Abstract:
A memory device (100) including a plurality of memory cells (M h,k ), a plurality of insulated first regions (220 h ) of a first type of conductivity formed in a chip of semiconductor material (203), at least one second region (230 k ) of a second type of conductivity formed in each first region, a junction between each second region and the corresponding first region defining a unidirectional conduction access element (D h,k ) for selecting a corresponding memory cell connected to the second region when forward biased, and at least one contact (225 h ) for contacting each first region; a plurality of access elements are formed in each first region, the access elements being grouped into at least one sub-set consisting of a plurality of adjacent access elements (D h,k ,D h,k+1 ) without interposition of any contact, and the memory device further includes means (110c,113,125) for forward biasing the access elements of each sub-set simultaneously.
Abstract:
A memory device (100) including a plurality of memory cells (M h,k ), a plurality of insulated first regions (220 h ) of a first type of conductivity formed in a chip of semiconductor material (203), at least one second region (230 k ) of a second type of conductivity formed in each first region, a junction between each second region and the corresponding first region defining a unidirectional conduction access element (D h,k ) for selecting a corresponding memory cell connected to the second region when forward biased, and at least one contact (225 h ) for contacting each first region; a plurality of access elements are formed in each first region, the access elements being grouped into at least one sub-set consisting of a plurality of adjacent access elements (D h,k ,D h,k+1 ) without interposition of any contact, and the memory device further includes means (110c,113,125) for forward biasing the access elements of each sub-set simultaneously.
Abstract:
A memory element comprising a volume of phase change memory material (250) ; and first and second contact for supplying an electrical signal to the memory material (250), wherein the first contact comprises a conductive sidewall spacer (130A, B). Alternately, the first contact may comprise a contact layer having an edge adjacent to the memory material (250).
Abstract:
A crosspoint memory (10) includes a shared address line (12). The shared address line may be coupled to cells (14, 16) above and below the address line in one embodiment. Voltage biasing may be utilized to select one cell, and to deselect another cell. In this way, each cell may be made up of a selection device and a crosspoint memory element in the same orientation. This may facilitate manufacturing and reduce costs in some embodiments.
Abstract:
A dual resistance heater (24) for a phase change material region (28) is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface (26) of the heater material relative to the remainder (27) of the heater material. As a result, the portion (26) of the heater material approximate to the phase change material region (28) is a highly effective heater because of its high resistance, but the bulk (27) of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device.