. The surface of the channel zone is hollow and has a form similar to that of the gate beam when it is in maximum deflection towards the channel zone. Independent claims are also included for : (A) a circuit oscillator incorporating this transistor; (B) the fabrication of this transistor with a deformable gate.
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公开(公告)号:DE602005016501D1
公开(公告)日:2009-10-22
申请号:DE602005016501
申请日:2005-07-25
Applicant: ST MICROELECTRONICS SA , COMMISSARIAT ENERGIE ATOMIQUE
Inventor: BOUCHE GUILLAUME , ANCEY PASCAL , VIALA BERNARD , COUDERC SANDRINE
Abstract: The method involves nitriding ferromagnetic nanograins rich in iron immersed in an amorphous substrate (SB), and selectively oxidizing the substrate. The nitriding is effectuated by reactive cathodic or ionic sputtering under magnetic field in the presence of nitrogen. The oxidation is effectuated by reactive sputtering in the presence of oxygen. The oxidation and nitriding are carried out simultaneously. Independent claims are also included for the following: (A) a thin soft magnetic film having high magnetization and insulation; and (B) an integrated circuit comprising a component utilizing a membrane incorporating a film.
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