Abstract:
In an integrated pressure sensor (15) with a high full-scale value, a monolithic body (16) of semiconductor material has a first and a second main surface (16a and 16b), opposite and separated by a substantially uniform distance (w). The monolithic body (16) has a bulk region (17), having a sensitive portion (23) next to the first main surface (16a), upon which pressure (P) acts. A first piezoresistive detection element (18) is integrated in the sensitive portion (23) and has a variable resistance as a function of the pressure (P). The bulk region (17) is a solid and compact region and has a thickness substantially equal to the distance (w).
Abstract:
An integrated magnetoresistive device, where a substrate (17) of semiconductor material is covered, on a first surface (19), by an insulating layer (18). A magnetoresistor (26) of ferromagnetic material extends in the insulating layer and defines a sensitivity plane of the sensor. A concentrator (34) of ferromagnetic material including at least one arm (34a), extending in a transversal direction to the sensitivity plane and vertically offset to the magnetoresistor (26). In this way, magnetic flux lines directed perpendicularly to the sensitivity plane are concentrated and deflected so as to generate magnetic-field components directed in a parallel direction to the sensitivity plane.
Abstract:
In a pressure sensor (15) with double measuring scale: a monolithic body (16) of semiconductor material has a first main surface (16a), a bulk region (17) and a sensitive portion (33) upon which pressure (P) acts; a cavity (18) is formed in the monolithic body (16) and is separated from the first main surface (16a) by a membrane (19), which is flexible and deformable as a function of the pressure (P), and is arranged inside the sensitive portion (33) and is surrounded by the bulk region (17); a low-pressure detecting element (28) of the piezoresistive type, sensitive to first values of pressure (P), is integrated in the membrane (19) and has a variable resistance as a function of the deformation of the membrane (19); in addition, a high-pressure detecting element (29), also of a piezoresistive type, is formed in the bulk region (17) inside the sensitive portion (33) and has a variable resistance as a function of the pressure (P). The highpressure detecting element (29) is sensitive to second values of pressure (P).
Abstract:
In a pressure sensor (15) with double measuring scale: a monolithic body (16) of semiconductor material has a first main surface (16a), a bulk region (17) and a sensitive portion (33) upon which pressure (P) acts; a cavity (18) is formed in the monolithic body (16) and is separated from the first main surface (16a) by a membrane (19), which is flexible and deformable as a function of the pressure (P), and is arranged inside the sensitive portion (33) and is surrounded by the bulk region (17); a low-pressure detecting element (28) of the piezoresistive type, sensitive to first values of pressure (P), is integrated in the membrane (19) and has a variable resistance as a function of the deformation of the membrane (19); in addition, a high-pressure detecting element (29), also of a piezoresistive type, is formed in the bulk region (17) inside the sensitive portion (33) and has a variable resistance as a function of the pressure (P). The highpressure detecting element (29) is sensitive to second values of pressure (P).
Abstract:
A light-emitting device (1), comprising: a semiconductor body (2), having a first conductivity type, with a front side (2a) and a back side (2b); a porous-silicon region (10), which extends in the semiconductor body (2) at the front side (2a); and a cathode region (8) in direct lateral contact with the porous-silicon region (10). The light-emitting device further comprises a barrier region (12) of electrically insulating material, which extends in direct contact with the cathode region (8) at the bottom side of the cathode region so that in use an electric current flows in the semiconductor body exclusively through lateral portions of the cathode region (8).
Abstract:
The vertical conduction electronic power device (51) is formed by a body (70) delimited by a first and a second surface (70A, 70B) and having an epitaxial layer (54), of semiconductor material, and a substrate (90). The epitaxial layer is delimited by the first surface (70A) of the body and the substrate is delimited by the second surface (70B) of the body; the epitaxial layer houses at least a first and a second conduction region (56, 60) having a first type of doping (N) and a plurality of insulated-gate regions (59), which extend within the epitaxial layer (54). The substrate (90) has at least one silicide region (91), which extends starting from the second surface (70B) of the body (70) towards the epitaxial layer.
Abstract:
A semiconductor die (100; 200) comprising: a semiconductor body (2, 6), having a front side (6a) and a back side (2b), housing an electronic circuit (8); a buried region (18) in the semiconductor body between the electronic circuit and the back side, including a first layer of conductive material (20; 48) and a dielectric layer (21; 46) arranged between the first layer of conductive material and the semiconductor body; and at least one first conductive path (24, 25; 50, 52, 55) between the buried region and the front side, which forms a path for electrical access to the first layer of conductive material, wherein the first layer of conductive material forms a first plate of a capacitor (1; 40) buried in the semiconductor body, the dielectric layer forms a dielectric of the capacitor, and the semiconductor body forms a second plate of the capacitor. Main figure: Figure 1
Abstract:
The acoustic device has a micromachined acoustic transducer element (15); an acoustically attenuating region (40); and an acoustic matching region (32) arranged between the acoustic transducer element (15) and the acoustically attenuating region (40). The acoustic transducer element (15) is formed in a first substrate (25) housing a cavity (19) delimiting a membrane (16). A second substrate (30) of semiconductor material integrating an electronic circuit is arranged between the acoustic transducer element (15) and the acoustically attenuating region (40). The acoustic matching region (32) has a first interface (32A) with the second substrate (30) and a second interface (32B) with the acoustically attenuating region (40). The acoustic matching region (32) has an impedance matched to the impedance of the second substrate (30) in proximity of the first interface (32A), and an impedance matched to the acoustically attenuating region (40) in proximity of the second interface (32B).