Abstract:
A low voltage isolation circuit (1) is described inserted between a connection node (HVout) to a matrix (2) of switches suitable for receiving a high voltage signal (IM) and a connection terminal (pzt) to a load (PZ) suitable for transmitting said high voltage signal (IM) to said load (PZ) of the type comprising at least one driving block (5) inserted between a first and a second voltage reference (Vss, - Vss) and comprising at least a first driving transistor (M l), inserted, in series with a first driving diode (Dl), between the first voltage reference (Vss) and a first driving central circuit node (Xc) and a second driving transistor (M2), in turn inserted, in series with a second diode (D2), between the driving central circuit node (Xc) and the second supply voltage reference (-Vss). The switch comprises an isolation block (8) connected to the connection terminal (pzt), to the connection node (HVout) and to the driving central circuit node (Xc) and comprising at least one voltage limiter block (6), a diode block (7) and a control transistor (MD), in turn connected across the diode block (7) between the connection node (HVout) to the matrix (2) of switches and the connection terminal (pzt) to the load (PZ) of the low voltage isolation switch (1) and having a control terminal (XD) connected to the driving central circuit node (Xc).
Abstract:
A low voltage isolation switch (1) is described, inserted between an input terminal (HVout) suitable for receiving a high voltage signal (IM) and an output terminal (pzt) suitable for transmitting this high voltage signal (IM) to a load (PZ) of the type comprising at least one driving block (5) being inserted between a first and a second voltage reference (Vss, -Vss) and comprising a first driving transistor (M1), inserted, in series to a first driving diode (D1), between the first voltage reference (Vss) and a first driving central circuit node (Xd) and a second driving transistor (M2), in turn inserted, in series with a second driving diode (D2), between the driving central circuit node (Xd) and the second supply voltage reference (-Vss) as well as a control transistor (MD) connected across a diode block (7) comprising at least one first and one second transmission diode (DN1, DN2), connected in antiparallel, i.e. by having the anode terminal of the first diode connected to the cathode terminal of the second one and vice versa, between the input (HVout) and output (pzt) terminals of the low voltage isolation switch (1), this control transistor (MD) having a control terminal connected to the driving central circuit node (Xd) through a low voltage decoupling block (6), in turn inserted between a first and a second substrate terminal (SS1, SS2) and also comprising a first and a second parasite capacitive element (Par1, Par2) connected to these first and second substrate terminals (SS1, SS2) as well as comprising at least one first decoupling transistor (M3) and one second decoupling transistor inserted (M4), being in parallel to each other and having control terminals connected to the first and second parasite capacitive elements (Par1, Par2), respectively.
Abstract:
In an embodiment, a programmable-gain amplifier includes: two complementary cross-coupled transistor (e.g. MOS) pairs (M n-a , M n-b ; M p-a , M p-b ) mutually coupled with each transistor in one pair (M n-a resp. M n-b ) having a current flow path cascaded with a current flow path of a respective one of the transistors in the other pair (M p-a resp. M p-b ) to provide first (A) and second (B) coupling points between said complementary cross-coupled transistor pairs (M n-a , M n-b ; M p-a , M p-b ); first (C a ) and second (C b ) sampling capacitors set between the first (A) and second (B) coupling points, respectively, and ground; first (10) and second (12) input stages having input terminals for receiving input signals (V in- , V in+ ) for sampling by the first (C a ) and second (C b ) sampling capacitors. Switching means (201 to 206; 301, 302) are provided for: - i) coupling the first (10) and second (12) input stages to the first (C a ) and second (C b ) sampling capacitors, whereby the input signals (V in- , V in+ ) are sampled as sampled signals (V out+ , V out- ) on said first (C a ) and second (C b ) sampling capacitors, and - ii) energizing (V dd ) the complementary cross-coupled transistor pairs (M n-a , M n-b ; M p-a , M p-b ) whereby the signals (V out+ , V out- ) sampled on the first (C a ) and second (C b ) sampling capacitors undergo negative resistance regeneration growing exponentially over time, thereby providing an exponential amplifier gain.
