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    BIAS VOLTAGE ADJUSTMENT FOR A PHASE LIGHT MODULATOR
    2.
    发明申请
    BIAS VOLTAGE ADJUSTMENT FOR A PHASE LIGHT MODULATOR 有权

    公开(公告)号：US20210181499A1

    公开(公告)日：2021-06-17

    申请号：US17120687

    申请日：2020-12-14

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Patrick Ian Oden ,  James Norman Hall ,  William C. McDonald

    IPC: G02B26/08 ,  H02N1/00 ,  G02B26/06

    Abstract: An integrated circuit includes an electrode voltage controller, a micro-electromechanical system (MEMS) structure, and a bias voltage generator. The MEMS structure has a first electrode, a conductive plate, and a reflective layer on the conductive plate. The first electrode is coupled to the electrode voltage controller, and the conductive plate is configured to move vertically with respect to the first electrode responsive to a voltage generated by the electrode voltage controller and applied to the first electrode. The bias voltage generator is coupled to the conductive plate. The bias voltage generator has an input configured to receive a bias control signal. The bias voltage generator is configured to apply a non-zero bias voltage to the conductive plate responsive to the bias control signal.

    Isolated Protrusion/Recession Features in a Micro Electro Mechanical System
    3.
    发明申请
    Isolated Protrusion/Recession Features in a Micro Electro Mechanical System 审中-公开

    公开(公告)号：US20180290880A1

    公开(公告)日：2018-10-11

    申请号：US15481704

    申请日：2017-04-07

    Applicant: Texas Instruments Incorporated

    Inventor： Patrick Ian Oden ,  James Carl Baker ,  Sandra Zheng ,  William C. McDonald

    IPC: B81B3/00 ,  B81C1/00

    Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.

    SURFACE MICROMACHINED STRUCTURES
    4.
    发明申请
    SURFACE MICROMACHINED STRUCTURES 有权

    公开(公告)号：US20220411262A1

    公开(公告)日：2022-12-29

    申请号：US17899537

    申请日：2022-08-30

    Applicant: Texas Instruments Incorporated

    Inventor： Patrick Ian Oden ,  James Norman Hall

    IPC: B81C1/00 ,  G03B21/00 ,  B81B3/00

    Abstract: In one example, a method comprises forming a first layer on a substrate surface, forming an opening in the first layer, forming a second layer on the first layer and in the opening, and forming a photoresist layer on the second layer, in which the photoresist layer has a first curved surface over a first part of the first layer and over the opening. The method further comprises etching the photoresist layer and a second part of the second layer over the first part of the first layer to form a second curved surface on the second part of the second layer, and forming a mirror element and a support structure in the second layer, including by etching a third part of the second layer and removing the first layer.

    ISOLATED PROTRUSION/RECESSION FEATURES IN MICROELECTROMECHANICAL SYSTEMS
    6.
    发明申请
    ISOLATED PROTRUSION/RECESSION FEATURES IN MICROELECTROMECHANICAL SYSTEMS 审中-公开

    公开(公告)号：US20200207608A1

    公开(公告)日：2020-07-02

    申请号：US16814001

    申请日：2020-03-10

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Patrick Ian Oden ,  James Carl Baker ,  Sandra Zheng ,  William C. McDonald

    IPC: B81B3/00 ,  G02B26/08

    Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.

    Microelectromechanical system contactor spring
    10.
    发明授权
    Microelectromechanical system contactor spring 有权

    公开(公告)号：US11609419B2

    公开(公告)日：2023-03-21

    申请号：US16425884

    申请日：2019-05-29

    Applicant: Texas Instruments Incorporated

    Inventor： Patrick Ian Oden

    IPC: G02B26/00 ,  B81B7/02 ,  G02B26/08

    Abstract: In described examples, a system (e.g., a microelectromechanical system) includes a substrate, a support coupled to the substrate and a first and second element. The first element includes a contactor spring having a first portion coupled to the support and having a second portion including a cavity having a sloped surface. A clearance from the sloped surface to the substrate is widened as the sloped surface extends away from the first portion. The second portion includes a first contact surface adjacent to the sloped surface. The second element is coupled to the substrate and has a second contact surface adjacent to the first contact surface. One of the first element and the second element is adapted: in a first direction to urge the first contact surface and the second contact surface together; and in a second direction to urge the first contact surface and the second contact surface apart.

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