Abstract:
PMUT acoustic transducer (10) formed in a body (11) of semiconductor material having a face (11A) and accommodating a plurality of first buried cavities (12A-12H), having an annular shape, arranged concentrically with each other and extending at a distance from the face (11A) of the body (11). The first buried cavities (12A-12H) delimit from below a plurality of first membranes (13A-13H) formed by the body (11) so that each first membrane (13A-13H) extends between a respective first buried cavity (12A-12H) of the plurality of first buried cavities and the face (11A) of the body (11). The plurality of first membranes (13A-13H) include a central membrane (13A) and a plurality of peripheral membranes (13B-13H) surrounding the central membrane (13A) and spaced outward in the radial direction. A plurality of piezoelectric elements (15A-15H) extend on the face of the body, each piezoelectric element extending above a respective first membrane (13A-13H) of the plurality of first membranes. The first membranes (13A-13H) have different widths (w1-w8), variable between a minimum value and a maximum value and define respective different resonance frequencies.
Abstract:
A device (51) for emitting an ultrasound acoustic wave (42) in a propagation medium, comprising: a package (50) including a base substrate (36) and a cap (38) coupled to the base substrate and defining therewith a chamber (40) in the package (50); a semiconductor die (35), coupled to the base substrate (36) in the chamber (40), comprising a semiconductor body (2); a micromachined ultrasonic transducer (MUT) (1; 30) integrated at least in part in the semiconductor body (2) and including a cavity (6; 32) in the semiconductor body (2) and a membrane (8) suspended over the cavity (6); and an actuator (18), operatively coupled to the membrane (8), which can be operated for generating a deflection of the membrane (8). The membrane (8) is designed in such a way that a resonance frequency (f 0 ) thereof matches an acoustic resonance frequency that, during operation of the MUT (1; 30), develops in said chamber (40) of the package (50) .
Abstract:
The acoustic device has a micromachined acoustic transducer element (15); an acoustically attenuating region (40); and an acoustic matching region (32) arranged between the acoustic transducer element (15) and the acoustically attenuating region (40). The acoustic transducer element (15) is formed in a first substrate (25) housing a cavity (19) delimiting a membrane (16). A second substrate (30) of semiconductor material integrating an electronic circuit is arranged between the acoustic transducer element (15) and the acoustically attenuating region (40). The acoustic matching region (32) has a first interface (32A) with the second substrate (30) and a second interface (32B) with the acoustically attenuating region (40). The acoustic matching region (32) has an impedance matched to the impedance of the second substrate (30) in proximity of the first interface (32A), and an impedance matched to the acoustically attenuating region (40) in proximity of the second interface (32B).
Abstract:
A process for manufacturing MEMS devices (101), including the step of forming a first assembly (74), which comprises: a dielectric region (122); a redistribution region (128); and a plurality of unit portions (76). Each unit portion (76) of the first assembly (74) includes: a die (2, 4), arranged in the dielectric region; and a plurality of first and second connection elements (18, 20), which give out onto opposite faces of the redistribution region (128) and are connected together by means of paths (30, 32) that extend in the redistribution region (128), the first connection elements (18, 20) being coupled to the die (2, 4). The process further includes the steps of: forming a second assembly (80; 110), which comprises a plurality of respective unit portions (84; 284), each of which includes a semiconductor portion (82; 282) and third connection elements (36, 50); mechanically coupling the first and second assemblies (74, 80; 74, 110) so as to connect the third connection elements (36, 50) to corresponding second connection elements (34); and then removing at least part of the semiconductor portion (82; 282) of each unit portion (84; 284) of the second assembly (80; 110), thus forming corresponding membranes (40).
Abstract:
MEMS device (1) comprising: a signal processing assembly (120); a transduction module (38; 40, 41, 56) comprising a plurality of transducer devices (56); a stiffening structure (113) at least partially surrounding each transducer device (56); one or more coupling pillars (36) for each transducer device (56), extending on the stiffening structure (113) and configured to physically and electrically couple the transduction module (38; 40, 41, 56) to the signal processing assembly (120), to carry control signals of the transducer devices (56). Each conductive coupling element (36) has a section having a shape such as to maximize the overlapping surface with the stiffening structure (113) around the respective transducer device (56). This shape includes hypocycloid with a number of cusps equal to or greater than three; triangular; quadrangular.
Abstract:
An integrated electronic system (1) is provided with a package (2) formed by a support base (4) and a coating region (5) arranged on the support base (4) and having at least a first system die (6), including semiconductor material, coupled to the support base (4) and arranged in the coating region (5). The integrated electronic system also has, within the package (2), a monitoring system (14) configured to determine the onset of defects within the coating region (5), through the emission of acoustic detection waves and the acquisition of corresponding received acoustic waves, whose characteristics are affected by, and therefore are indicative of, the aforementioned defects.